يعرض 1 - 10 نتائج من 585 نتيجة بحث عن '"Hard mask"', وقت الاستعلام: 1.62s تنقيح النتائج
  1. 1
    مؤتمر
    Study of Tungsten-Doped Carbon Hard Mask Etch Process Using NF3/O2 Based Chemistry

    المؤلفون: Xu, Li-Tian, Zeng, Li, Zhu, Meng-Jiao, Li, Xao-Hui, Zhao, Ji-Han, Qin, Hui, Qi, Ze-Dong, Li, Yu-hao

    المصدر: 2024 Conference of Science and Technology for Integrated Circuits (CSTIC) Science and Technology for Integrated Circuits (CSTIC), 2024 Conference of. :1-3 Mar, 2024

    Relation: 2024 Conference of Science and Technology for Integrated Circuits (CSTIC)

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  2. 2
    مؤتمر
    Challenge of Boron-Doped Silicon Hard Mask Removal

    المؤلفون: Wang, Xuehua, Xu, Litian, Tian, Cheng

    المصدر: 2024 Conference of Science and Technology for Integrated Circuits (CSTIC) Science and Technology for Integrated Circuits (CSTIC), 2024 Conference of. :1-2 Mar, 2024

    Relation: 2024 Conference of Science and Technology for Integrated Circuits (CSTIC)

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  3. 3
    مؤتمر
    Materials Enabled Memory Scaling and New Architectures

    المؤلفون: Chen, Zhijun, Fishburn, Fred, Kang, Chang Seok, Varghese, Sony, Haran, Bala

    المصدر: 2023 IEEE International Memory Workshop (IMW) Memory Workshop (IMW), 2023 IEEE International. :1-4 May, 2023

    Relation: 2023 IEEE International Memory Workshop (IMW)

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  4. 4
    دورية أكاديمية
    Performance Improvement by SiO₂ Hardmask in 100-nm InP-Based HEMTs for TMIC Applications

    المؤلفون: Cao, S., Feng, R., Zhou, F., Feng, Z., Ding, P., Su, Y., Jin, Z.

    المصدر: IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 70(5):2262-2267 May, 2023

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  5. 5
    مؤتمر
    Carbon Hard Mask Opening Process Development with Novel Sidewall Passivation in Memory Manufacturing

    المؤلفون: Zhu, Meng-Jiao, Xu, Li-Tian, Wang, Jing, Zeng, Li, Zhang, Zi-Han

    المصدر: 2023 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2023 China. :1-2 Jun, 2023

    Relation: 2023 China Semiconductor Technology International Conference (CSTIC)

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  6. 6
    مؤتمر
    Investigation of FIN Bowing Formation Mechanism During STI Etching by Virtual Fabrication

    المؤلفون: Sun, Lifei, Lyu, Pengfei, Wang, Qingpeng, Zhong, Qinghua, Wang, Kui, Chi, Yushan

    المصدر: 2022 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2022 China. :01-03 Jun, 2022

    Relation: 2022 China Semiconductor Technology International Conference (CSTIC)

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  7. 7
    مؤتمر
    Hard mask etch process development for patterning 60nm magnetic tunnel junction

    المؤلفون: Li, Xiaohui, Liu, Hailong, Zhu, Ruiping, Liu, Jipeng, He, Zhongyi, Zhou, Qingjun

    المصدر: 2022 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2022 China. :1-3 Jun, 2022

    Relation: 2022 China Semiconductor Technology International Conference (CSTIC)

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  8. 8
    مؤتمر
    SNC SADP Spacer etch process development using carbon hard mask mandrel for sub advanced process DRAM

    المؤلفون: Liu, Hao, Zhang, Jian-kun, Zhao, Zun-hua, Xu, Li-Tian, Chen, Chen, Chen, Yang, Han, Xin-Ru, Zhang, Shi-Ran, Ma, Jing-Lun, Lin, Bing-Hui, Huang, Xin-Wen, Chen, Ying-Yi, Su, Xian-Wen

    المصدر: 2022 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2022 China. :1-3 Jun, 2022

    Relation: 2022 China Semiconductor Technology International Conference (CSTIC)

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  9. 9
    مؤتمر
    SADP etch process development using PR core for sub 17nm DRAM

    المؤلفون: Xu, Li Tian, Zhang, Shuai, Li, Ling Feng, Liu, Hao, Huang, Xin Wen, Chen, Ying Yi, Su, Xian Wen, Guo, Zhong Ning, Xiu, Chun Yu, Mu, Tian Lei, Lin, Bing Hui, He, Zhong Yi, Zhou, Qing Jun

    المصدر: 2022 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2022 China. :1-3 Jun, 2022

    Relation: 2022 China Semiconductor Technology International Conference (CSTIC)

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  10. 10
    دورية أكاديمية
    Gate Dielectric Leakage Reduction in Hard-Mask Defined and Dry-Etch Patterned Organic TFTs Devices

    المؤلفون: Chen, J., Chang, T., Hung, Y., Zheng, Y., Kuo, C., Lin, S., Wu, P., Tsai, C., Ogier, S.

    المصدر: IEEE Electron Device Letters IEEE Electron Device Lett. Electron Device Letters, IEEE. 43(1):48-51 Jan, 2022

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