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المؤلفون: Scott Luning, Ashima B. Chakravarti, Z. Zhu, A. Gehring, Anita Madan, Alexander Reznicek, Guangrui Xia, R. Takalkar, Dan Mocuta, Dominic J. Schepis, B. Yang, Thomas N. Adam, E. Leobandung, Ka Kong Chan, J. Faltermeier, J. P. de Souza, Zhibin Ren, John Li, Rohit Pal, Eric C. Harley, Edward P. Maciejewski, Brian J. Greene, Abhishek Dube, D.-G. Park, M. Cai, D. K. Sadana, Linda Black, Bin Yang, Johan W. Weijtmans, G. Pei
المصدر: ECS Transactions. 16:317-323
مصطلحات موضوعية: C strain, Cmos fabrication, Engineering, business.industry, business, Humanities, Cartography
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المؤلفون: Tenko Yamashita, Isaac Lauer, Veeraraghavan S. Basker, Nicolas Loubet, J. Faltermeier, Theodorus E. Standaert, Bruce B. Doris, John A. Ott, M. Guillorn, S. Mignot, Seong-Dong Kim, Rajasekhar Venigalla
المصدر: 2015 Symposium on VLSI Technology (VLSI Technology).
مصطلحات موضوعية: Materials science, CMOS, Silicon, chemistry, business.industry, Logic gate, Nanowire, Optoelectronics, chemistry.chemical_element, Nanotechnology, business, Metal gate, Gate equivalent
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f440bada7ac0e9026f5bcbe8a7e99af0
https://doi.org/10.1109/vlsit.2015.7223653 -
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المؤلفون: James H. Stathis, Barry Linder, Miaomiao Wang, J. Faltermeier, Hemanth Jagannathan, Ramachandran Muralidhar
المصدر: IEEE Electron Device Letters. 34:837-839
مصطلحات موضوعية: Materials science, Temperature instability, MOSFET, Electronic engineering, Silicon on insulator, Soi finfet, Electrical and Electronic Engineering, Operating voltage, Scaling, Vertical field, Engineering physics, Electronic, Optical and Magnetic Materials, Voltage
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المؤلفون: Hang-Yip Liu, D. Dobuzinsky, J. Gambino, J. Faltermeier, Thomas S. Rupp, V.Y. Sardesai, M. Maldei
المصدر: IEEE Transactions on Semiconductor Manufacturing. 15:223-228
مصطلحات موضوعية: Dynamic random-access memory, Contact process, Materials science, business.industry, Electrical engineering, Condensed Matter Physics, Aspect ratio (image), Industrial and Manufacturing Engineering, Electrical contacts, Electronic, Optical and Magnetic Materials, law.invention, law, Optoelectronics, Process window, Electrical and Electronic Engineering, business, Borophosphosilicate glass, Lithography, Dram
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المؤلفون: R. J. Miller, J. Faltermeier, Pranita Kulkarni, Bruce B. Doris, Kingsuk Maitra, D. McHerron, N R Klymko, E Leobundung, H. Adhikari, Huiming Bu, Chun-Chen Yeh, Katherine L. Saenger, Vamsi Paruchuri, J. O'Neil, Veeraraghavan S. Basker, Ali Khakifirooz, Theodorus E. Standaert, Hemanth Jagannathan
المصدر: IEEE Electron Device Letters. 32:713-715
مصطلحات موضوعية: Materials science, business.industry, Transconductance, Electrical engineering, Silicon on insulator, Strained silicon, Electronic, Optical and Magnetic Materials, Logic gate, MOSFET, Optoelectronics, Field-effect transistor, Electrical and Electronic Engineering, business, Metal gate, High-κ dielectric
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المؤلفون: Patrick W. DeHaven, J. Kuss, Kang-ill Seo, R. Divakaruni, H. He, Reinaldo A. Vega, H. Shang, Theodorus E. Standaert, T. Wu, Darsen D. Lu, Kangguo Cheng, Huiming Bu, Myung-Hee Na, Z. Zhu, Charan V. V. S. Surisetty, James J. Demarest, R. Sampson, T. Hook, Walter Kleemeier, James Chingwei Li, J. Faltermeier, G. Gifford, T. Levin, Ali Khakifirooz, Sebastian Naczas, Henry K. Utomo, Yunpeng Yin, Dinesh Gupta, Ajey Poovannummoottil Jacob, N. Klymko, Anita Madan, Mukesh Khare, Balasubramanian S. Pranatharthi Haran, Soon-Cheon Seo, Ok Injo, D.I. Bae, P. Oldiges, K. Rim, Robin Chao, Bruce B. Doris, D. Song, E. J. Nowak
المصدر: 2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers.
