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المؤلفون: H. C. Lock, W. M. Mak, K. Maxwell, B. Baker, D. Core, S. K. Sim, E. H. Yeoh, C. C. Ooi
المصدر: International Symposium for Testing and Failure Analysis.
مصطلحات موضوعية: Materials science, CMOS, Silicon, chemistry, business.industry, Optoelectronics, chemistry.chemical_element, Dislocation, business, Failure analysis
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fadc05c31105d343737bfc2c30ca0b08
https://doi.org/10.31399/asm.cp.istfa1997p0165