-
1
المصدر: ACS Applied Materials & Interfaces. 12:3179-3187
مصطلحات موضوعية: Materials science, 010405 organic chemistry, Oxide, chemistry.chemical_element, Yttrium, 010402 general chemistry, 01 natural sciences, Surface energy, 0104 chemical sciences, Contact angle, chemistry.chemical_compound, Atomic layer deposition, chemistry, Chemical engineering, General Materials Science, Crystallite, Wetting, Saturation (chemistry)
-
2
المؤلفون: M.M. Duvenhage, Hannes Rijckaert, Philippe Smet, Reinert Verstraete, Christophe Detavernier, Dirk Poelman, Hendrik C. Swart, Elizabeth Coetsee, Isabel Van Driessche, Geert Rampelberg
المصدر: Chemistry of Materials. 31:7192-7202
مصطلحات موضوعية: Materials science, General Chemical Engineering, Phosphor, 02 engineering and technology, General Chemistry, Adhesion, 010402 general chemistry, 021001 nanoscience & nanotechnology, 01 natural sciences, 0104 chemical sciences, chemistry.chemical_compound, Atomic layer deposition, chemistry, Chemical engineering, Materials Chemistry, Surface modification, Thin film, 0210 nano-technology, Layer (electronics), Fluoride
-
3
المؤلفون: Truong Ba Tai, Jolien Dendooven, Felix Mattelaer, Geert Rampelberg, Christophe Detavernier, Fatemeh Sadat Minaye Hashemi, J. Ruud van Ommen, LiAo Cao, Marie-Françoise Reyniers
المصدر: The Journal of Physical Chemistry C. 123:485-494
مصطلحات موضوعية: Materials science, Ligand, chemistry.chemical_element, 02 engineering and technology, 010402 general chemistry, 021001 nanoscience & nanotechnology, Mass spectrometry, Epitaxy, 01 natural sciences, Pyrophoricity, 0104 chemical sciences, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Atomic layer deposition, General Energy, Adsorption, Chemical engineering, chemistry, Aluminium, Thermal, Physical and Theoretical Chemistry, 0210 nano-technology
-
4
المؤلفون: Riikka L. Puurunen, Mikhail Chubarov, Tommi Kääriäinen, Cheol Seong Hwang, Çaǧla Özgit-Akgün, Geert Rampelberg, Erwan Rauwel, Rong Chen, Anjana Devi, David Campbell Cameron, Thomas E. Seidel, Jussi Lyytinen, Liliya Elnikova, A. A. Malkov, Markku Leskelä, Georgi Popov, Henrik Pedersen, Tanja Kallio, A. Outi I. Krause, Jaana Kanervo, Jakob Kuhs, Tobias Törndahl, Gloria Gottardi, A. A. Malygin, Nathanaelle Schneider, Fred Roozeboom, Małgorzata Norek, Marja-Leena Kääriäinen, Adam A. Łapicki, Dohan Kim, Irina Kärkkänen, Fabien Piallat, Harri Lipsanen, Esko Ahvenniemi, Oili Ylivaara, Lev Klibanov, Jyrki Molarius, Claudia Wiemer, Shih Hui Jen, J. Ruud van Ommen, Andrew R. Akbashev, Kestutis Grigoras, Dmitry Suyatin, Christian Militzer, Yury Koshtyal, Hele Savin, Jonas Sundqvist, Timo Sajavaara, Luca Lamagna, Véronique Cremers, Stefan Ivanov Boyadjiev, Mikhail Panov, Saima Ali, Oksana Yurkevich, Dennis M. Hausmann, Ivan Khmelnitskiy, Hossein Salami, Viktor Drozd, Mikhael Bechelany, Robin H. A. Ras, Abdelkader Mennad, Maria Berdova
المساهمون: Publica, Institut Européen des membranes (IEM), Centre National de la Recherche Scientifique (CNRS)-Ecole Nationale Supérieure de Chimie de Montpellier (ENSCM)-Université Montpellier 2 - Sciences et Techniques (UM2)-Institut de Chimie du CNRS (INC)-Université de Montpellier (UM), University hospital of Zurich [Zurich], Science et Ingénierie des Matériaux et Procédés (SIMaP ), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), Functional Imaging Unit Glostrup Hospital, Glostrup Hospital, Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Laboratoire de Mathématiques Jean Leray (LMJL), Centre National de la Recherche Scientifique (CNRS)-Université de Nantes - UFR des Sciences et des Techniques (UN UFR ST), Université de Nantes (UN)-Université de Nantes (UN), Istituto