مصطلحات موضوعية: Fin, Fabrication, Materials science, business.industry, Transistor, Electrical engineering, Nanowire, Dielectric, Tail region, law.invention, CMOS, law, Optoelectronics, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7897b29a2d600d29948210b321a03e10
https://doi.org/10.1109/vlsit.2014.6894390 -
7دورية أكاديمية
لا يتم عرض هذه النتيجة على الضيوف.
تسجيل الدخول للوصول الكامل. -
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المؤلفون: Vamsi Paruchuri, Zhibin Ren, Wilfried Haensch, Bruce B. Doris, Hemanth Jagannathan, Huiming Bu, Balasubramanian S. Haran, A. Byrant, Su Chen Fan, Kangguo Cheng, Sanjay Mehta, Yu Zhu, Shom Ponoth, H. He, Vijay Narayanan, Alexander Reznicek, J. Kuss, Ghavam G. Shahidi, Ali Khakifirooz, Soon-Cheon Seo, Z. Zhu, Paul C. Jamison, A. Upham, D. McHerron, Pranita Kulkarni, A. Kimball, L. H. Vanamurth, S. Kanakasabapathy, J. Faltermeier, Basanth Jagannathan, Amit Kumar, Amlan Majumdar, Thomas N. Adam, Mukesh Khare, Terence B. Hook, S. Holmes, D. Horak, R. Johnson, D. Yang, D. K. Sadana, J. Cai, J. O'Neil, E. Leobondung, Lisa F. Edge, S. Schmiz, P. Kozlowsk, J. L. Herman
المصدر: Extended Abstracts of the 2010 International Conference on Solid State Devices and Materials.
مصطلحات موضوعية: Materials science, CMOS, Silicon on insulator, Mainstream, Nanotechnology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::cbe458735d7a77e337be1fa74ec08d0f
https://doi.org/10.7567/ssdm.2010.c-6-1 -
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المؤلفون: H. Kawasaki, Junli Wang, V. Basker, J. Faltermeier, Pranita Kulkarni, James A. O’Neill, Tenko Yamashita, T. Levin, D. McHerron, H. Adhikari, S. Kanakasabapathy, R. C. Johnson, Huiming Bu, R. J. Miller, Hiroshi Sunamura, Mariko Takayanagi, Yu Zhu, Effendi Leobandung, Atsuro Inada, S. Holmes, Jason E. Cummings, Masami Hane, James J. Demarest, Amit Kumar, Atsushi Yagishita, T. Yamamoto, Bruce B. Doris, Hemanth Jagannathan, Erin Mclellan, Chung Hsun Lin, Matthew E. Colburn, Jeremy A. Wahl, Stefan Schmitz, J. Kuss, Kingsuk Maitra, Lisa F. Edge, Vamsi Paruchuri, Theodorus E. Standaert, R. H. Kim, C.-C. Yeh
المصدر: 2010 Symposium on VLSI Technology.
مصطلحات موضوعية: Materials science, business.industry, Transistor, Electrical engineering, law.invention, law, Logic gate, MOSFET, Optoelectronics, Static random-access memory, Photolithography, business, Metal gate, Lithography, AND gate
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5afe0dec503f0b360dca5be1318fb10e
https://doi.org/10.1109/vlsit.2010.5556135 -
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المؤلفون: H. He, Paul C. Jamison, Bala S. Haran, Sanjay Mehta, Kangguo Cheng, D. Horak, Bruce B. Doris, Yu Zhu, D. K. Sadana, Basanth Jagannathan, J. L. Herman, Huiming Bu, Soon-Cheon Seo, S. Kanakasabapathy, Alexander Reznicek, L. H. Vanamurth, Amlan Majumdar, J. Cai, Thomas N. Adam, James A. O’Neill, P. Kozlowski, E. Leobondung, Pranita Kulkarni, Shom Ponoth, Nicolas Loubet, A. Upham, D. McHerron, S. Holmes, Z. Zhu, A. Kimball, Lisa F. Edge, Su Chen Fan, Stefan Schmitz, J. Kuss, Ghavam G. Shahidi, Ali Khakifirooz, R. Johnson, Daewon Yang, W. Haensch, J. Faltermeier
المصدر: Proceedings of 2010 International Symposium on VLSI Technology, System and Application.
مصطلحات موضوعية: business.industry, Computer science, Transistor, Electrical engineering, Silicon on insulator, Hardware_PERFORMANCEANDRELIABILITY, Integrated circuit design, law.invention, CMOS, Parasitic capacitance, law, MOSFET, Hardware_INTEGRATEDCIRCUITS, System on a chip, business, Random dopant fluctuation
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a3f37a35730694aacb89bafdca246f94
https://doi.org/10.1109/vtsa.2010.5488928