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المؤلفون: Hideyoshi Takamizawa, Takashi Adachi, Katsuya Hayano, Ayako Tani
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Optics, Materials science, Optical proximity correction, business.industry, Process (computing), Phase-shift mask, business, Contact hole, Lithography, Next-generation lithography, Aerial image, Immersion lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::aafca91371e66ae811c40b53fcd89ea7
https://doi.org/10.1117/12.2070056 -
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المؤلفون: H. Yamaguchi, Mark Wagner, K. Kanno, Hideyoshi Takamizawa, Nobuaki Fujii, Klaus-Dieter Roeth, Mohammad M. Daneshpanah, Slawomir Czerkas, Shingo Yoshikawa, Frank Laske
المصدر: SPIE Proceedings.
مصطلحات موضوعية: International Technology Roadmap for Semiconductors, Engineering, Optics, Optical proximity correction, business.industry, Feature (computer vision), Hardware_INTEGRATEDCIRCUITS, Wafer, Overlay, business, Immersion lithography, Die (integrated circuit), Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3229d4d2579339e43700c8ef204fbe12
https://doi.org/10.1117/12.2072074 -
3
المؤلفون: Hideyoshi Takamizawa, Kana Ohara, Katsuya Hayano, Donghwan Son, Kouichi Kanno, Masaharu Nishiguchi, Vikram Tolani
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Development environment, Engineering, Engineering drawing, business.industry, Integrated circuit layout, Die (integrated circuit), Image (mathematics), Calibration, Key (cryptography), Computer vision, Artificial intelligence, Photomask, business, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b55dbcaf65f8b00895cb1d9dd1c39a7c
https://doi.org/10.1117/12.2070026 -
4
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, Scanner, business.industry, Extreme ultraviolet lithography, Integrated circuit, law.invention, Resist, law, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Process control, Wafer, Photolithography, business, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e0b35cde2cfca1d676b68a6bb8bf483c
https://doi.org/10.1117/12.978706 -
5
المؤلفون: Eiji Tsujimoto, Kei Mesuda, Katsuya Hayano, Hideyoshi Takamizawa, Shintaro Kudo, Toshio Ohhashi, Naruo Sakasai, Tomoyuki Matsuyama, Hiroshi Watanabe
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Scanner, Materials science, Optics, business.industry, Wafer, Performance improvement, business, Lithography, Exposure latitude, 3d topography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::97b9ff0f1b416b26e618d7fe54d6a3c3
https://doi.org/10.1117/12.899910 -
6
المؤلفون: Shintaro Kudo, Kei Mesuda, Tomoyuki Matsuyama, Hiroshi Watanabe, Katsuya Hayano, Toshio Ohhashi, Eiji Tsujimoto, Naruo Sakasai, Hideyoshi Takamizawa
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Leading edge, Scanner, Engineering, Resolution enhancement technologies, Optics, business.industry, Head to head, business, Refractive index, Lithography, Exposure latitude, Blank
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::92fb18e55cdff9e43651b6c83b77f178
https://doi.org/10.1117/12.899909 -
7
المؤلفون: Eiji Tsujimoto, Takeshi Kosuge, Hidemichi Imai, Hideyoshi Takamizawa, Kei Mesuda
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, Signal-to-noise ratio (imaging), Optical proximity correction, Pixel, business.industry, Electronic engineering, Node (circuits), Sensitivity (control systems), business, Inspection time, Throughput (business), Algorithm, Design for manufacturability
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0d929c2f7b6a5a033ed76724d71216c6
https://doi.org/10.1117/12.867983 -
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المؤلفون: Mochihiro Shimizu, Hidekazu Migita, Hiroyuki Ishii, Hiroyuki Iwashita, Masahiro Hashimoto, Masao Ushida, Toshiyuki Suzuki, Morio Hosoya, Hideaki Mitsui, Yasushi Ohkubo, Tsugumi Nagano, Ryugo Hikichi, Noriko Kakehi, Hideyoshi Takamizawa
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, Fabrication, business.industry, Blank, law.invention, Optics, Resist, law, Etching (microfabrication), Dry etching, Photomask, Photolithography, business, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fecda67f10a80cbf3539e23b07c6e8ed
https://doi.org/10.1117/12.793014 -
9
المؤلفون: Takahiro Sakaguchi, Yasushi Ohkubo, Yasunori Yokoya, Katsuhiko Horii, Asuka Manoshiro, Masaki Nagai, Mochihiro Shimizu, Masahiro Hashimoto, Tomoyuki Enomoto, Jumpei Morimoto, Hideyoshi Takamizawa, Yukihiro Fujimura, Hiroshi Shiratori
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Part iii, Resist, Computer science, business.industry, Node (networking), business, Multi layer, Computer network
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5d168de29fb9308f9de2dfac6bd0f184
https://doi.org/10.1117/12.692889 -
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المؤلفون: Masaki Nagai, Jumpei Morimoto, Hideyoshi Takamizawa, Yasushi Ohkubo, Katsuhiko Horii, Asuka Manoshiro, Masahiro Hashimoto, Yasunori Yokoya, Takahiro Sakaguchi, Hiroshi Shiratori, Yukihiro Fujimura, Mochihiro Shimizu, Tomoyuki Enomoto
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, business.industry, Blank, law.invention, Optics, Resist, law, Reticle, Dry etching, Photomask, Photolithography, business, Layer (electronics), Sheet resistance
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ecbb3b5b85e2e6061e35ddb6ed9a0a88
https://doi.org/10.1117/12.692896