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1مؤتمر
المؤلفون: Jaechul Om, Eunseok Choi, Sejun Kim, Heegee Lee, Yongwook Kim, Heehyun Chang, Sungji Park, Gihyun Bae
المصدر: 2005 IEEE International Reliability Physics Symposium, 2005. Proceedings. 43rd Annual. Reliability physics Reliability Physics Symposium, 2005. Proceedings. 43rd Annual. 2005 IEEE International. :257-259 2005
Relation: 2005 IEEE International Reliability Physics Symposium. Proceedings 43rd Annual
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المؤلفون: Heegee Lee, Jung Hoon Lee, Jungwoo Song
المصدر: Microelectronic Manufacturing Yield, Reliability, and Failure Analysis III.
مصطلحات موضوعية: Arc (geometry), Materials science, Plasma etching, business.industry, Gate oxide, Etching (microfabrication), Electric field, Electronic engineering, Optoelectronics, Time-dependent gate oxide breakdown, Plasma, Dielectric, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4172cbcd57aa09f39cc15e55c97f2edc
https://doi.org/10.1117/12.284697 -
3مؤتمر
المؤلفون: Om, J., Eunseok Choi, Sejun Kim, Heegee Lee, Yongwook Kim, Heenyun Chang, Sungki Park, Gihyun Bae
المصدر: 2005 IEEE International Reliability Physics Symposium, 2005. Proceedings 43rd Annual; 2005, p257-259, 3p