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1
المؤلفون: Alan Baur, Aaron Lyndaker, Eric Van Every, Alex Deyhim
المصدر: AIP Conference Proceedings.
مصطلحات موضوعية: Physics, Field (physics), Electromagnet, Scattering, business.industry, XMD, Conical surface, Photon energy, Dichroism, law.invention, Optics, law, Goniometer, business
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2
المؤلفون: Eric Van Every, Alex Deyhim, Alan K. Pauling, A. Lyndaker, Tim Shea, Ernie Fontes
المصدر: AIP Conference Proceedings.
مصطلحات موضوعية: Physics, Physics::Instrumentation and Detectors, business.industry, Enclosure, Synchrotron, law.invention, Optics, Light source, Beamline, law, Electromagnetic shielding, Physics::Accelerator Physics, High Energy Physics::Experiment, business, Envelope (mathematics), Storage ring, Front (military)
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3
المؤلفون: Alex Deyhim, Eric Van Every, Tim Shea, Matt Popov, Ernie Fontes, Dana Richter, Gary Navrotski, Brian Coon
المصدر: AIP Conference Proceedings.
مصطلحات موضوعية: Downtime, High energy, Computer science, business.industry, Advanced Photon Source, Expert consultation, Modular design, Synchrotron, law.invention, Upgrade, law, Shielded cable, Systems engineering, business
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4
المؤلفون: Alex Deyhim, Eric Acome, Marcin Zajac, Eric Van Every
المصدر: AIP Conference Proceedings.
مصطلحات موضوعية: Engineering, Measure (data warehouse), business.industry, Optical table, Electrical engineering, Synchrotron radiation, Degrees of freedom (mechanics), Synchrotron, law.invention, law, Transversal (combinatorics), Vertical direction, Table (database), business
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5
المؤلفون: Patrick P. Naulleau, William Cork, Iacopo Mochi, Jason DePonte, Jeffrey F. Gamsby, Arnaud P. Allezy, Eric M. Gullikson, Veljko Milanovic, M.R. Dickinson, Eric Van Every, Douglas Van Camp, Markus P. Benk, W. Chao, Senajith Rekawa, Erik H. Anderson, James Macdougall, Elizabeth Martin, Kenneth A. Goldberg, Rene Delano, Daniel Zehm, Eric Acome, Vamsi Vytla, Carl Cork, M. S. Gideon Jones, Farhad Salmassi, Hanjing Huang, William B. Ghiorso
المصدر: Extreme Ultraviolet (EUV) Lithography IV.
مصطلحات موضوعية: Physics, Microscope, business.industry, Extreme ultraviolet lithography, law.invention, Numerical aperture, Optics, law, Extreme ultraviolet, Reticle, Photomask, business, Lithography, Image resolution
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::85cef16beed56b5de8e814af8350f7b6
https://doi.org/10.1117/12.2011688