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1دورية أكاديمية
المؤلفون: Seonho Jeong, Yeongil Shin, Jongmin Jeong, Seunghun Jeong, Haedo Jeong
المصدر: Materials, Vol 17, Iss 8, p 1817 (2024)
مصطلحات موضوعية: chemical mechanical planarization (CMP), multivariate gaussian normal distribution (MVN), asperity wear, mathematical model, contact mode, probability density function (PDF), Technology, Electrical engineering. Electronics. Nuclear engineering, TK1-9971, Engineering (General). Civil engineering (General), TA1-2040, Microscopy, QH201-278.5, Descriptive and experimental mechanics, QC120-168.85
وصف الملف: electronic resource
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2دورية أكاديمية
المؤلفون: Taekyung Lee, Haedo Jeong, Sangjik Lee, Hanchul Cho, Doyeon Kim, Hyoungjae Kim
المصدر: Applied Sciences, Vol 11, Iss 9, p 3950 (2021)
مصطلحات موضوعية: lapping, groove density, contact interface, oil film, wafer, boundary lubrication, Technology, Engineering (General). Civil engineering (General), TA1-2040, Biology (General), QH301-705.5, Physics, QC1-999, Chemistry, QD1-999
وصف الملف: electronic resource
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3دورية أكاديمية
المؤلفون: Seonho Jeong, Kyeongwoo Jeong, Jinuk Choi, Haedo Jeong
المصدر: Applied Sciences, Vol 11, Iss 4, p 1507 (2021)
مصطلحات موضوعية: chemical mechanical planarization (CMP), pad temperature, asperity angle, Micro-CT, Technology, Engineering (General). Civil engineering (General), TA1-2040, Biology (General), QH301-705.5, Physics, QC1-999, Chemistry, QD1-999
وصف الملف: electronic resource
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4دورية أكاديمية
المؤلفون: Taekyung Lee, Haedo Jeong, Sangjik Lee, Doyeon Kim, Hyoungjae Kim
المصدر: Micromachines, Vol 11, Iss 8, p 775 (2020)
مصطلحات موضوعية: groove density, boundary lubrication, lapping characteristic, oil film, sapphire substrate, microabrasive, Mechanical engineering and machinery, TJ1-1570
وصف الملف: electronic resource
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5دورية أكاديمية
المؤلفون: Hobin JEONG, Hyunseop LEE, Sungha CHOI, Youngkyun LEE, Haedo JEONG
المصدر: Journal of Advanced Mechanical Design, Systems, and Manufacturing, Vol 6, Iss 1, Pp 113-120 (2012)
مصطلحات موضوعية: microtopography, chemical mechanical polishing (cmp), real contact area, surface roughness, bearing area curve, Engineering machinery, tools, and implements, TA213-215, Mechanical engineering and machinery, TJ1-1570
وصف الملف: electronic resource
Relation: https://www.jstage.jst.go.jp/article/jamdsm/6/1/6_1_113/_pdf/-char/en; https://doaj.org/toc/1881-3054
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6مؤتمر
المؤلفون: Karaki-Doy, T., Haedo Jeong, Nakagawa, T., Ohmori, H., Kasai, T.
المصدر: Proceedings of International Symposium on Semiconductor Manufacturing Semiconductor manufacturing Semiconductor Manufacturing, 1995., IEEE/UCS/SEMI International Symposium on. :214-217 1995
Relation: Proceedings of International Symposium on Semiconductor Manufacturing
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7
المؤلفون: Hokyoung Jung, Seonho Jeong, Youngwook Park, Yeongil Shin, Haedo Jeong
المصدر: International Journal of Precision Engineering and Manufacturing. 24:25-32
مصطلحات موضوعية: Mechanical Engineering, Electrical and Electronic Engineering, Industrial and Manufacturing Engineering
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8
المؤلفون: Seongnyeong Heo, Seonho Jeong, Minji Kim, Youngwook Park, Haedo Jeong
المصدر: Journal of the Korean Society for Precision Engineering. 39:675-682
مصطلحات موضوعية: Mechanical Engineering, Safety, Risk, Reliability and Quality, Industrial and Manufacturing Engineering
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4ac5e5d685f56474566439e28c60d627
https://doi.org/10.7736/jkspe.022.036 -
9
المؤلفون: Minji Kim, Seonho Jeong, Yeongil Shin, Youngwook Park, Haedo Jeong
المصدر: Journal of the Korean Society for Precision Engineering. 39:547-555
مصطلحات موضوعية: Mechanical Engineering, Safety, Risk, Reliability and Quality, Industrial and Manufacturing Engineering
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1009e14c55704106cc664b3fc6d4616d
https://doi.org/10.7736/jkspe.022.028 -
10
المؤلفون: Hyunseop Lee, Haedo Jeong, Hyoungjae Kim
المصدر: International Journal of Precision Engineering and Manufacturing-Green Technology
مصطلحات موضوعية: Consumables, Hardware_MEMORYSTRUCTURES, Renewable Energy, Sustainability and the Environment, business.industry, Computer science, Semiconductor device fabrication, Slurry, Mechanical Engineering, Material removal, Review, ComputerSystemsOrganization_PROCESSORARCHITECTURES, Industrial and Manufacturing Engineering, Integrated devices, Polishing pad, Sustainability, Management of Technology and Innovation, Chemical-mechanical planarization, Hybrid CMP system, Chemical mechanical polishing (CMP), General Materials Science, Process engineering, business