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المؤلفون: Dan Posey, Evelyn Jones Ferrero
المصدر: J. Anal. At. Spectrom.. 17:1194-1201
مصطلحات موضوعية: Wafer fabrication, Detection limit, Chemistry, Direct method, Analytical chemistry, Sample preparation, Wafer, Decomposition, Inductively coupled plasma mass spectrometry, Sensitivity (electronics), Spectroscopy, Analytical Chemistry
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::01aff2a1ac59d83ad8d93a7c44665ded
https://doi.org/10.1039/b201759h