per la Microelettronica e Microsistemi [Catania] (IMM), Consiglio Nazionale delle Ricerche (CNR), Plasma & Materials Processing, Applied Physics and Science Education, Department of Chemistry, Stanford University, Department of Materials Science and Engineering, Centre National de la Recherche Scientifique (CNRS), University of Twente, Bulgarian Academy of Sciences, Masaryk University, Huazhong University of Science and Technology, Université Grenoble Alpes, Ghent University, Ruhr University Bochum, St. Petersburg State University, Alikhanov Institute for Theoretical and Experimental Physics, Fondazione Bruno Kessler, VTT Technical Research Centre of Finland, Lam Research Corporation, Seoul National University, Global Foundries, Inc., St. Petersburg State Electrotechnical University, Massachusetts Institute of Technology, Techinsights, Ioffe Institute, SENTECH Instruments GmbH, NovaldMedical Ltd Oy, STMicroelectronics, Seagate Technology (Ireland), University of Helsinki, Department of Micro and Nanosciences, St. Petersburg State Institute of Technology, Renewable Energy Development Center, Chemnitz University of Technology, Summa Semiconductor Oy, Military University of Technology Warsaw, ASELSAN Inc., Linköping University, KOBUS, Department of Chemical and Metallurgical Engineering, Department of Applied Physics, Tallinn University of Technology, Netherlands Organisation for Applied Scientific Research, University of Jyväskylä, University of Maryland, College Park, Institut de recherche et développement sur l’énergie photovoltaïque, Seitek50, Fraunhofer Institute for Ceramic Technologies and Systems, Lund University, Uppsala University, Delft University of Technology, National Research Council of Italy, Immanuel Kant Baltic Federal University, Department of Chemistry and Materials Science, Department of Electronics and Nanoengineering, Aalto-yliopisto, Aalto University, Ecole Nationale Supérieure de Chimie de Montpellier (ENSCM)-Institut de Chimie du CNRS (INC)-Université de Montpellier (UM)-Centre National de la Recherche Scientifique (CNRS), Université de Nantes - UFR des Sciences et des Techniques (UN UFR ST), Université de Nantes (UN)-Université de Nantes (UN)-Centre National de la Recherche Scientifique (CNRS), National Research Council of Italy | Consiglio Nazionale delle Ricerche (CNR), ANR-11-LABX-0020,LEBESGUE,Centre de Mathématiques Henri Lebesgue : fondements, interactions, applications et Formation(2011)
المصدر: Journal of Vacuum Science and Technology. Part A: International Journal Devoted to Vacuum, Surfaces, and Films, 35(1)
Journal of Vacuum Science and Technology A
Journal of Vacuum Science and Technology A, American Vacuum Society, 2017, 35 (1), ⟨10.1116/1.4971389⟩
Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, 35(1):010801, 1-13. AVS Science and Technology Society
Ahvenniemi, E, Akbashev, A, Ali, S, Bechelany, M, Berdova, M, Boyadjiev, S, Cameron, D, Chen, R, Chubarov, M, Cremers, V, Devi, A, Drozd, V, Elnikova, L, Gottardi, G, Grigoras, K, Hausmann, D, Hwang, C S, Jen, S-H, Kallio, T, Kanervo, J, Khmelnitskiy, I, Kim, D H, Klibanov, L, Koshtyal, Y, Krause, O, Kuhs, J, Kärkkänen, I, Kääriäinen, M-L, Kääriäinen, T, Lamagna, L, Lapicki, A, Leskelä, M, Lipsanen, H, Lyytinen, J, Malkov, A, Malygin, A, Mennad, A, Militzer, C, Molarius, J, Norek, M, Özgit-Akgün, Ç, Panov, M, Pedersen, H, Piallat, F, Popov, G, Puurunen, R, Rampelberg, G, Ras, R H A, Rauwel, E, Roozeboom, F, Sajavaara, T, Salami, H, Savin, H, Schneider, N, Seidel, T E, Sundqvist, J, Suyatin, D, Törndahl, T, van Ommen, J R, Wiemer, C, Ylivaara, O & Yurkevich, O 2017, ' Review Article: Recommended reading list of early publications on atomic layer deposition : Outcome of the "Virtual Project on the History of ALD" ', Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, vol. 35, no. 1, 010801 . https://doi.org/10.1116/1.4971389
