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المؤلفون: Catherine B. Labelle, Bhaskar Nagabhirava, Andre Labonte, Xun Xiang, Stefan Schmitz, Genevieve Beique, Michael Goss, Phil Friddle, Lei Sun, Dominik Metzler, John C. Arnold
المصدر: Advanced Etch Technology for Nanopatterning VII.
مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, fungi, technology, industry, and agriculture, macromolecular substances, 02 engineering and technology, Surface finish, 021001 nanoscience & nanotechnology, 01 natural sciences, 010305 fluids & plasmas, stomatognathic system, Resist, Extreme ultraviolet, 0103 physical sciences, Trench, Deposition (phase transition), Optoelectronics, 0210 nano-technology, business, Critical dimension, Layer (electronics)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9f1cc23cf3bbc0ccbd929bec81f3e4ef
https://doi.org/10.1117/12.2297413 -
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المؤلفون: Martin O'Toole, James Hsueh-Chung Chen, Shreesh Narasimha, Jason Eugene Stephens, Shao Beng Law, Genevieve Beique, Ben Kim, Craig Child, E. Todd Ryan, Steven Leibiger, Louis J. Lanzerotti, Terry A. Spooner
المصدر: 2017 IEEE International Interconnect Technology Conference (IITC).
مصطلحات موضوعية: 010302 applied physics, Materials science, business.industry, Optical engineering, Pillar, Nanotechnology, 01 natural sciences, Aspect ratio (image), Planarity testing, 010309 optics, Chemical-mechanical planarization, 0103 physical sciences, Multiple patterning, Optoelectronics, business, Layer (electronics)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4672fecbe6df4af021d44ffb253152cc
https://doi.org/10.1109/iitc-amc.2017.7968964 -
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المؤلفون: Genevieve Beique, Nicole Saulnier, Seulgi Han, John C. Arnold, Tae-Hwan Oh, Tsuyoshi Furukawa, Lovejeet Singh, Luciana Meli, Jeffrey C. Shearer, Indira Seshadri, Ramakrishnan Ayothi, Nelson Felix, Bassem Hamieh, Karen Petrillo, Lei Sun, Joe Lee, Anuja De Silva
المصدر: SPIE Proceedings.
مصطلحات موضوعية: 010302 applied physics, Materials science, Single exposure, business.industry, Extreme ultraviolet lithography, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Resist, Extreme ultraviolet, 0103 physical sciences, Multiple patterning, Optoelectronics, Process window, 0210 nano-technology, business, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6e5ed37acd89635995e51d248a57ef11
https://doi.org/10.1117/12.2261216 -
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المؤلفون: Deepika Priyadarshini, Raghuveer R. Patlolla, Bassem Hamieh, O. van der Straten, Son Nguyen, Motoyama Koichi, B. Peethala, Nicole Saulnier, Vamsi Paruchuri, X. Zhang, Shariq Siddiqui, Frank W. Mont, Griselda Bonilla, Theodorus E. Standaert, Yongan Xu, Hao Tang, P. McLaughlin, J. McMahon, Donald F. Canaperi, Yann Mignot, Daniel C. Edelstein, John C. Arnold, Genevieve Beique, Terry A. Spooner, Michael Rizzolo, Hosadurga Shobha, Chen Hsueh-Chung, Matthew E. Colburn, Shyng-Tsong Chen, Jia Lee, Erik Verduijn
المصدر: 2016 IEEE International Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC).
مصطلحات موضوعية: 010302 applied physics, Materials science, business.industry, Extreme ultraviolet lithography, Nanotechnology, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, law.invention, law, 0103 physical sciences, Process integration, Multiple patterning, Optoelectronics, Node (circuits), X-ray lithography, Photolithography, 0210 nano-technology, business, Next-generation lithography, Immersion lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5c0508da0c8086bb163ee96b110b85f8
https://doi.org/10.1109/iitc-amc.2016.7507636 -
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المؤلفون: Genevieve Beique, Lei Sun, Jeffrey S. Smith, Wenhui Wang, Richard A. Farrell, C. Labelle, Peter Biolsi, Kal Subhadeep, Cheryl Periera, Elliott Franke, Erik Verdujn, Ryoung-han Kim, Erik R. Hosler, Nihar Mohanty, Akiteru Ko, Anton J. deVilliers
المصدر: SPIE Proceedings.
