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1دورية أكاديمية
المؤلفون: Nagaraju Indugu, Kapil Narayan, Hannah A. Stefenoni, Meagan L. Hennessy, Bonnie Vecchiarelli, Joseph S. Bender, Reeti Shah, Grace Dai, Satvik Garapati, Charles Yarish, Sergio C. Welchez, Susanna E. Räisänen, Derek Wasson, Camila Lage, Audino Melgar, Alexander N. Hristov, Dipti W. Pitta
المصدر: mBio, Vol 15, Iss 8 (2024)
مصطلحات موضوعية: hydrogenotrophic methanogens, methylotrophic methanogens, ruminal methanogenesis, methane mitigation, Microbiology, QR1-502
وصف الملف: electronic resource
Relation: https://doaj.org/toc/2150-7511
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2دورية أكاديمية
المؤلفون: Yan, Zifei, Lee, Grace Dai Zhen, Deng, Jian, Luo, Guangsheng
المصدر: In Chemical Engineering and Processing - Process Intensification September 2024 203
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المؤلفون: Grace Dai, Peter Hu, Linyong Pang, Vikram Tolani, Ying Li, Suresh Lakkapragada, George Hwa, Kechang Wang, Lin He, Danping Peng
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering drawing, Engineering, Resolution enhancement technologies, Computational lithography, business.industry, Mask inspection, law.invention, Wafer fabrication, law, Reticle, Computer vision, Artificial intelligence, Photolithography, business, Focus (optics), Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2c6e929db9d7c34b1506b2d8b5d21ee4
https://doi.org/10.1117/12.977138 -
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المؤلفون: Sungho Jun, Tom Cecil, Guangming Xiao, Jae-Young Choi, Donghwan Son, Xin Zhou, Grace Dai, Kechang Wang, Yeon-Ah Shim, David Kim, Kwangseon Choi, John C. McCarthy, Jaewon Han, Ki-Ho Baik
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Depth of focus, Optics, Computer science, business.industry, Electronic engineering, Process (computing), Node (circuits), Process window, business, Lithography, Aerial image
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2f0b5ca7966218cd7328076ac0ff56b0
https://doi.org/10.1117/12.870704 -
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المؤلفون: Grace Dai, Laurent C. Tuo, Danping Peng, George Hwa, Rick Lai, Linyong Pang, Vikram Tolani, Lin He, C. J. Chen, Hsien-Min Chang, Thuc Dam, Noel Corcoran
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, business.industry, Computational lithography, Extreme ultraviolet lithography, Detector, Mask inspection, law.invention, Error function, Optics, law, Photolithography, business, Lithography, Aerial image
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1fad24d7ea914142e3ff3a67087c6c65
https://doi.org/10.1117/12.864284 -
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المؤلفون: Jaewon Han, Kwangsun Choi, Sungho Jun, Jae-Young Choi, Yeon-Ah Shim, Guangming Xiao, David Kim, Kechang Wang, Ki-Ho Baik, Donghwan Son, Tom Cecil, John C. McCarthy, Xin Zhou, Grace Dai
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Depth of focus, Engineering, business.industry, Process (computing), law.invention, Feature (computer vision), law, Node (circuits), Computer vision, Artificial intelligence, Off-axis illumination, Photolithography, business, Lithography, Aerial image
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7e827d7f9fd26ddef633d64b2332b5f5
https://doi.org/10.1117/12.868563 -
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المؤلفون: Sungho Jun, John C. McCarthy, Donghwan Son, Kwangseon Choi, Jaewon Han, Xin Zhou, David Kim, Yeon-Ah Shim, Ki-Ho Baik, Grace Dai, Tom Cecil, Guangming Xiao, Jae-Young Choi, Kechang Wang
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Masking (art), Depth of focus, Engineering, business.industry, law.invention, law, Feature (computer vision), Computer vision, Node (circuits), Artificial intelligence, Off-axis illumination, Photolithography, business, Lithography, Aerial image
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fd4323f3bcfdda870ee812f0e6616836
https://doi.org/10.1117/12.833499 -
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المؤلفون: Tom Cecil, Dongxue Chen, Ying Cui, Ki-Ho Baik, Grace Dai, Linyong Pang, Thuc Dam, Danping Peng, Peter Hu
المصدر: Optical Microlithography XXI.
مصطلحات موضوعية: Semiconductor device fabrication, Computer science, Integrated circuit, Lithography process, law.invention, Optical proximity correction, law, Electronic engineering, Miniaturization, Process window, Wafer, Electronics, Photolithography, Lithography, Random logic
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d1b9fe76f0129c9d8b7c5d082677ae94
https://doi.org/10.1117/12.775084 -
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المؤلفون: Eric Guo, Linyong Pang, Bin Zhang, Yong Liu, Chi-Yuan Hung, Kechang Wang, Grace Dai
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, business.industry, Integrated circuit, Integrated circuit layout, Design for manufacturability, law.invention, Optical proximity correction, law, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Process window, Static random-access memory, Tape-out, business, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::12dd2fa8bbd430355ecef8680b159c6c
https://doi.org/10.1117/12.655728 -
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المؤلفون: Takeaki Ebihara, Sze Meng Tan, Yasutaka Morikawa, Naoya Hayashi, Grace Dai, Marc D. Levenson
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Wavefront, Materials science, business.industry, Phase (waves), Nanoimprint lithography, law.invention, Vortex, Optics, Resist, law, Reticle, Photolithography, business, Optical vortex
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6ef98ac8b9f7b708736122607b4443ea
https://doi.org/10.1117/12.485418