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2, 35
Journal of Vacuum Science & Technology A
Journal of Vacuum Science & Technology A, 2017, 35 (1), ⟨10.1116/1.4971389⟩مصطلحات موضوعية: semiconductor manufacturing, Thin films, Patent literature, 2015 Nano Technology, HOL - Holst, Library science, Nanotechnology, 02 engineering and technology, deposition, 01 natural sciences, Poster presentations, Atomic layer deposition, 0103 physical sciences, Atomic layer epitaxy, [CHIM]Chemical Sciences, Reading list, Patents, ComputingMilieux_MISCELLANEOUS, gas-solid reaction, 010302 applied physics, TS - Technical Sciences, Industrial Innovation, inorganic material, Physics, Silica, Surfaces and Interfaces, atomikerroskasvatus, Atomic layer, 021001 nanoscience & nanotechnology, Condensed Matter Physics, history of technology, Surfaces, Coatings and Films, ALD, 0210 nano-technology, Soviet union, Atomic layer epitaxial growth, Epitaxy
وصف الملف: application/pdf
-
5
المؤلفون: Jolien Dendooven, Sara Bals, Geert Rampelberg, Nathalie Claes, Christophe Detavernier, Herman Terryn, Thais Milagres de Oliveira, Kitty Baert, Véronique Cremers, Shoshan Tamar Abrahami
المساهمون: Materials and Chemistry, Electrochemical and Surface Engineering, Faculty of Sciences and Bioengineering Sciences, Materials and Surface Science & Engineering, Applied Physics and Photonics
المصدر: Journal of vacuum science and technology: A: vacuum surfaces and films
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY Aمصطلحات موضوعية: GRAPHENE, Materials science, COPPER, chemistry.chemical_element, 02 engineering and technology, engineering.material, 010402 general chemistry, 01 natural sciences, Corrosion, Coatings and Films, Atomic layer deposition, Coating, Thin film, TEMPERATURE, Deposition (law), COATINGS, Physics, AL2O3, Surfaces and Interfaces, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Copper, 0104 chemical sciences, Surfaces, Coatings and Films, Surfaces, Chemistry, Physics and Astronomy, Chemical engineering, chemistry, engineering, TIO2, GROWTH, ALUMINA, 0210 nano-technology, Layer (electronics), RESISTANCE, BEHAVIOR, Titanium
وصف الملف: pdf; application/pdf
-
6
المؤلفون: Naoufal Bahlawane, Ivan P. Parkin, Koen Martens, L. Fang, Felix Mattelaer, Vasu Prasad Prasadam, Yinzhu Jiang, Geert Rampelberg, Christophe Detavernier, Ioannis Papakonstantinou
المصدر: Materials Today Chemistry
مصطلحات موضوعية: Materials science, Polymers and Plastics, Oxide, Vanadium, chemistry.chemical_element, Nanotechnology, 02 engineering and technology, Chemical vapor deposition, 010402 general chemistry, 7. Clean energy, 01 natural sciences, Catalysis, Vanadium oxide, Biomaterials, chemistry.chemical_compound, Atomic layer deposition, Colloid and Surface Chemistry, Materials Chemistry, Microelectronics, Thin film, Supercapacitor, business.industry, 021001 nanoscience & nanotechnology, 0104 chemical sciences, Electronic, Optical and Magnetic Materials, chemistry, 0210 nano-technology, business
-
7
المؤلفون: Karen Leus, Henk Vrielinck, Geert Rampelberg, Freddy Callens, Hannes Depauw, Pascal Van Der Voort, Irena Nevjestic, Claire A. Murray, Christophe Detavernier
المصدر: The Journal of Physical Chemistry C. 120:17400-17407
