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المؤلفون: Peter Zandbergen, D. Van Steenwinckel, Jeroen Herman Lammers, H Kwinten, Casper A. H. Juffermans
المصدر: IEEE Transactions on Semiconductor Manufacturing. 18:37-41
مصطلحات موضوعية: Materials science, Nanolithography, law, Electronic engineering, Process (computing), Nanotechnology, Electrical and Electronic Engineering, Photolithography, Condensed Matter Physics, Industrial and Manufacturing Engineering, Electronic, Optical and Magnetic Materials, law.invention
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المؤلفون: Olaf Wunnicke, Willem Frederik Adrianus Besling, R.A.M. Wolters, L. van Leuken-Peters, J.T.M. van Beek, M. A. A. in 't Zandt, Martijn Goossens, H. Kwinten, Peter G. Steeneken, K. Reimann, Hilco Suy, V. Aravindh
المصدر: 2011 IEEE 24th International Conference on Micro Electro Mechanical Systems.
مصطلحات موضوعية: Microelectromechanical systems, Materials science, business.industry, Electrical engineering, Hermetic seal, law.invention, Reliability (semiconductor), law, Wafer, Radio frequency, Thin film, business, Actuator, Ohmic contact
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3886c42a417e67e84d22151fa56d547a
https://doi.org/10.1109/memsys.2011.5734544 -
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المؤلفون: David Van Steenwinckel, S. Locorotondo, H Kwinten, Stephan Beckx
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, Optics, Resist, business.industry, Extreme ultraviolet lithography, Multiple patterning, Linearity, X-ray lithography, Diffusion (business), business, Lithography, Next-generation lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fdd42cfb4c7301a32ad2163b34fd2110
https://doi.org/10.1117/12.532695 -
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المؤلفون: H Kwinten, David Van Steenwinckel, Ad Leeuwestein, Joseph J. M. Braat, Peter Dirksen, Augustus J. E. M. Janssen
المساهمون: Control Systems
المصدر: Proceedings Optical Microlithography XVII, 24-27 January 2004, Santa Clara, California, 150-159
STARTPAGE=150;ENDPAGE=159;TITLE=Proceedings Optical Microlithography XVII, 24-27 January 2004, Santa Clara, California
Proceedings of SPIE, 2004 vol. 5377مصطلحات موضوعية: Point spread function, Materials science, Zernike polynomials, business.industry, Horizontal plane, Extended Nijboer-Zernike theory, law.invention, symbols.namesake, Optics, Resist, Feature (computer vision), law, resist, point-spread function, symbols, optical lithography, diffusion constant, Photolithography, business, Focus (optics), focus noise, Aerial image
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::16f824b8860cac4340bd3fa224a8fce9
https://research.tue.nl/en/publications/c7ed4cc5-826b-4e7d-b569-db3bb0cbe25e -
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