يعرض 1 - 5 نتائج من 5 نتيجة بحث عن '"Hee Myoung Shin"', وقت الاستعلام: 0.83s تنقيح النتائج
  1. 1
    مؤتمر
    Extreme ultraviolet (EUV) radiation and plasma diagnostics of the dense plasma focus for EUV lithography (EUVL)

    المؤلفون: Young June Hong, Min Kyung Kang, Do Yeon Kwon, Hee Myoung Shin, Eun Ha Choi

    المصدر: 2009 IEEE International Conference on Plasma Science - Abstracts Plasma Science - Abstracts, 2009. ICOPS 2009. IEEE International Conference on. :1-1 Jun, 2009

    Relation: 2009 IEEE 36th International Conference on Plasma Science (ICOPS)

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  2. 2
    مؤتمر
    Design and realisation of apparatus to study capillary discharge in gas

    المؤلفون: Young June Hong, Phil Yong Oh, Gi Chung Kwon, Hee Myoung Shin, Eun Ha Choi

    المصدر: 2008 IEEE 35th International Conference on Plasma Science Plasma Science, 2008. ICOPS 2008. IEEE 35th International Conference on. :1-1 Jun, 2008

    Relation: 2008 IEEE 35th International Conference on Plasma Science (ICOPS)

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  3. 3
    Measurement of Electron Temperature and Density Using Stark Broadening of the Coaxial Focused Plasma for Extreme Ultraviolet Lithography

    المؤلفون: Eun Ha Choi, Young June Hong, Hee Myoung Shin, Gi Chung Kwon, Guangsup Cho

    المصدر: IEEE Transactions on Plasma Science. 38:1111-1117

    مصطلحات موضوعية: Nuclear and High Energy Physics, Electron density, Dense plasma focus, Materials science, Extreme ultraviolet lithography, Condensed Matter Physics, symbols.namesake, Stark effect, Extreme ultraviolet, symbols, Electron temperature, Light emission, Plasma diagnostics, Atomic physics

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1c7cd2910c732a7fc5b2de46b55e52c7
    https://doi.org/10.1109/tps.2010.2043448

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  4. 4
    Extreme ultraviolet (EUV) radiation and plasma diagnostics of the dense plasma focus for EUV lithography (EUVL)

    المؤلفون: Do Yeon Kwon, Min Kyung Kang, Eun Ha Choi, Hee Myoung Shin, Young June Hong

    المصدر: 2009 IEEE International Conference on Plasma Science - Abstracts.

    مصطلحات موضوعية: Optics, Dense plasma focus, Materials science, business.industry, Extreme ultraviolet, Extreme ultraviolet lithography, Electron temperature, Plasma diagnostics, Plasma, Emission spectrum, Atomic physics, Spectroscopy, business

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9920c92fee2e82d132978d231838b736
    https://doi.org/10.1109/plasma.2009.5227410

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  5. 5
    دورية أكاديمية
    Measurement of Electron Temperature and Density Using Stark Broadening of the Coaxial Focused Plasma for Extreme Ultraviolet Lithography.

    المؤلفون: Young June Hong, Gi Chung Kwon, Guangsup Cho, Hee Myoung Shin, Eun Ha Choi

    المصدر: IEEE Transactions on Plasma Science; May2010, Vol. 38 Issue 5, p1111-1117, 7p

    مصطلحات موضوعية: ELECTRON temperature, LITHOGRAPHY, EXTREME ultraviolet lithography, ELECTROOPTICS, THERMODYNAMIC equilibrium

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