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المؤلفون: L. Henry, Kimmo Saarinen, E. Hugonnard, F. Letertre, P. Hautojärvi, B. Ghyselen, G. Blondiaux, L. di Cioccio, M.F. Barthe, C. Corbel
المصدر: Physical Review B. 62:16638-16644
مصطلحات موضوعية: Materials science, Proton, Molecular physics, Positron annihilation
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::61e43ad7cc880bb375b7b7233dbf3ff3
https://doi.org/10.1103/physrevb.62.16638 -
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المؤلفون: F. Letertre, Bernard Aspar, Alain Claverie, L. Di Cioccio, B. de Mauduit, Jérémie Grisolia, Filadelfo Cristiano, G. Ben Assayag
المصدر: Journal of Applied Physics. 87:8415-8419
مصطلحات موضوعية: Ostwald ripening, Materials science, Hydrogen, Annealing (metallurgy), Doping, General Physics and Astronomy, chemistry.chemical_element, Activation energy, Crystallographic defect, Crystallography, symbols.namesake, Ion implantation, chemistry, Transmission electron microscopy, Chemical physics, symbols
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المؤلفون: L. Di Cioccio, C. Jaussaud, A.M. Papon, Y. Le Tiec, F. Letertre, M. Bruel
المصدر: Materials Science and Engineering: B. 46:349-356
مصطلحات موضوعية: Materials science, Silicon, business.industry, Wafer bonding, Hybrid silicon laser, Mechanical Engineering, Nanocrystalline silicon, chemistry.chemical_element, Insulator (electricity), Hardware_PERFORMANCEANDRELIABILITY, Direct bonding, Condensed Matter Physics, chemistry.chemical_compound, chemistry, Mechanics of Materials, Hardware_INTEGRATEDCIRCUITS, Silicon carbide, Optoelectronics, General Materials Science, Crystallite, business
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المساهمون: Institut de Microélectronique, Electromagnétisme et Photonique (IMEP), Université Joseph Fourier - Grenoble 1 (UJF)-Institut National Polytechnique de Grenoble (INPG)-Centre National de la Recherche Scientifique (CNRS), Centre National de la Recherche Scientifique (CNRS)-Institut National Polytechnique de Grenoble (INPG)-Université Joseph Fourier - Grenoble 1 (UJF), Domenget, Chahla
المصدر: Compatibility of ALD alumina films with SOI–like structures fabrication
Com. a 2nd EUROSOI Workshop
Com. a 2nd EUROSOI Workshop, 2006, pp.XXمصطلحات موضوعية: [SPI.NANO] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, ComputingMilieux_MISCELLANEOUS
URL الوصول: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::f4149bc0a4e25dd20e9ed6cc71aa06ec
https://hal.archives-ouvertes.fr/hal-00146810 -
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المساهمون: Institut de Microélectronique, Electromagnétisme et Photonique (IMEP), Université Joseph Fourier - Grenoble 1 (UJF)-Institut National Polytechnique de Grenoble (INPG)-Centre National de la Recherche Scientifique (CNRS), Centre National de la Recherche Scientifique (CNRS)-Institut National Polytechnique de Grenoble (INPG)-Université Joseph Fourier - Grenoble 1 (UJF)
المصدر: 1st EUROSOI Workshop
1st EUROSOI Workshop, 2005, XX, pp.XXمصطلحات موضوعية: [SPI.ELEC]Engineering Sciences [physics]/Electromagnetism, [INFO.INFO-TS]Computer Science [cs]/Signal and Image Processing, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, [SPI.SIGNAL]Engineering Sciences [physics]/Signal and Image processing, ComputingMilieux_MISCELLANEOUS
URL الوصول: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::abe6ad0f402ef49ff886a3994366bb90
https://hal.archives-ouvertes.fr/hal-00146191 -
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المساهمون: Institut de Microélectronique, Electromagnétisme et Photonique (IMEP), Université Joseph Fourier - Grenoble 1 (UJF)-Institut National Polytechnique de Grenoble (INPG)-Centre National de la Recherche Scientifique (CNRS), Centre National de la Recherche Scientifique (CNRS)-Institut National Polytechnique de Grenoble (INPG)-Université Joseph Fourier - Grenoble 1 (UJF)
المصدر: Solid-State Electronics
Solid-State Electronics, Elsevier, 2005, 49, n± 9, pp.1522-1528مصطلحات موضوعية: [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, ComputingMilieux_MISCELLANEOUS
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المؤلفون: E. Jalaguier, F. Letertre, L. Di Cioccio
المصدر: Wafer Bonding ISBN: 9783642059155
مصطلحات موضوعية: Materials science, Silicon, Band gap, business.industry, Wide-bandgap semiconductor, chemistry.chemical_element, Insulator (electricity), Heterojunction, High-electron-mobility transistor, Engineering physics, Semiconductor, chemistry, Sublimation (phase transition), business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::037760bef19fe47d7bc9e11b351ca714
https://doi.org/10.1007/978-3-662-10827-7_7 -
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المؤلفون: C. Jaussaud, B. Aspar, Hubert Moriceau, L. Di Cioccio, J.-P. Joly, M. Bruel, F. Letertre, Elsa Hugonnard-Bruyere
المصدر: HITEN 99. Third European Conference on High Temperature Electronics. (IEEE Cat. No.99EX372).
مصطلحات موضوعية: Materials science, Silicon, business.industry, Wide-bandgap semiconductor, chemistry.chemical_element, Silicon on insulator, Gallium nitride, Monocrystalline silicon, chemistry.chemical_compound, chemistry, Silicon nitride, Silicon carbide, Electronic engineering, Optoelectronics, Wafer, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::78d4bb547802799da81c6b3901cec00c
https://doi.org/10.1109/hiten.1999.827466 -
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المؤلفون: Elsa Hugonnard-Bruyere, J-P Joly, B. Aspar, L. Di Cioccio, F. Letertre, M. Bruel
المصدر: Progress in SOI Structures and Devices Operating at Extreme Conditions ISBN: 9781402005763
مصطلحات موضوعية: Fabrication, Materials science, Silicon, business.industry, Silicon dioxide, chemistry.chemical_element, Insulator (electricity), chemistry.chemical_compound, Ion implantation, chemistry, Silicon nitride, Silicon carbide, Optoelectronics, Wafer, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::eb4eab3a8754932863eedc4767d56d6b
https://doi.org/10.1007/978-94-010-0339-1_4 -
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المؤلفون: C. Jaussaud, F. Letertre, Y. Le Tiec, L. Di Cioccio, M. Bruel
المصدر: Electronics Letters. 32:1144
مصطلحات موضوعية: Materials science, Silicon, business.industry, Wafer bonding, Annealing (metallurgy), Silicon on insulator, chemistry.chemical_element, Polishing, Insulator (electricity), chemistry.chemical_compound, Ion implantation, chemistry, Silicon carbide, Electronic engineering, Optoelectronics, Electrical and Electronic Engineering, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ade8842f5ea2470d87aa972c060cbb12
https://doi.org/10.1049/el:19960717