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1دورية أكاديمية
المؤلفون: Hee-Tae Kwon, In-Young Bang, Jae-Hyeon Kim, Hyeon-Jo Kim, Seong-Yong Lim, Seo-Yeon Kim, Seong-Hee Cho, Ji-Hwan Kim, Woo-Jae Kim, Gi-Won Shin, Gi-Chung Kwon
المصدر: Nanomaterials, Vol 14, Iss 2, p 209 (2024)
مصطلحات موضوعية: low temperature, plasma etching, high aspect ratio, necking ratio, SiO2, trench, Chemistry, QD1-999
وصف الملف: electronic resource
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2دورية أكاديمية
المؤلفون: Gi-Won Shin, Jae-Hyeon Kim, Sun-Hee Lee, In-Young Bang, Ji-Hwan Kim, Yeon-Soo Park, Hee-Tae Kwon, Woo-Jae Kim, Gi-Ching Kwon
المصدر: Aerospace, Vol 10, Iss 1, p 87 (2023)
مصطلحات موضوعية: reproduction of reentry plasma, plasma density, microwave reflectometry and interferometry, electromagnetic wave attenuation in plasma medium, Motor vehicles. Aeronautics. Astronautics, TL1-4050
وصف الملف: electronic resource
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3دورية أكاديمية
المؤلفون: Woo-Jae Kim, In-Young Bang, Ji-Hwan Kim, Yeon-Soo Park, Hee-Tae Kwon, Gi-Won Shin, Min-Ho Kang, Youngjun Cho, Byung-Hyang Kwon, Jung-Hun Kwak, Gi-Chung Kwon
المصدر: Materials, Vol 14, Iss 11, p 3026 (2021)
مصطلحات موضوعية: nitrogen oxide trifluoride, nitrogen fluoride oxide, reactive ion etch, silicon oxide etch, Technology, Electrical engineering. Electronics. Nuclear engineering, TK1-9971, Engineering (General). Civil engineering (General), TA1-2040, Microscopy, QH201-278.5, Descriptive and experimental mechanics, QC120-168.85
وصف الملف: electronic resource
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4
المؤلفون: Gi Won Shin, Jae Hyeon Kim, Sun Hee Lee, In Young Bang, Ji Hwan Kim, Yeon Soo Park, Hee Tae Kwon, Woo Jae Kim, Gi-Chung Kwon
المصدر: The Review of scientific instruments. 93(10)
مصطلحات موضوعية: Instrumentation
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5
المؤلفون: Gi Won Shin, Woo-Jae Kim, Hee Tae Kwon, Gi-Chung Kwon, Tae Hyun Lee, Hwan Hee Lee
المصدر: Journal of the Korean Physical Society. 77:477-481
مصطلحات موضوعية: 010302 applied physics, Materials science, Infrared, business.industry, General Physics and Astronomy, Atmospheric-pressure plasma, 02 engineering and technology, Plasma, 021001 nanoscience & nanotechnology, 01 natural sciences, Power (physics), Thermometer, 0103 physical sciences, Optoelectronics, Wafer, Current (fluid), 0210 nano-technology, business, Intensity (heat transfer)
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6
المؤلفون: Tae-Hyun Lee, Hwan-Hee Lee, Hee-Tae Kwon, Min Ho Kang, Gi-Won Shin, Gi-Chung Kwon, Woo-Jae Kim
المصدر: Journal of the Korean Physical Society. 74:1135-1139
مصطلحات موضوعية: 010302 applied physics, Plasma etching, Silicon, Residual gas analyzer, fungi, technology, industry, and agriculture, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, 02 engineering and technology, Plasma, 021001 nanoscience & nanotechnology, 01 natural sciences, Nitrogen trifluoride, chemistry.chemical_compound, chemistry, Etching (microfabrication), 0103 physical sciences, Capacitively coupled plasma, Reactive-ion etching, 0210 nano-technology
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7
المؤلفون: Youngjun Cho, Gi-Won Shin, Byung-Hyang Kwon, Gi-Chung Kwon, Kwak Junghun, Hee-Tae Kwon, Min Ho Kang, In-Young Bang, J. H. Kim, Woo-Jae Kim, Yeon-Soo Park
المصدر: Materials, Vol 14, Iss 3026, p 3026 (2021)
Materials
Volume 14
Issue 11مصطلحات موضوعية: Technology, Materials science, Residual gas analyzer, reactive ion etch, Analytical chemistry, Article, Etching (microfabrication), silicon oxide etch, General Materials Science, Reactive-ion etching, Thin film, Silicon oxide, Microscopy, QC120-168.85, QH201-278.5, Plasma, Engineering (General). Civil engineering (General), TK1-9971, Descriptive and experimental mechanics, Greenhouse gas, nitrogen fluoride oxide, Electrical engineering. Electronics. Nuclear engineering, TA1-2040, nitrogen oxide trifluoride, DC bias
وصف الملف: application/pdf