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المؤلفون: Katja Viatkina, Owen Chen, Jae Gyoo Lee, Yong-Tae Cho, Marcus Carbery, Lucian Schmidt, Hemert Tom Van, Ik-Hyun Jeong, Marcus Musselman, Nang-Lyeom Oh, Hyun-Sok Kim, Heidi Kwon, Jae-Wuk Ju, Ssuwei Chen, David Deckers, Young-Sik Kim, Seung-Woo Koo, Heung-Joo Kim, Ruud de Wit
المصدر: Advanced Etch Technology for Nanopatterning VIII.
مصطلحات موضوعية: Scanner, Computer science, Control system, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Node (circuits), Wafer, Hardware_PERFORMANCEANDRELIABILITY, Overlay, Lithography, Dram, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ad8bc961623575e03b40f40442339950
https://doi.org/10.1117/12.2516578 -
2مؤتمر
المؤلفون: Ik-Hyun Jeong, Seung-Woo Koo, Hyun-Sok Kim, Jae-Wuk Ju, Young-Sik Kim, Yong-Tae Cho, Heung-Joo Kim, Viatkina, Katja, van Hemert, Tom, de Wit, Ruud, Deckers, David, Chen, Owen, Nang-Lyeom Oh, Musselman, Marcus, Carbery, Marcus, Ssuwei Chen, Schmidt, Lucian, Heidi Kwon, Jae Gyoo Lee
المصدر: Proceedings of SPIE; 2/16/2019, Vol. 10984, p1-7, 7p