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1
المؤلفون: Jean Gabriel Simiz, Romain Alestra, Romain Bange, Julien Ducoté, Florent Dettoni, Pierre Fanton
المصدر: Optical and EUV Nanolithography XXXVI.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fb29045f843c0f7f4064398a23dad6b8
https://doi.org/10.1117/12.2657686 -
2
المؤلفون: Bertrand Le-Gratiet, Régis Bouyssou, Julien Ducoté, Florent Dettoni, Thibaut Bourguignon, Vincent Morin, Romain Bange, Nivea G. Schuch, Julien Nicoulaud, Guillaume Renault, Frederic Robert, Thiago Figueiro
المصدر: Metrology, Inspection, and Process Control XXXVI.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6e771354a876eb3a8ff8efccf91f65df
https://doi.org/10.1117/12.2615199 -
3
المؤلفون: B. Le-Gratiet, Maxime Gatefait, Didier Dabernat, Olivier Mermet, Benjamin Duclaux, Florent Dettoni
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIV.
مصطلحات موضوعية: Scanner, Reliability (semiconductor), Computer science, business.industry, Process (computing), Rework, Automotive industry, Overlay, Enhanced Data Rates for GSM Evolution, business, Advanced process control, Reliability engineering
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::516f14314f87cd9b7740561f1a77796e
https://doi.org/10.1117/12.2548308 -
4
المؤلفون: Florent Dettoni, Christophe Dezauzier, Richard Johannes Franciscus Van Haren, Jerome Depre, R. Bouyssou, Sergey Tarabrin, Clément Massacrier, Victor Calado
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXII.
مصطلحات موضوعية: Flexibility (engineering), Early generation, business.industry, Computer science, Size reduction, 02 engineering and technology, Overlay, 021001 nanoscience & nanotechnology, 01 natural sciences, Metrology, 010309 optics, Footprint, 0103 physical sciences, 0210 nano-technology, business, Throughput (business), Computer hardware
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::aec1e7b258844abba2cf64b99d68abf4
https://doi.org/10.1117/12.2297673 -
5
المؤلفون: C. Prentice, Florent Dettoni, Jerome Depre, Christophe Dezauzier, Steffen Meyer, R. Bouyssou
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Diffraction, 0209 industrial biotechnology, business.industry, Computer science, Silicon on insulator, Context (language use), 02 engineering and technology, Overlay, computer.software_genre, 01 natural sciences, Simulation software, Metrology, 010309 optics, 020901 industrial engineering & automation, Optics, 0103 physical sciences, Electronic engineering, Measurement uncertainty, Sensitivity (control systems), business, computer
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c00836468e1d79445a79b230f930836f
https://doi.org/10.1117/12.2258206 -
6
المؤلفون: Patrick Amsalem, Margrit Hanbücken, Houda Sahaf, Eric Moyen, Laurence Masson, Norbert Koch, Florent Dettoni
المصدر: Applied Surface Science. 267:192-195
مصطلحات موضوعية: Nanostructure, Materials science, Silicon, General Physics and Astronomy, chemistry.chemical_element, Nanotechnology, Surfaces and Interfaces, General Chemistry, Condensed Matter Physics, Surfaces, Coatings and Films, law.invention, Adsorption, chemistry, law, Self-assembly, Scanning tunneling microscope, Nanoscopic scale, Deposition (law)
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7
المؤلفون: R. Bouyssou, Florent Dettoni, J. Ducote, B. Le-Gratiet, Christophe Dezauzier, Damien Carau
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Optics, Materials science, business.industry, Multiple patterning, Process (computing), Process control, Node (circuits), Nanotechnology, Overlay, Sensitivity (control systems), business, Advanced process control, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::48b50a31ae6de4d7485854ce5bc8a1fb
https://doi.org/10.1117/12.2085757 -
8
المؤلفون: Christophe Dezauzier, M. Besacier, R. Bouyssou, J. Ducote, Alain Ostrovsky, B. Le Gratiet, Cécile Gourgon, D. Carau, Florent Dettoni
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Diffraction, Optics, business.industry, Ellipsometry, Computer science, Etching, Reticle, Multiple patterning, Node (circuits), business, Lithography, Next-generation lithography, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4be0f25afa984bd308a253db87155566
https://doi.org/10.1117/12.2085775 -
9
المؤلفون: Henk-Jan H. Smilde, J. Ducote, Florent Dettoni, Yoann Blancquaert, Lars H. D. Driessen, Jerome Depre, Willy van Buel, Christophe Dezauzier, Jan Beltman, Richard Johannes Franciscus Van Haren
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Optics, business.industry, Computer science, Dimensional metrology, Process (computing), Miniaturization, Window (computing), Wafer, Overlay, business, Computer hardware, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::07964e37cae02b425339175b8742ba1a
https://doi.org/10.1117/12.2085642