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1مؤتمر
المؤلفون: Gi-Chung Kwon, Hong-Seub Kim, Joung-Sik Kim, Seong-Hyuk Choi, Jea-Hong Jun, Lee, D.S., Lee, Y.K., Chang, H.Y.
المصدر: The 30th International Conference on Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. Plasma science Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on. :403 2003
Relation: 30th International Conference on Plasma Science
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2
المؤلفون: Hyungyong, Ji, Jaeho, Choi, Gyoungho, Lim, Bhaskar, Parida, Keunjoo, Kim, Jung Hee, Jo, Hong Seub, Kim
المصدر: Journal of nanoscience and nanotechnology. 13(12)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=pmid________::314a16baf20584553f365507172cb95e
https://pubmed.ncbi.nlm.nih.gov/24266144 -
3
المؤلفون: Hwack Joo Lee, Keunjoo Kim, Hong Seub Kim
المصدر: Journal of Solid State Electrochemistry. 3:417-423
مصطلحات موضوعية: Physics, Photoluminescence, Deep-level transient spectroscopy, Condensed matter physics, Annealing (metallurgy), Thermionic emission, Heterojunction, Condensed Matter::Mesoscopic Systems and Quantum Hall Effect, Condensed Matter Physics, Space charge, Crystallographic defect, Electrochemistry, General Materials Science, Electrical and Electronic Engineering, Atomic physics, Quantum well
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4
المؤلفون: Hwack Joo Lee, Hyun Ryu, Hong Seub Kim, Jae Yon Kim, Young Hee Lee, Hyung Jae Lee, Keunjoo Kim
المصدر: Journal of Solid State Electrochemistry. 1:221-226
مصطلحات موضوعية: Materials science, Condensed matter physics, Diffusion barrier, Alloy, Heterojunction, engineering.material, Condensed Matter Physics, Mole fraction, Fick's laws of diffusion, Crystallography, Electrochemistry, engineering, General Materials Science, Electrical and Electronic Engineering, Dislocation, Layer (electronics), Stacking fault
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5
المؤلفون: Jae Koo Lee, Hong-Young Chang, Sung-Jin You, Hong-Seub Kim
المصدر: The 30th International Conference on Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts..
مصطلحات موضوعية: Materials science, Physics::Plasma Physics, Waves in plasmas, Plasma channel, Electromagnetic electron wave, Capacitively coupled plasma, Atomic physics, Dissipation, Inductively coupled plasma, Frequency modulation, Power (physics)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::84ec137e65a18a4e19861c12a135a6b4
https://doi.org/10.1109/plasma.2003.1228963 -
6
المؤلفون: Hong-Young Chang, Joung-Sik Kim, Jea-Hong Jun, Hong-Seub Kim, Seong-Hyuk Choi, Gi-Chung Kwon, Deawon Lee, Youn-Soo Lee
المصدر: The 30th International Conference on Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts..
مصطلحات موضوعية: Materials science, business.industry, Sputtering, Etching, Plasma etcher, Optoelectronics, Electron temperature, Wafer, Plasma, Dry etching, Reactive-ion etching, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a1fc47f894a5682ec2eb5ed7b0eee632
https://doi.org/10.1109/plasma.2003.1229947 -
7
المؤلفون: Hong-Young Chang, Shin-Jae You, Jae Koo Lee, Chin-Wook Chung, Hong-Seub Kim
المصدر: Journal of Applied Physics. 94:7422
مصطلحات موضوعية: Chemistry, Analytical chemistry, Mode (statistics), General Physics and Astronomy, Plasma diagnostics, Capacitively coupled plasma, Atomic physics, Dissipation, Inductively coupled plasma, Square (algebra), Power (physics), Magnetic field