يعرض 1 - 10 نتائج من 18 نتيجة بحث عن '"Gideon Jones"', وقت الاستعلام: 1.02s تنقيح النتائج
  1. 1
    How we are making the 0.5-NA Berkeley mirco-field exposure tool stable and productive

    المؤلفون: Patrick P. Naulleau, Daniel Zehm, Lauren McQuade, Wenhua Zhu, Christopher L. Anderson, Jason DePonte, Seno Rekawa, Eric M. Gullikson, M.R. Dickinson, Weilun Chao, Farhad Salmassi, Jeff Gamsby, Ryan Miyakawa, Will Cork, Rene Delano, Lucas Conley, Carl Cork, Brandon Vollmer, Geoff Gaines, Arnaud P. Allezy, Gideon Jones

    المصدر: Extreme Ultraviolet (EUV) Lithography XI.

    مصطلحات موضوعية: Scanner, Materials science, business.industry, Extreme ultraviolet lithography, Photoresist, Vibration, symbols.namesake, Fourier transform, Vibration isolation, Optics, Resist, symbols, business, MOX fuel

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6fcdd18ed1291baa8f99cac8ae4dcc2d
    https://doi.org/10.1117/12.2552125

    أضف إلى المفضلة
  2. 2
    Achieving diffraction-limited performance on the Berkeley MET5

    المؤلفون: Wenhua Zhu, Sharon Oh, Patrick P. Naulleau, Christopher N. Anderson, Michael Dickenson, Jeff Gamsby, Weilun Chao, Carl Cork, Seno Rekawa, Geoff Gaines, Gideon Jones, Ryan Miyakawa

    المساهمون: Goldberg, Kenneth A

    مصطلحات موضوعية: Physics, Diffraction, Wavefront, Interferometry, Light source, Optics, business.industry, Extreme ultraviolet lithography, Shearing interferometer, business, Projection (set theory), Lithography, Eye Disease and Disorders of Vision

    وصف الملف: application/pdf

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e1ec09d61f09b789c160cc41554dc0f1
    https://escholarship.org/uc/item/7xf352nz

    أضف إلى المفضلة
  3. 3
    Overview and status of the 0.5NA EUV microfield exposure tool at Berkeley Lab

    المؤلفون: Jason DePonte, Christopher N. Anderson, Will Cork, Rene Delano, Jeff Gamsby, Eric M. Gullikson, Senajith Rekawa, Weilun Chao, Patrick P. Naulleau, Farhad Salmassi, Ryan Miyakawa, Brandon Vollmer, Geoff Gaines, Carl Cork, Stephen Meyers, Wenhua Zhu, Gideon Jones, M.R. Dickinson, Arnaud P. Allezy, Daniel Zehm

    المساهمون: Goldberg, Kenneth A

    مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, Field of view, Synchrotron, law.invention, Optics, Beamline, law, Extreme ultraviolet, Wafer, business, Lithography, Aerial image

    وصف الملف: application/pdf

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0b94d6e57f0b524b507cc028fe56d679
    https://escholarship.org/uc/item/4m8939b8

    أضف إلى المفضلة
  4. 4
    Building evidence around ghost gear:Global trends and analysis for sustainable solutions at scale

    المؤلفون: Amy R. Knowlton, Kelsey Richardson, Regina Asmutis-Silvia, Susan G. Barco, Kevin O'Brien, Allison Henry, Jooke Robbins, Gideon Jones, Julie van der Hoop, Joan Drinkwin, Michael J. Moore, Kristen MacDonald, David K. Mattila, Kyle Antonelis, Laura Ludwig, Elizabeth Hogan, Hannah Pragnell-Raasch, Jason Morgan, Kirsten V. K. Gilardi, Scott Landry, Ingrid Giskes

    المصدر: Richardson, K, Asmutis-Silvia, R, Drinkwin, J, Gilardi, K V K, Giskes, I, Jones, G, O'Brien, K, Pragnell-Raasch, H, Ludwig, L, Antonelis, K, Barco, S G, Henry, A, Knowlton, A, Landry, S, Mattila, D, MacDonald, K, Moore, M, Morgan, J, Robbins, J, van der Hoop, J & Hogan, E 2019, ' Building evidence around ghost gear : Global trends and analysis for sustainable solutions at scale ', Marine Pollution Bulletin, vol. 138, pp. 222-229 . https://doi.org/10.1016/j.marpolbul.2018.11.031

    مصطلحات موضوعية: 0106 biological sciences, Fishing, Marine debris, Wildlife, Fisheries, 010501 environmental sciences, Aquatic Science, Environment, Oceanography, 01 natural sciences, Ghost fishing, Session (web analytics), Entanglement, Abandoned, Lost or Discarded Fishing Gear (ALDFG), 0105 earth and related environmental sciences, Data collection, business.industry, 010604 marine biology & hydrobiology, Ingestion, Environmental resource management, Water Pollution, Congresses as Topic, Pollution, Derelict Fishing Gear (DFG), Work (electrical), Fishing industry, Equipment and Supplies, Scale (social sciences), Business

    وصف الملف: application/pdf

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cf129442aaebd25c520bed51f9ee0e6e
    https://pure.au.dk/ws/files/194219287/Building_evidence_around_ghost_gear.pdf

    أضف إلى المفضلة
  5. 5
    Commissioning an EUV mask microscope for lithography generations reaching 8 nm

    المؤلفون: Patrick P. Naulleau, William Cork, Iacopo Mochi, Jason DePonte, Jeffrey F. Gamsby, Arnaud P. Allezy, Eric M. Gullikson, Veljko Milanovic, M.R. Dickinson, Eric Van Every, Douglas Van Camp, Markus P. Benk, W. Chao, Senajith Rekawa, Erik H. Anderson, James Macdougall, Elizabeth Martin, Kenneth A. Goldberg, Rene Delano, Daniel Zehm, Eric Acome, Vamsi Vytla, Carl Cork, M. S. Gideon Jones, Farhad Salmassi, Hanjing Huang, William B. Ghiorso

    المصدر: Extreme Ultraviolet (EUV) Lithography IV.