مصطلحات موضوعية: Diffraction, Chemistry, Doping, 02 engineering and technology, 010402 general chemistry, 021001 nanoscience & nanotechnology, 01 natural sciences, Spectral line, 0104 chemical sciences, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, law.invention, Ion, Crystallography, General Energy, law, Metastability, X-ray crystallography, Metal-organic framework, Physical and Theoretical Chemistry, 0210 nano-technology, Electron paramagnetic resonance
-
8
المؤلفون: Luís Miguel Cunha, Christophe Detavernier, Geert Rampelberg, C.I. da Silva-Oliveira, M. Apreutesei, Diego Martinez-Martinez
المساهمون: Matériaux, ingénierie et science [Villeurbanne] ( MATEIS ), Université Claude Bernard Lyon 1 ( UCBL ), Université de Lyon-Université de Lyon-Centre National de la Recherche Scientifique ( CNRS ) -Institut National des Sciences Appliquées de Lyon ( INSA Lyon ), Université de Lyon-Institut National des Sciences Appliquées ( INSA ) -Institut National des Sciences Appliquées ( INSA ), Universidade do Minho, Matériaux, ingénierie et science [Villeurbanne] (MATEIS), Université Claude Bernard Lyon 1 (UCBL), Université de Lyon-Université de Lyon-Institut National des Sciences Appliquées de Lyon (INSA Lyon), Université de Lyon-Institut National des Sciences Appliquées (INSA)-Institut National des Sciences Appliquées (INSA)-Centre National de la Recherche Scientifique (CNRS), Universiteit Gent = Ghent University [Belgium] (UGENT)
المصدر: Vacuum
Vacuum, Elsevier, 2018, 151, pp.148-155. 〈10.1016/j.vacuum.2018.02.002〉
Vacuum, Elsevier, 2018, 151, pp.148-155. ⟨10.1016/j.vacuum.2018.02.002⟩
Repositório Científico de Acesso Aberto de Portugal
Repositório Científico de Acesso Aberto de Portugal (RCAAP)
instacron:RCAAPمصطلحات موضوعية: Materials science, Phases, Ciências Naturais::Ciências Físicas, XRD, Ciências Físicas [Ciências Naturais], [ SPI.MAT ] Engineering Sciences [physics]/Materials, Oxide, 02 engineering and technology, 010402 general chemistry, 01 natural sciences, [SPI.MAT]Engineering Sciences [physics]/Materials, Oxynitride, Heating, chemistry.chemical_compound, Engenharia dos Materiais [Engenharia e Tecnologia], Thermal stability, Cubic zirconia, Thin film, Instrumentation, Science & Technology, Foundation (engineering), Sputter deposition, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Engineering physics, 0104 chemical sciences, Surfaces, Coatings and Films, Engenharia e Tecnologia::Engenharia dos Materiais, chemistry, Zirconia, 0210 nano-technology, Science, technology and society
وصف الملف: application/pdf
-
9
المؤلفون: Geert Rampelberg, Iuliana Radu, Wouter Devulder, Bob De Schutter, Christophe Detavernier, Koen Martens
المصدر: Journal of Materials Chemistry C. 3:11357-11365
مصطلحات موضوعية: Materials science, Annealing (metallurgy), Analytical chemistry, chemistry.chemical_element, Vanadium, General Chemistry, Chemical vapor deposition, Partial pressure, Oxygen, Vanadium oxide, chemistry, Materials Chemistry, Thin film, Sheet resistance
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3640e6e38e616e46bf8a636f57544462
https://doi.org/10.1039/c5tc02553b -
10
المؤلفون: Geert Rampelberg, Karl Opsomer, Christophe Detavernier, Malgorzata Jurczak, Bob De Schutter, Ludovic Goux, Wouter Devulder, Kilian Devloo-Casier
المصدر: Journal of Materials Chemistry C. 3:12469-12476
مصطلحات موضوعية: Materials science, Programmable metallization cell, chemistry.chemical_element, General Chemistry, Copper, law.invention, Crystallography, X-ray photoelectron spectroscopy, chemistry, Chemical engineering, law, Phase (matter), Materials Chemistry, Thermal stability, Thin film, Crystallization, Layer (electronics)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6d783bd4dc2e0b3418dbb7305ee66439
https://doi.org/10.1039/c5tc02776d
Find this issue from the American Chemical Society 
Find this article in full text from Scitation.