-
1دورية أكاديمية
المؤلفون: Hee-Tae Kwon, In-Young Bang, Jae-Hyeon Kim, Hyeon-Jo Kim, Seong-Yong Lim, Seo-Yeon Kim, Seong-Hee Cho, Ji-Hwan Kim, Woo-Jae Kim, Gi-Won Shin, Gi-Chung Kwon
المصدر: Nanomaterials, Vol 14, Iss 2, p 209 (2024)
مصطلحات موضوعية: low temperature, plasma etching, high aspect ratio, necking ratio, SiO2, trench, Chemistry, QD1-999
وصف الملف: electronic resource
-
2دورية أكاديمية
المؤلفون: Ku Youn Baik, Hyun Jo, Se Hoon Ki, Gi-Chung Kwon, Guangsup Cho
المصدر: Applied Sciences, Vol 13, Iss 5, p 3324 (2023)
مصطلحات موضوعية: cold atmospheric pressure plasma jet, hydrogen peroxide, hurdle principle, Enterococcus faecalis, Technology, Engineering (General). Civil engineering (General), TA1-2040, Biology (General), QH301-705.5, Physics, QC1-999, Chemistry, QD1-999
وصف الملف: electronic resource
-
3مؤتمر
المؤلفون: Young June Hong, Phil Yong Oh, Gi Chung Kwon, Hee Myoung Shin, Eun Ha Choi
المصدر: 2008 IEEE 35th International Conference on Plasma Science Plasma Science, 2008. ICOPS 2008. IEEE 35th International Conference on. :1-1 Jun, 2008
Relation: 2008 IEEE 35th International Conference on Plasma Science (ICOPS)
-
4مؤتمر
المؤلفون: Tae-Hoon Jo, Myoung-Soo Yun, Bu-Il Jeon, GwangSup Cho, Gi-Chung kwon, Jang-Hoon Choi, Dong-Jin Kim, Chang-Kil Nam
المصدر: 2011 Abstracts IEEE International Conference on Plasma Science Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on. :1-1 Jun, 2011
Relation: 2011 IEEE 38th International Conference on Plasma Sciences (ICOPS)
-
5دورية أكاديمية
المؤلفون: Woo-Jae Kim, In-Young Bang, Ji-Hwan Kim, Yeon-Soo Park, Hee-Tae Kwon, Gi-Won Shin, Min-Ho Kang, Youngjun Cho, Byung-Hyang Kwon, Jung-Hun Kwak, Gi-Chung Kwon
المصدر: Materials, Vol 14, Iss 11, p 3026 (2021)
مصطلحات موضوعية: nitrogen oxide trifluoride, nitrogen fluoride oxide, reactive ion etch, silicon oxide etch, Technology, Electrical engineering. Electronics. Nuclear engineering, TK1-9971, Engineering (General). Civil engineering (General), TA1-2040, Microscopy, QH201-278.5, Descriptive and experimental mechanics, QC120-168.85
وصف الملف: electronic resource
-
6مؤتمر
المؤلفون: Gi-Chung Kwon, Hong-Seub Kim, Joung-Sik Kim, Seong-Hyuk Choi, Jea-Hong Jun, Lee, D.S., Lee, Y.K., Chang, H.Y.
المصدر: The 30th International Conference on Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. Plasma science Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on. :403 2003
Relation: 30th International Conference on Plasma Science
-
7مؤتمر
المؤلفون: Jeong Beom Lee, Jeong Hoon Han, Chul Sik Kim, Dae Bong Kang, Gi-Chung Kwon, Young Lee
المصدر: The 30th International Conference on Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. Plasma science Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on. :421 2003
Relation: 30th International Conference on Plasma Science
-
8
المؤلفون: Gi Won Shin, Jae Hyeon Kim, Sun Hee Lee, In Young Bang, Ji Hwan Kim, Yeon Soo Park, Hee Tae Kwon, Woo Jae Kim, Gi-Chung Kwon
المصدر: The Review of scientific instruments. 93(10)
مصطلحات موضوعية: Instrumentation
-
9دورية أكاديمية
المؤلفون: Dong Uk Lee, Jin Yeong Jeong, Ji Woong Han, Gi-Chung Kwon, Pankaj Attri, In Tae Kim
المصدر: International Journal of Polymer Science, Vol 2018 (2018)
مصطلحات موضوعية: Chemical technology, TP1-1185
وصف الملف: electronic resource
-
10
المؤلفون: Gi Won Shin, Woo-Jae Kim, Hee Tae Kwon, Gi-Chung Kwon, Tae Hyun Lee, Hwan Hee Lee
المصدر: Journal of the Korean Physical Society. 77:477-481
مصطلحات موضوعية: 010302 applied physics, Materials science, Infrared, business.industry, General Physics and Astronomy, Atmospheric-pressure plasma, 02 engineering and technology, Plasma, 021001 nanoscience & nanotechnology, 01 natural sciences, Power (physics), Thermometer, 0103 physical sciences, Optoelectronics, Wafer, Current (fluid), 0210 nano-technology, business, Intensity (heat transfer)