المؤلفون: L. Lachal, C. Plantier, F. Torregrosa, C. Aubert, J. M. Pedini, G. Borvon, M. Coig, F. Milesi, F. Mazen

المصدر: MRS Advances. 7:1390-1394

مصطلحات موضوعية: Mechanics of Materials, Mechanical Engineering, General Materials Science, Condensed Matter Physics

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::dc061e3c5633a5613ec1496d49cde248
https://doi.org/10.1557/s43580-022-00468-z

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المؤلفون: G. Borvon, Guy Turban, D. Goghero, Antoine Goullet

المصدر: Thin Solid Films. 471:123-127

مصطلحات موضوعية: Silicon, Silicon dioxide, Metals and Alloys, Analytical chemistry, chemistry.chemical_element, Surfaces and Interfaces, Substrate (electronics), Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, Helicon, chemistry, Etching (microfabrication), Materials Chemistry, Electrical measurements, Thin film, Silicon oxide

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b263c0ed3d7bc27c5200c87a78f5b05d
https://doi.org/10.1016/j.tsf.2004.04.065

المؤلفون: Jaroslav Pavlik, G. Borvon, Agnès Granier, M. Svec, Philippe Supiot, A. Quédé, Zdenek Stryhal, Patrice Raynaud, Vratislav Perina, Anna Macková

المصدر: Surface Science. :1143-1146

مصطلحات موضوعية: Hexamethyldisiloxane, Analytical chemistry, Surfaces and Interfaces, Chemical vapor deposition, Condensed Matter Physics, Rutherford backscattering spectrometry, Electron cyclotron resonance, Surfaces, Coatings and Films, Elastic recoil detection, chemistry.chemical_compound, chemistry, Plasma-enhanced chemical vapor deposition, Materials Chemistry, Inductively coupled plasma, Plasma processing

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::10b9b244256a17c484c64a3e318537f2
https://doi.org/10.1016/j.susc.2004.06.072

المؤلفون: X Mellhaoui, Agnès Granier, G. Borvon, Antoine Goullet, N Charrouf

المصدر: Materials Science in Semiconductor Processing. 5:279-284

مصطلحات موضوعية: Hexamethyldisiloxane, Materials science, Mechanical Engineering, Analytical chemistry, Infrared spectroscopy, Dielectric, Chemical vapor deposition, Plasma, Condensed Matter Physics, chemistry.chemical_compound, chemistry, Mechanics of Materials, Ellipsometry, Plasma-enhanced chemical vapor deposition, General Materials Science, Dielectric loss

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b52ad2b25dc58945c6a4f4717eb842bd
https://doi.org/10.1016/s1369-8001(02)00105-1

المؤلفون: Guy Turban, Antoine Goullet, Agnès Granier, G. Borvon

المصدر: Plasmas and Polymers. 7:341-352

مصطلحات موضوعية: Hexamethyldisiloxane, Polymers and Plastics, Silicon, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, Chemical vapor deposition, Dielectric, chemistry.chemical_compound, chemistry, Plasma-enhanced chemical vapor deposition, Ellipsometry, Chemical Engineering (miscellaneous), Thin film, Silicon oxide

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ab94cbe7b06daaf54d42b7345444ad4d
https://doi.org/10.1023/a:1021381003259

المؤلفون: G. Borvon, K-A B-T. Meura, Frank Torregrosa, A-S. Robbes, M. Schuhmacher, M-P. Moret

المصدر: 2014 20th International Conference on Ion Implantation Technology (IIT).

مصطلحات موضوعية: Materials science, Semiconductor, Ion implantation, business.industry, Semiconductor device fabrication, Doping, Optoelectronics, Nanotechnology, Wafer, business, Lithography, Plasma-immersion ion implantation, Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b8c4cf6b962e2b121a397c64947f9c2b
https://doi.org/10.1109/iit.2014.6940018

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المؤلفون: Arie van der Lee, Angélique Bousquet, Christiane Leteinturier, Agnès Granier, Antoine Goullet, G. Borvon

المساهمون: Institut des Matériaux Jean Rouxel (IMN), Université de Nantes - UFR des Sciences et des Techniques (UN UFR ST), Université de Nantes (UN)-Université de Nantes (UN)-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC)-Ecole Polytechnique de l'Université de Nantes (EPUN), Université de Nantes (UN)-Université de Nantes (UN), Institut Européen des membranes (IEM), Centre National de la Recherche Scientifique (CNRS)-Ecole Nationale Supérieure de Chimie de Montpellier (ENSCM)-Université Montpellier 2 - Sciences et Techniques (UM2)-Institut de Chimie du CNRS (INC)-Université de Montpellier (UM)

المصدر: International Colloquium on Plasma processes (CIP)
International Colloquium on Plasma processes (CIP), Jun 2003, Antibes, France
Plasma Processes and Polymers
Plasma Processes and Polymers, Wiley-VCH Verlag, 2006, 3, pp.365-373. ⟨10.1002/ppap.200600022⟩

مصطلحات موضوعية: 010302 applied physics, Hexamethyldisiloxane, Polymers and Plastics, Diffusion, [SPI.PLASMA]Engineering Sciences [physics]/Plasmas, Analytical chemistry, chemistry.chemical_element, 02 engineering and technology, Plasma, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, Oxygen, Plasma polymerization, Ion, chemistry.chemical_compound, chemistry, Ellipsometry, Plasma-enhanced chemical vapor deposition, 0103 physical sciences, [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci], [CHIM]Chemical Sciences, 0210 nano-technology, ComputingMilieux_MISCELLANEOUS

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ec34f51652b0cdb474df37b65f0d9e66
https://hal.archives-ouvertes.fr/hal-01741513

المؤلفون: Angélique Bousquet, G. Borvon, Agnès Granier, Arie van der Lee, Christiane Leteinturier, Antoine Goullet

المصدر: Plasma Processes and Polymers. 3:325-325

مصطلحات موضوعية: Front cover, Materials science, Polymers and Plastics, Process (computing), Mechanical engineering, Plasma, Condensed Matter Physics

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::db5a55e0e5db28e846bc1d75130dd282
https://doi.org/10.1002/ppap.200690006