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المؤلفون: B. N. Guo, N. Pradhan, Y. Zhang, H.-J. Gossmann, H. V. Meer, A. Waite, B. Colombeau, K. H. Shim
المصدر: MRS Advances. 7:1468-1471
مصطلحات موضوعية: Mechanics of Materials, Mechanical Engineering, General Materials Science, Condensed Matter Physics
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المؤلفون: Necip Doganaksoy, H. V. Meer
المصدر: Quality Engineering. 27:500-511
مصطلحات موضوعية: Battery (electricity), Engineering, business.industry, Maximum likelihood, Electrical engineering, Mobile electronics, Semiconductor device, Industrial and Manufacturing Engineering, Automotive engineering, Semiconductor industry, Power consumption, Dummy variable, Errors-in-variables models, Safety, Risk, Reliability and Quality, business
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المؤلفون: Changyong Xiao, Andy Wei, Dina H. Triyoso, J. Lian, Edmund Banghart, W. H. Tong, Y. Liu, Deepasree Konduparthi, Rohit Pal, Seong Yeol Mun, B. Liu, M. H. Nam, H. V. Meer, Manfred Eller, Girish Bohra, Chloe Yong, X. Zhang, Shesh Mani Pandey, Rick Carter, Manoj Joshi, Xusheng Wu, Mitsuhiro Togo, Xiaoli He, Srikanth Samavedam
المصدر: 2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers.
مصطلحات موضوعية: Materials science, chemistry, business.industry, Electrical engineering, chemistry.chemical_element, Node (circuits), Work function, Tungsten, business, Metal gate, Capacitance, Threshold voltage
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::24fcdff540092d6707ecb3d6e6403991
https://doi.org/10.1109/vlsit.2014.6894392 -
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المؤلفون: R. Divakaruni, Jaeger Daniel, Richard A. Wachnik, N-S. Kim, M. Celik, Y. Takasu, J. Sudijono, S. Mori, Melanie J. Sherony, H. Nishimura, Michael P. Chudzik, K-C. Lee, Y-W. Teh, Liyang Song, Ricardo A. Donaton, J.-P. Han, E. Kaste, T. Iwamoto, Knut Stahrenberg, Vijay Narayanan, J. Liang, Fumiyoshi Matsuoka, Manfred Eller, S. Kohler, K. Kim, JiYeon Ku, Katsura Miyashita, M-H. Na, S. Johnson, Wai-kin Li, Jongpal Kim, H. V. Meer, Christophe Bernicot, Ron Sampson, Deleep R. Nair, Franck Arnaud, M. Sekine, W. Neumueller, S. Miyake, Masafumi Hamaguchi, Kathy Barla, J.H. Park, H. Kothari
المصدر: 2011 International Electron Devices Meeting.
مصطلحات موضوعية: Materials science, Reliability (semiconductor), Dependency (UML), Modulation, business.industry, MOSFET, Electronic engineering, Optoelectronics, Process optimization, Metal gate, business, Threshold voltage, High-κ dielectric
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a6c4ef6fa05863728895d8e57c28c48a
https://doi.org/10.1109/iedm.2011.6131614 -
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المؤلفون: Frank Scott Johnson, Moritz Voelker, Muhsin Celik, An L. Steegen, Kenneth J. Stein, Katsura Miyashita, Anda Mocuta, Deleep R. Nair, Shinich Miyake, Gen Tsutsui, Li-Hong Pan, Knut Stahrenberg, Sadaharu Uchimura, Melanie J. Sherony, Jae Hoo Park, Martin Ostermayr, Christian Wiedholz, Richard A. Wachnik, Myung-Hee Na, Jin-Ping Han, Ed Kaste, Franck Arnaud, T. Shimizu, Jaeger Daniel, W. Neumueller, Haoren Zhuang, Ja-hum Ku, Ricardo A. Donaton, Christophe Bernicot, Atsushi Azuma, Nam-Sung Kim, Yoshiro Goto, Kathy Barla, Kisang Kim, Manfred Eller, Jenny Lian, Ron Sampson, H. V. Meer, Sabrina Kohler, D. Chanemougame, Masafumi Hamaguchi, Jewel Liang, Weipeng Li, Guoyong Yang, J. Sudijono
المصدر: Japanese Journal of Applied Physics. 50:04DC13
مصطلحات موضوعية: Materials science, business.industry, General Engineering, General Physics and Astronomy, Linearity, Reliability (semiconductor), CMOS, Optoelectronics, Flicker noise, Noise (video), business, Metal gate, Voltage, High-κ dielectric