المؤلفون: Peter Zandbergen, D. Van Steenwinckel, Jeroen Herman Lammers, H Kwinten, Casper A. H. Juffermans

المصدر: IEEE Transactions on Semiconductor Manufacturing. 18:37-41

مصطلحات موضوعية: Materials science, Nanolithography, law, Electronic engineering, Process (computing), Nanotechnology, Electrical and Electronic Engineering, Photolithography, Condensed Matter Physics, Industrial and Manufacturing Engineering, Electronic, Optical and Magnetic Materials, law.invention

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e497dd58639fc42b08951ec46edaf2a9
https://doi.org/10.1109/tsm.2004.841755

المؤلفون: Olaf Wunnicke, Willem Frederik Adrianus Besling, R.A.M. Wolters, L. van Leuken-Peters, J.T.M. van Beek, M. A. A. in 't Zandt, Martijn Goossens, H. Kwinten, Peter G. Steeneken, K. Reimann, Hilco Suy, V. Aravindh

المصدر: 2011 IEEE 24th International Conference on Micro Electro Mechanical Systems.

مصطلحات موضوعية: Microelectromechanical systems, Materials science, business.industry, Electrical engineering, Hermetic seal, law.invention, Reliability (semiconductor), law, Wafer, Radio frequency, Thin film, business, Actuator, Ohmic contact

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3886c42a417e67e84d22151fa56d547a
https://doi.org/10.1109/memsys.2011.5734544

المؤلفون: David Van Steenwinckel, S. Locorotondo, H Kwinten, Stephan Beckx

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Materials science, Optics, Resist, business.industry, Extreme ultraviolet lithography, Multiple patterning, Linearity, X-ray lithography, Diffusion (business), business, Lithography, Next-generation lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fdd42cfb4c7301a32ad2163b34fd2110
https://doi.org/10.1117/12.532695

المؤلفون: H Kwinten, David Van Steenwinckel, Ad Leeuwestein, Joseph J. M. Braat, Peter Dirksen, Augustus J. E. M. Janssen

المساهمون: Control Systems

المصدر: Proceedings Optical Microlithography XVII, 24-27 January 2004, Santa Clara, California, 150-159
STARTPAGE=150;ENDPAGE=159;TITLE=Proceedings Optical Microlithography XVII, 24-27 January 2004, Santa Clara, California
Proceedings of SPIE, 2004 vol. 5377

مصطلحات موضوعية: Point spread function, Materials science, Zernike polynomials, business.industry, Horizontal plane, Extended Nijboer-Zernike theory, law.invention, symbols.namesake, Optics, Resist, Feature (computer vision), law, resist, point-spread function, symbols, optical lithography, diffusion constant, Photolithography, business, Focus (optics), focus noise, Aerial image

وصف الملف: application/pdf

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::16f824b8860cac4340bd3fa224a8fce9
https://research.tue.nl/en/publications/c7ed4cc5-826b-4e7d-b569-db3bb0cbe25e

لا يتم عرض هذه النتيجة على الضيوف.
تسجيل الدخول للوصول الكامل.

لا يتم عرض هذه النتيجة على الضيوف.
تسجيل الدخول للوصول الكامل.

لا يتم عرض هذه النتيجة على الضيوف.
تسجيل الدخول للوصول الكامل.

لا يتم عرض هذه النتيجة على الضيوف.
تسجيل الدخول للوصول الكامل.