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المؤلفون: Peter Dirksen, Joseph J. M. Braat, Augustus J. E. M. Janssen
المساهمون: Control Systems
المصدر: Journal of Microlithography, Microfabrication and Microsystems, 5(1), 013005-1/11. SPIE
Journal of microlithography, microfabrication, and microsystems, 5.2006, nr.1مصطلحات موضوعية: Zernike polynomials, Computer science, Image processing, Convolution, law.invention, symbols.namesake, Optics, law, extended Nijboer-Zernike theory, resist, optical lithography, diffusion constant, Electrical and Electronic Engineering, Aerial image, business.industry, Mechanical Engineering, Condensed Matter Physics, pointspread function, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, Resist, Feature (computer vision), Computer Science::Computer Vision and Pattern Recognition, symbols, Photolithography, Focus (optics), business, focus noise
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::95c1176690e59c7d272592984725e001
https://research.tue.nl/en/publications/dbce72fc-77bb-4a9a-9a1f-da2b33d96181 -
2دورية أكاديمية
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المصدر: Proceedings of SPIE, 2008 vol. 6924.
مصطلحات موضوعية: puplil sampling, FDTD, mask imaging, Stratton-Chu, Extended Nijboer-Zernike theory
URL الوصول: https://explore.openaire.eu/search/publication?articleId=dris___00893::1ebe9669a4149457b1c835297303c2aa
http://resolver.tudelft.nl/uuid:6abc1df9-2b05-40d4-b5f9-f52f9d05154a -
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المؤلفون: O.T.A. Janssen, Augustus J. E. M. Janssen, Sven van Haver, Silvania F. Pereira, H. Paul Urbach, Joseph J. M. Braat
المساهمون: Control Systems
المصدر: Proceedings Optical Microlithography XXI, 26-29 February 2008, San Jose, California, 692410-1/9
STARTPAGE=692410;ENDPAGE=1/9;TITLE=Proceedings Optical Microlithography XXI, 26-29 February 2008, San Jose, California
Proceedings of SPIE, 2008 vol. 6924مصطلحات موضوعية: Electromagnetic field, Physics, Diffraction, business.industry, Zernike polynomials, FDTD, Finite-difference time-domain method, Near and far field, Stratton-Chu, Extended Nijboer-Zernike theory, Entrance pupil, symbols.namesake, puplil sampling, Optics, Fourier transform, Electromagnetic field solver, symbols, mask imaging, business
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::271e76bf4aae711a793db01133c678de
https://doi.org/10.1117/12.772497 -
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المصدر: Proceedings of SPIE, 2006 vol. 6154.
مصطلحات موضوعية: extended Nijboer-Zernike theory, PMI, aberrations, optical lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=dris___00893::ae947e0bac6e26f0c6ca54f8634481aa
http://resolver.tudelft.nl/uuid:03b0de69-3535-4188-8937-25d8bf7b0641 -
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المصدر: Journal of microlithography, microfabrication, and microsystems , 5.2006, nr.1.
مصطلحات موضوعية: extended Nijboer-Zernike theory, resist, optical lithography, diffusion constant, pointspread function, focus noise
URL الوصول: https://explore.openaire.eu/search/publication?articleId=dris___00893::ca7a36de7d2b9a8a50181586f75bc90a
http://resolver.tudelft.nl/uuid:45a77fbd-2b5e-4381-a1bd-2d46830217c8 -
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المؤلفون: Ad Leeuwestein, Tomoyuki Matsuyama, Peter Dirksen, Augustus J. E. M. Janssen, Joseph J. M. Braat, Tomoya Noda
المساهمون: Control Systems
المصدر: Proceedings Optical Microlithography XIX, 21-24 February 2006, San Jose, California
Proceedings of SPIE, 2006 vol. 6154مصطلحات موضوعية: Point spread function, Engineering, business.industry, PMI, law.invention, Metrology, Numerical aperture, Lens (optics), Interferometry, Optics, law, extended Nijboer-Zernike theory, Astronomical interferometer, aberrations, optical lithography, Stepper, business, Aerial image
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7f0c367874a6c5497c03d40541b8fd8f
https://doi.org/10.1117/12.659428 -
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المساهمون: Control Systems
المصدر: Proceedings of SPIE, 2004 vol. 5754
Proceedings Optical Microlithography XVIII, 1-4 March 2005, San Jose, California, 262-273
STARTPAGE=262;ENDPAGE=273;TITLE=Proceedings Optical Microlithography XVIII, 1-4 March 2005, San Jose, Californiaمصطلحات موضوعية: Physics, Scanner, business.industry, Zernike polynomials, Scalar (physics), Function (mathematics), high NA, law.invention, Extended Nijboer-Zernike theory, Lens (optics), Matrix (mathematics), symbols.namesake, Optics, law, symbols, point-spread function, vectorial diffraction formalism, Point (geometry), optical lithography, Photolithography, business
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d98ef4cc146c66e7230f13081740599c
http://resolver.tudelft.nl/uuid:9b17f08c-0748-4175-b4b4-2365304ae004 -
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المصدر: Proceedings of SPIE, 2004 vol. 5377.
مصطلحات موضوعية: resist, point-spread function, optical lithography, diffusion constant, focus noise, Extended Nijboer-Zernike theory
URL الوصول: https://explore.openaire.eu/search/publication?articleId=dris___00893::b73ef0e3e0011506ae4de9a937023ea7
http://resolver.tudelft.nl/uuid:1fb9172a-4c3a-4e4f-9359-db151ee0c8bd -
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المؤلفون: H Kwinten, David Van Steenwinckel, Ad Leeuwestein, Joseph J. M. Braat, Peter Dirksen, Augustus J. E. M. Janssen
المساهمون: Control Systems
المصدر: Proceedings Optical Microlithography XVII, 24-27 January 2004, Santa Clara, California, 150-159
STARTPAGE=150;ENDPAGE=159;TITLE=Proceedings Optical Microlithography XVII, 24-27 January 2004, Santa Clara, California
Proceedings of SPIE, 2004 vol. 5377مصطلحات موضوعية: Point spread function, Materials science, Zernike polynomials, business.industry, Horizontal plane, Extended Nijboer-Zernike theory, law.invention, symbols.namesake, Optics, Resist, Feature (computer vision), law, resist, point-spread function, symbols, optical lithography, diffusion constant, Photolithography, business, Focus (optics), focus noise, Aerial image
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::16f824b8860cac4340bd3fa224a8fce9
https://research.tue.nl/en/publications/c7ed4cc5-826b-4e7d-b569-db3bb0cbe25e