    مصطلحات موضوعية: Physics, Microscope, business.industry, Extreme ultraviolet lithography, law.invention, Numerical aperture, Optics, law, Extreme ultraviolet, Reticle, Photomask, business, Lithography, Image resolution

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::85cef16beed56b5de8e814af8350f7b6
    https://doi.org/10.1117/12.2011688

    أضف إلى المفضلة
  6. 6
    The SEMATECH Berkeley MET: demonstration of 15-nm half-pitch in chemically amplified EUV resist and sensitivity of EUV resists at 6.x-nm

    المؤلفون: Gideon Jones, Andrew Grenville, Senajith Rekawa, Dominic Ashworth, Suchit Bhattari, Lorie Mae Baclea-an, Jason K. Stowers, Paul Denham, Christopher L. Anderson, Rene Claus, Ken Murayama, Hiroki Nakagawa, Rikos Chao, Patrick P. Naulleau, Ken Goldberg, Ryan Miyakawa

    المصدر: SPIE Proceedings.

    مصطلحات موضوعية: Optics, Materials science, Resist, business.industry, Extreme ultraviolet, Extreme ultraviolet lithography, Phase-shift mask, business, Sensitivity (electronics)

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3b116626180c1b10f04feafedd5516d2
    https://doi.org/10.1117/12.917386

    أضف إلى المفضلة
  7. 7
    Critical challenges for EUV resist materials

    المؤلفون: Lorie-Mae Baclea-an, Seno Rekawa, Kenneth A. Goldberg, Nathan Smith, Patrick P. Naulleau, Brittany M. McClinton, Ryan Miyakawa, Simi George, Paul Denham, Christopher N. Anderson, Gideon Jones

    المصدر: SPIE Proceedings.

    مصطلحات موضوعية: Materials science, Nanolithography, Resist, business.industry, Extreme ultraviolet, Extreme ultraviolet lithography, Optoelectronics, Photoresist, business, Lithography

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e477ad57b79da91c23f4aa0e6afa1fcb
    https://doi.org/10.1117/12.882955

    أضف إلى المفضلة
  8. 8
    Using synchrotron light to accelerate EUV resist and mask materials learning

    المؤلفون: Ryan Miyakawa, Kenneth A. Goldberg, Tom Wallow, Gideon Jones, Paul Denham, Brittany M. McClinton, Simi George, Christopher N. Anderson, Seno Rekawa, Patrick P. Naulleau, Iacopo Mochi, Lorie-Mae Baclea-an, Warren Montgomery

    المصدر: 27th European Mask and Lithography Conference.

    مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, Undulator, Synchrotron, law.invention, Numerical aperture, Nanolithography, Optics, Light source, Resist, law, Extreme ultraviolet, business

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ca122ec4299beb62decb82df0829a00d
    https://doi.org/10.1117/12.885420

    أضف إلى المفضلة
  9. 9
    The SEMATECH Berkeley MET pushing EUV development beyond 22nm half pitch

    المؤلفون: Brittany M. McClinton, Ryan Miyakawa, Tom Wallow, Paul Denham, David Chan, Seno Rekawa, Gideon Jones, Brian Hoef, Christopher N. Anderson, Kenneth A. Goldberg, Simi George, Warren Montgomery, Patrick P. Naulleau, Chawon Koh, Bruno La Fontaine, Lorie-Mae Baclea-an

    المصدر: SPIE Proceedings.

    مصطلحات موضوعية: Materials science, Resolution enhancement technologies, business.industry, Extreme ultraviolet lithography, law.invention, Numerical aperture, Optics, Nanolithography, Resist, law, Extreme ultraviolet, Optoelectronics, Photolithography, business, Lithography

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b874b6f78f530d355e1bf0a616ab6a21
    https://doi.org/10.1117/12.848438

    أضف إلى المفضلة
  10. 10
    The SEMATECH Berkeley microfield exposure tool: learning at the 22-nm node and beyond

    المؤلفون: Bruno La Fontaine, Patrick P. Naulleau, Thomas Wallow, Christopher N. Anderson, Simi George, Michael Goldstein, Ryan Miyakawa, Brittany McClinton, Brian Hoef, Stefan Wurm, Warren Montgomery, Lorie-Mae Baclea-an, John Roller, Paul Denham, Gideon Jones, Chawon Koh, Kenneth A. Goldberg, Russ Hudyma

    المصدر: Alternative Lithographic Technologies.

    مصطلحات موضوعية: Optics, Resist, Computer science, business.industry, Extreme ultraviolet, Extreme ultraviolet lithography, Node (circuits), business, Line edge roughness, Contact hole, Lithography, Performance results

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::499b789e1ba491e0ab1e9a04e0cabc3f
    https://doi.org/10.1117/12.814232

    أضف إلى المفضلة
أدوات البحث: أحصل على تغذية RSS – أرسل هذا البحث بالبريد الإلكتروني – حفظ البحث – جدول التنبيهات: لا شيء