-
1
المؤلفون: Aysegul Develioglu, Timothée Paul Allenet, Michaela Vockenhuber, Lidia van Lent-Protasova, Iacopo Mochi, Yasin Ekinci, Dimitrios Kazazis
المصدر: Advances in Patterning Materials and Processes XL.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::830d69f22fc2f96d7b2411181a8b8205
https://doi.org/10.1117/12.2660859 -
2
المؤلفون: Tao Shen, Paolo Ansuinelli, Iacopo Mochi, Yasin Ekinci
المصدر: Metrology, Inspection, and Process Control XXXVII.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4737ff8a3dbdf7e1b9953a7d3ea633bb
https://doi.org/10.1117/12.2658436 -
3
المؤلفون: Tao Shen, Yasin Ekinci, Iacopo Mochi
المصدر: International Conference on Extreme Ultraviolet Lithography 2022.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6b47bdaa903bf4be584d72989466eacb
https://doi.org/10.1117/12.2641776 -
4
المؤلفون: Timothée P. Allenet, Iacopo Mochi
المصدر: International Conference on Extreme Ultraviolet Lithography 2022.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::21b15768ee1c5be1a06664d8eb43a05b
https://doi.org/10.1117/12.2641835 -
5
المؤلفون: Hyun-Su Kim, Ricarda Nebling, Atoosa Dejkameh, Tao Shen, Yasin Ekinci, Iacopo Mochi
المصدر: Journal of Micro/Nanopatterning, Materials, and Metrology. 21
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::96cb59a3dc8c69cd6ef073d672cdebf4
https://doi.org/10.1117/1.jmm.21.3.034002 -
6
المؤلفون: Tao Shen, Dimitrios Kazazis, Hyun-Su Kim, Atoosa Dejkameh, Ricarda Nebling, Yasin Ekinci, Iacopo Mochi
المصدر: Metrology, Inspection, and Process Control XXXVI.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::57d742915749980f07396665ea0c55cd
https://doi.org/10.1117/12.2613337 -
7
المؤلفون: Neha Thakur, Sonia Castellanos, Iacopo Mochi, Roland Bliem, Yasin Ekinci, Michaela Vockenhuber
المساهمون: HIMS Other Research (FNWI), IoP (FNWI)
المصدر: Journal of Materials Chemistry C, 8(41), 14499-14506. Royal Society of Chemistry
مصطلحات موضوعية: Materials science, Fabrication, business.industry, Extreme ultraviolet lithography, General Chemistry, Photoresist, Nanolithography, Resist, Materials Chemistry, Miniaturization, Optoelectronics, business, Spectroscopy, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7f2f7fc6dafff8e54398bf98783d2733
https://doi.org/10.1039/d0tc03597a -
8
المؤلفون: Yasin Ekinci, Hyun-Su Kim, Ricarda Nebling, Atoosa Dejkameh, Iacopo Mochi, Tao Shen
المصدر: Photomask Technology 2021.
مصطلحات موضوعية: Diffraction, Materials science, Microscope, business.industry, Image quality, Extreme ultraviolet lithography, Detector, Mask inspection, Coherent diffraction imaging, Ptychography, law.invention, Optics, law, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0a0b1d00802981af1b574638eefb71bc
https://doi.org/10.1117/12.2601246 -
9
المؤلفون: Yasin Ekinci, Iacopo Mochi, Michaela Vockenhuber, Timothée P. Allenet
المصدر: Photomask Technology 2021.
مصطلحات موضوعية: Nanolithography, Software, Computer science, business.industry, Extreme ultraviolet lithography, Computer vision, Surface finish, Artificial intelligence, User interface, Photoresist, business, Critical dimension, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e7e201a02cdd7deeaf5887129de1c756
https://doi.org/10.1117/12.2600911 -
10
المؤلفون: Tao Shen, Ricarda Nebling, Yasin Ekinci, Hyun-Su Kim, Iacopo Mochi, Atoosa Dejkameh
المصدر: Computational Optics 2021.
مصطلحات موضوعية: Signal-to-noise ratio, Extreme ultraviolet lithography, Shot noise, Iterative reconstruction, Photomask, Phase retrieval, Algorithm, Ptychography, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::942431d8bd56b3897fb81d8803f1229f
https://doi.org/10.1117/12.2600233