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1
المؤلفون: Martin Freitag, En Chuan Lio, Hsiao Lin Hsu, Bill Lin, Rex H. Liu, Stefan Buhl, Tang Chun Weng, Patrick Lomtscher, Jia Hung Chang, Junjin Lin
المصدر: Optical Microlithography XXXIV.
مصطلحات موضوعية: Semiconductor device fabrication, Computer science, business.industry, Process (computing), ComputerApplications_COMPUTERSINOTHERSYSTEMS, Hardware_PERFORMANCEANDRELIABILITY, Overlay, Planar, Distortion, Hardware_INTEGRATEDCIRCUITS, Key (cryptography), Wafer, business, Lithography, Computer hardware
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5c838c878bf1cc9ce86db521eec61812
https://doi.org/10.1117/12.2583620 -
2
المؤلفون: Cheng Hao Yang, Chun Chi Yu, Boris Habets, Martin Freitag, Patrick Lomtscher, Hsiao Lin Hsu, Steven Tottewitz, Rex H. Liu
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIII.
مصطلحات موضوعية: Computer science, Real-time computing, Coordinate system, Process (computing), Reticle, Feed forward, Sampling (statistics), Overlay, Throughput (business), Data modeling
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::40a30545d7cb9df79c3c226306d9de73
https://doi.org/10.1117/12.2514984 -
3
المؤلفون: Afu Chiu, Hsiao Lun Chu, Patrick Lomtscher, Boris Habets, Rex H. Liu, Foster Huang, Steven Tottewitz, Hsiao-Lin Hsu
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIII.
مصطلحات موضوعية: Structure (mathematical logic), Sampling (signal processing), Computer science, business.industry, Hardware_INTEGRATEDCIRCUITS, Process (computing), Wafer, Overlay, business, Lithography, Dram, Signature (logic), Computer hardware
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e83dcddbd6ffeb6552b9128b4525de62
https://doi.org/10.1117/12.2515203 -
4
المؤلفون: Steven Tottewitz, Norman Birnstein, En-Chuan Lio, Jia Hung Chang, Rex H. Liu, Boris Habets, Patrick Lomtscher, Sho Shen Lee, Hsiao Lin Hsu, Georg Erley, Charlie Chen
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXII.
مصطلحات موضوعية: Scanner, Materials science, business.industry, Hardware_PERFORMANCEANDRELIABILITY, Overlay, law.invention, Lens (optics), Optics, law, Hardware_INTEGRATEDCIRCUITS, Reticle, Calibration, Wafer, Photolithography, business, Throughput (business)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fe7ac6615a494760da63195555c16797
https://doi.org/10.1117/12.2297358 -
5
المؤلفون: Stefan Buhl, Sho Shen Lee, Martin Freitag, Jia Hung Chang, Hsiao Lin Hsu, Rex H. Liu, Patrick Lomtscher, Boris Habets, En Chuan Lio, Charlie Chen, Manuela Gutsch
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXII.
مصطلحات موضوعية: business.industry, Computer science, Process (computing), Multiple patterning, Overlay, business, Throughput (business), Lithography, Signature (logic), Computer hardware, Processing methods
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::89967be3f7f52e6f99fda65456df0486
https://doi.org/10.1117/12.2299299 -
6مؤتمر
المؤلفون: Hsiao Lun Chu, Huang, Foster, Tottewitz, Steven, Habets, Boris, Lomtscher, Patrick, Hsiao Lin Hsu, Afu Chiu, Liu, Rex H.
المصدر: Proceedings of SPIE; 1/22/2019, Vol. 10959, p1-15, 15p
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7مؤتمر
المؤلفون: Chen, Charlie, En Chuan Lio, Hsiao Lin Hsu, Jia Hung Chang, Sho Shen Lee, Lomtscher, Patrick, Habets, Boris, Erley, Georg, Birnstein, Norman, Tottewitz, Steven, Liu, Rex
المصدر: Proceedings of SPIE; 2018, Vol. 10585, p1-12, 12p
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8مؤتمر
المؤلفون: Hsiao Lin Hsu, En Chuan Lio, Chen, Charlie, Jia Hung Chang, Sho Shen Lee, Buhl, Stefan, Gutsch, Manuela, Lomtscher, Patrick, Freitag, Martin, Habets, Boris, Liu, Rex
المصدر: Proceedings of SPIE; 2018, Vol. 10585, p1-17, 17p