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المؤلفون: Hibiki Chiba, Kenji Ogino, Goji Wakamatsu, Shinji Kanehashi
المصدر: Journal of Photopolymer Science and Technology. 31:711-717
مصطلحات موضوعية: Materials science, Polymers and Plastics, Organic Chemistry, Thioxanthene, 02 engineering and technology, Photorefractive effect, 010402 general chemistry, 021001 nanoscience & nanotechnology, 01 natural sciences, 0104 chemical sciences, Characterization (materials science), chemistry.chemical_compound, chemistry, Polymer chemistry, Materials Chemistry, Moiety, 0210 nano-technology, Glass transition
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e7ca2fd655ac35514b3d08869cd0adbf
https://doi.org/10.2494/photopolymer.31.711 -
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المؤلفون: Tsutomu Shimokawa, Michihiro Mita, Yoshikazu Yamaguchi, Kenji Hoshiko, Hiromitsu Tanaka, Yukio Nishimura, Goji Wakamatsu, Yusuke Anno, Hitoshi Osaki, Tomohisa Fujisawa, Makoto Sugiura, Koji Ito
المصدر: Journal of Photopolymer Science and Technology. 23:199-204
مصطلحات موضوعية: Materials science, Polymers and Plastics, business.industry, Organic Chemistry, Process (computing), Nanotechnology, Photoresist, Lithography process, Resist, Materials Chemistry, Multiple patterning, Process engineering, business, Critical dimension, Throughput (business), Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3bc04fd43b4f59e91d6036339a3a9683
https://doi.org/10.2494/photopolymer.23.199 -
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المؤلفون: Yoshikazu Yamaguchi, Kenji Hoshiko, Shiro Kusumoto, Yusuke Anno, Masafumi Hori, Tsutomu Shimokawa, Goji Wakamatsu, Koichi Fujiwara, Michihiro Mita, Tomohiko Kakizawa, Takeo Shio
المصدر: Journal of Photopolymer Science and Technology. 22:641-646
مصطلحات موضوعية: Materials science, Polymers and Plastics, Resist, Etching (microfabrication), Organic Chemistry, Materials Chemistry, Process (computing), Multiple patterning, Process window, Nanotechnology, Throughput (business), Critical dimension, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::954cb83eb6a7abe03543071670a3da25
https://doi.org/10.2494/photopolymer.22.641 -
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المؤلفون: Greg Breyta, Masayuki Motonari, Yoshi Hishiro, Taiichi Furukawa, Goji Wakamatsu, Luisa D. Bozano, Satoru Murakami, Ratnam Sooriyakumaran, Noel Arellano, Martin Glodde, Carl E. Larson, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Kentaro Goto, Anuja DeSilva
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, Resist, Semiconductor device fabrication, law, Chemical-mechanical planarization, Thermal resistance, Extreme ultraviolet lithography, Multiple patterning, Nanotechnology, Chemical vapor deposition, Photolithography, law.invention
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1a1c8cf7db597584dffd1b176cff64f9
https://doi.org/10.1117/12.915698 -
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المؤلفون: Yusuke Anno, Yutaka Kozuma, Yoshifumi Ogawa, Kentaro Goto, Hiromitsu Tanaka, Kenji Hoshiko, Hiroaki Takikawa, Koichi Fujiwara, Makoto Sugiura, Masafumi Hori, Koji Ito, Goji Wakamatsu, Tsutomu Shimokawa, Tomohisa Fujisawa, Takeo Shioya, Yoshikazu Yamaguchi, Michihiro Mita
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Resist, Computer science, business.industry, Process (computing), Multiple patterning, Nanotechnology, Lithography process, Process engineering, business, Lithography, Critical dimension, Throughput (business), Simple (philosophy)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e5ebe214fe0ebc7d13b50341fce070c4
https://doi.org/10.1117/12.846493 -
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المؤلفون: Yoshikazu Yamaguchi, Yusuke Anno, Koichi Fujiwara, Tsutomu Shimokawa, Tomohiro Kakizawa, Kenji Hoshiko, Masafumi Hori, Goji Wakamatsu, Shiro Kusumoto, Michihiro Mita, Takeo Shioya
المصدر: Advances in Resist Materials and Processing Technology XXVI.
مصطلحات موضوعية: Materials science, Research groups, Multiple patterning, Lower cost, Process window, Nanotechnology, Lithography, Critical dimension, Maskless lithography, Next-generation lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ee4d2bd5e17dc0ee5aa8ece90c3ce6ea
https://doi.org/10.1117/12.814073