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المؤلفون: Patrik Hoffmann, Aurelian Crunteanu, Robert W. Eason, A. Petraru, G. Jänchen, Markus Pollnau, David Shepherd, Christoph Buchal
المصدر: Applied physics A: Materials science and processing, 76(7):10.1007/s00339-002-2027-y, 1109-1112. Springer
مصطلحات موضوعية: Materials science, Ion beam, business.industry, EWI-17543, General Chemistry, Isotropic etching, Ion, IR-70077, Optics, Sapphire, Optoelectronics, General Materials Science, Surface layer, IOMS-APD: Active Photonic Devices, Reactive-ion etching, business, Selectivity
وصف الملف: text