المؤلفون: Hee-Tae Kwon, In-Young Bang, Jae-Hyeon Kim, Hyeon-Jo Kim, Seong-Yong Lim, Seo-Yeon Kim, Seong-Hee Cho, Ji-Hwan Kim, Woo-Jae Kim, Gi-Won Shin, Gi-Chung Kwon

المصدر: Nanomaterials, Vol 14, Iss 2, p 209 (2024)

مصطلحات موضوعية: low temperature, plasma etching, high aspect ratio, necking ratio, SiO2, trench, Chemistry, QD1-999

وصف الملف: electronic resource

Relation: https://www.mdpi.com/2079-4991/14/2/209; https://doaj.org/toc/2079-4991

URL الوصول: https://doaj.org/article/67d0432f2d594cf39879c0f865a12bfd

المؤلفون: Ku Youn Baik, Hyun Jo, Se Hoon Ki, Gi-Chung Kwon, Guangsup Cho

المصدر: Applied Sciences, Vol 13, Iss 5, p 3324 (2023)

مصطلحات موضوعية: cold atmospheric pressure plasma jet, hydrogen peroxide, hurdle principle, Enterococcus faecalis, Technology, Engineering (General). Civil engineering (General), TA1-2040, Biology (General), QH301-705.5, Physics, QC1-999, Chemistry, QD1-999

وصف الملف: electronic resource

Relation: https://www.mdpi.com/2076-3417/13/5/3324; https://doaj.org/toc/2076-3417

URL الوصول: https://doaj.org/article/8af4c59ce00f4af884d16e6fead0d13b

المؤلفون: Woo-Jae Kim, In-Young Bang, Ji-Hwan Kim, Yeon-Soo Park, Hee-Tae Kwon, Gi-Won Shin, Min-Ho Kang, Youngjun Cho, Byung-Hyang Kwon, Jung-Hun Kwak, Gi-Chung Kwon

المصدر: Materials, Vol 14, Iss 11, p 3026 (2021)

مصطلحات موضوعية: nitrogen oxide trifluoride, nitrogen fluoride oxide, reactive ion etch, silicon oxide etch, Technology, Electrical engineering. Electronics. Nuclear engineering, TK1-9971, Engineering (General). Civil engineering (General), TA1-2040, Microscopy, QH201-278.5, Descriptive and experimental mechanics, QC120-168.85

وصف الملف: electronic resource

Relation: https://www.mdpi.com/1996-1944/14/11/3026; https://doaj.org/toc/1996-1944

URL الوصول: https://doaj.org/article/2af626a19e554cee878df1d505c52ecd

المؤلفون: Dong Uk Lee, Jin Yeong Jeong, Ji Woong Han, Gi-Chung Kwon, Pankaj Attri, In Tae Kim

المصدر: International Journal of Polymer Science, Vol 2018 (2018)

مصطلحات موضوعية: Chemical technology, TP1-1185

وصف الملف: electronic resource

Relation: https://doaj.org/toc/1687-9422; https://doaj.org/toc/1687-9430

URL الوصول: https://doaj.org/article/f341b5f04ab943c98a8bb3ffe54ae9a9

المؤلفون: Nagendra Kumar Kaushik, Hong Seon Kim, Young June Chae, Young Nam Lee, Gi-Chung Kwon, Eun Ha Choi, In Tae Kim

المصدر: Molecules, Vol 17, Iss 10, Pp 11456-11468 (2012)

مصطلحات موضوعية: thienyl derivatives, T98G gliomas, HEK cells, Organic chemistry, QD241-441

وصف الملف: electronic resource

Relation: http://www.mdpi.com/1420-3049/17/10/11456; https://doaj.org/toc/1420-3049

URL الوصول: https://doaj.org/article/0751c6780c084422a1231100d0695fbd

المؤلفون: In Tae Kim, Gi-Chung Kwon, Eun Ha Choi, Seung-Hyun Lee, Young Sun Kim, Jong Hyun Kim, Ju Hyon Cha, Sung Ho Kim, Pankaj Attri

المصدر: International Journal of Polymer Science, Vol 2015 (2015)

مصطلحات موضوعية: Chemical technology, TP1-1185

وصف الملف: electronic resource

Relation: https://doaj.org/toc/1687-9422; https://doaj.org/toc/1687-9430

URL الوصول: https://doaj.org/article/b0bbda37d3cc409fab81fec3f585dd2c

المؤلفون: Pankaj Attri, Seung-Hyun Lee, Sun Woo Hwang, Joong I L Kim, Sang Woo Lee, Gi-Chung Kwon, Eun Ha Choi, In Tae Kim

المصدر: PLoS ONE, Vol 8, Iss 7, p e68970 (2013)

مصطلحات موضوعية: Medicine, Science

وصف الملف: electronic resource

Relation: http://europepmc.org/articles/PMC3706474?pdf=render; https://doaj.org/toc/1932-6203

URL الوصول: https://doaj.org/article/50267ae1f9194379992bc8603f8dc757

المؤلفون: Young June Hong, Phil Yong Oh, Gi Chung Kwon, Hee Myoung Shin, Eun Ha Choi

المصدر: 2008 IEEE 35th International Conference on Plasma Science Plasma Science, 2008. ICOPS 2008. IEEE 35th International Conference on. :1-1 Jun, 2008

Relation: 2008 IEEE 35th International Conference on Plasma Science (ICOPS)

المؤلفون: Tae-Hoon Jo, Myoung-Soo Yun, Bu-Il Jeon, GwangSup Cho, Gi-Chung kwon, Jang-Hoon Choi, Dong-Jin Kim, Chang-Kil Nam

المصدر: 2011 Abstracts IEEE International Conference on Plasma Science Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on. :1-1 Jun, 2011

Relation: 2011 IEEE 38th International Conference on Plasma Sciences (ICOPS)

المؤلفون: Gi-Chung Kwon, Hong-Seub Kim, Joung-Sik Kim, Seong-Hyuk Choi, Jea-Hong Jun, Lee, D.S., Lee, Y.K., Chang, H.Y.

المصدر: The 30th International Conference on Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. Plasma science Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on. :403 2003

Relation: 30th International Conference on Plasma Science