مصطلحات موضوعية: 010302 applied physics, Materials science, Extreme ultraviolet lithography, Nanotechnology, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Engineering physics, Mandrel, Back end of line, Resist, Stack (abstract data type), 0103 physical sciences, Node (circuits), 0210 nano-technology, Front end of line, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e07c4b879800bf2f04725b9bd26243a8
https://doi.org/10.1117/12.2219259 -
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المؤلفون: John C. Arnold, C. Labelle, Yannick Feurprier, Andrew Metz, Hongyun Cottle, Genevieve Beique, Vinayak Rastogi, Matthew E. Colburn, Alok Ranjan, Lei Sun, Kaushik A. Kumar
المصدر: SPIE Proceedings.
مصطلحات موضوعية: 010302 applied physics, Plasma etching, Passivation, business.industry, Extreme ultraviolet lithography, Nanotechnology, 02 engineering and technology, Surface finish, 021001 nanoscience & nanotechnology, 01 natural sciences, Resist, Etching (microfabrication), 0103 physical sciences, Optoelectronics, Capacitively coupled plasma, 0210 nano-technology, business, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a546ee462e3b93d5a6eec56b65a3ffc6
https://doi.org/10.1117/12.2216840 -
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المؤلفون: Bong Cheol Kim, Bassem Hamieh, Genevieve Beique, Karen Petrillo, Eunshoo Han, Erik Verduijn, Lei Sun, Martin Burkhardt, Shinichiro Kawakami, Corey Lemley, Jongsu Kim, Dave Hetzer, Yann Mignot, Andre Labonte, R. Johnson, Stuart A. Sieg, Indira Seshadri, Geng Han, Derren N. Dunn, Nelson Felix, Eric R. Miller, Hao Tang, Koichi Hontake, Anuja De Silva, Yongan Xu, Lior Huli, Dan Corliss, Koichi Matsunaga, Christopher F. Robinson, Mary Breton, Nicole Saulnier, Luciana Meli
المصدر: Extreme Ultraviolet (EUV) Lithography VII.
مصطلحات موضوعية: 010302 applied physics, Process (engineering), Computer science, Extreme ultraviolet lithography, Nanotechnology, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Engineering physics, Resist, 0103 physical sciences, Multiple patterning, Process window, Node (circuits), IBM, 0210 nano-technology, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0a13233cfa0c903396500e45f9f68353
https://doi.org/10.1117/12.2219894 -
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المؤلفون: Erik Verduijn, Nicole Saulnier, Hao Tang, Yulu Chen, Yongan Xu, Lei Sun, Ryoung-han Kim, Wenhui Wang, Genevieve Beique, John C. Arnold, Matthew E. Colburn, Nelson Felix
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Physics, Left and right, business.industry, Spectral density, 02 engineering and technology, Edge (geometry), 021001 nanoscience & nanotechnology, Line edge roughness, 01 natural sciences, Metrology, 010309 optics, Optics, 0103 physical sciences, Line (text file), 0210 nano-technology, business, Lithography, Critical dimension
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::549887d64182dca9fc916b125f0e5f56
https://doi.org/10.1117/12.2219665 -
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المؤلفون: Lei Sun, Ryoung-han Kim, Obert Wood, Genevieve Beique, Wenhui Wang
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Physics, Optics, business.industry, Frequency domain, Sigma, Spectral density, Low frequency, business, Line edge roughness, Lithography, Standard deviation, Characterization (materials science)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ca2bb014faa3ceffb44a02db419a5b26
https://doi.org/10.1117/12.2086961 -
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المؤلفون: Mignot Yann, Phil Friddle, Catherine B. Labelle, Stafan Schmitz, Genevieve Beique, Bhaskar Nagabhirava, John C. Arnold, Changwoo Lee, Peng Wang, Andre Labonte, Michael Goss, Richard D. Yang, John Mucci, Jian Wu, Bassem Hamieh, Nouradine Rassoul
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Plasma etching, business.industry, Extreme ultraviolet lithography, Nanotechnology, law.invention, Back end of line, Resist, law, Multiple patterning, Optoelectronics, Wafer, Photolithography, business, Next-generation lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::38c42c364be3292bcac17786904b382d
https://doi.org/10.1117/12.2087133