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1دورية أكاديمية
المؤلفون: M. Huelsmeyer, D. Kuzman, M. Bončina, J. Martinez, C. Steinbrugger, J. Weusten, C. Calero-Rubio, W. Roche, B. Niederhaus, Y. VanHaelst, M. Hrynyk, P. Ballesta, H. Achard, S. Augusto, M. Guillois, C. Pszczolinski, M. Gerasimov, C. Neyra, D. Ponduri, S. Ramesh, D. Clénet
المصدر: Scientific Reports, Vol 13, Iss 1, Pp 1-13 (2023)
وصف الملف: electronic resource
Relation: https://doaj.org/toc/2045-2322
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2دورية أكاديمية
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3
المؤلفون: N. Bruyant, R. Benabderrahmane, A. Bsiesy, H. Achard, Mohammed Benali Kanoun, C. Baraduc
المصدر: Solid-State Electronics. 54:741-744
مصطلحات موضوعية: Diffusion barrier, Silicon, business.industry, Chemistry, Electrical engineering, Charge density, chemistry.chemical_element, Condensed Matter Physics, Electronic, Optical and Magnetic Materials, Field electron emission, Tunnel effect, Materials Chemistry, Tunnel diode, Optoelectronics, Electrical and Electronic Engineering, business, Quantum tunnelling, Diode
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المؤلفون: K. Osman, Yun Wang, N. S. Lloyd, Peter Ashburn, A.M. Waite, W. Zhang, Alan G. R. Evans, T. Ernst, P.L.F. Hemment, Darren M. Bagnall, S. Deleonibus, H. Achard
المصدر: Solid-State Electronics. 49:529-534
مصطلحات موضوعية: Analytical chemistry, Dichlorosilane, Drain-induced barrier lowering, Chemical vapor deposition, Condensed Matter Physics, Epitaxy, Silane, Electronic, Optical and Magnetic Materials, Threshold voltage, chemistry.chemical_compound, chemistry, Silicon nitride, Torr, Materials Chemistry, Electrical and Electronic Engineering
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المؤلفون: H. Achard, L. Ulmer, F. Ducroquet, M.E. Nier, S. Tedesco, F. Coudert, T. Farjot, J.-F. Lugand, M. Heitzmann, Simon Deleonibus, Y. Gobil, Bernard Previtali
المصدر: IEEE Transactions on Electron Devices. 48:1816-1821
مصطلحات موضوعية: Materials science, Fabrication, business.industry, Transistor, Copper interconnect, Electrical engineering, chemistry.chemical_element, Hardware_PERFORMANCEANDRELIABILITY, Electronic, Optical and Magnetic Materials, law.invention, chemistry, law, Gate oxide, Chemical-mechanical planarization, Hardware_INTEGRATEDCIRCUITS, Optoelectronics, Electrical and Electronic Engineering, Tin, Metal gate, business, AND gate, Hardware_LOGICDESIGN
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المؤلفون: François Martin, P. Candelier, G. Reimbold, H. Achard, F. Mondon, Bernard Guillaumot
المصدر: Microelectronic Engineering. 36:87-90
مصطلحات موضوعية: Chemistry, business.industry, Transistor, Oxide, Dielectric, Trapping, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Flash memory, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, law.invention, Flash (photography), chemistry.chemical_compound, Gate oxide, law, Thermal, Optoelectronics, Electrical and Electronic Engineering, business
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7
المؤلفون: L. Peccoud, H. Macé, H. Achard
المصدر: Microelectronic Engineering. 29:19-28
مصطلحات موضوعية: Very-large-scale integration, Materials science, Integrated circuit, Condensed Matter Physics, Ferroelectricity, Engineering physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, law.invention, Thin-film memory, Capacitor, CMOS, Hardware_GENERAL, law, Process integration, Hardware_INTEGRATEDCIRCUITS, Dry etching, Electrical and Electronic Engineering
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8
المؤلفون: L. Peccoud, H. Macé, H. Achard
المصدر: Microelectronic Engineering. 29:45-48
مصطلحات موضوعية: Plasma etching, Materials science, Silicon, business.industry, Analytical chemistry, chemistry.chemical_element, Condensed Matter Physics, Ferroelectricity, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, law.invention, Capacitor, chemistry, law, visual_art, visual_art.visual_art_medium, Optoelectronics, Dry etching, Ceramic, Electrical and Electronic Engineering, Reactive-ion etching, business, Microwave
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9
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 11:2808-2815
مصطلحات موضوعية: Argon, Materials science, Analytical chemistry, chemistry.chemical_element, Mineralogy, Surfaces and Interfaces, Sputter deposition, Condensed Matter Physics, Lead zirconate titanate, Ferroelectricity, Surfaces, Coatings and Films, chemistry.chemical_compound, chemistry, Sputtering, Nuclear reaction analysis, Cavity magnetron, Thin film
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المؤلفون: D. Lafond, J. P. Joly, H. Achard, B. Bechevet
المصدر: Ferroelectrics. 128:31-36
مصطلحات موضوعية: In situ, Materials science, Analytical chemistry, Condensed Matter Physics, Electronic, Optical and Magnetic Materials, law.invention, Sputtering, law, Phase (matter), Cavity magnetron, Thin film, Crystallization, Polarization (electrochemistry), Perovskite (structure)