المؤلفون: Dhruv Singh, A. Gassaria, V. Chauhan, A. da Silva, P. Lindo, Daniel J. Dechene, M. Gribelyuk, I. Ahsan, M. Hasan, Judson R. Holt, Rod Augur, Jaeger Daniel, G. Northrop, G. Gomba, Ghosh Somnath, H. Narisetty, Basanth Jagannathan, Ting-Hsiang Hung, P. Liu, Y. Zhong, T. Gordon, Y. Fan, C. Schiller, A. Blauberg, O. Patterson, B. Morganfeld, Andres Bryant, J. Choo, T. Nigam, B. Senapati, V. Sardesai, N. Baliga, C. An, I. Ramirez, Rishikesh Krishnan, Arkadiusz Malinowski, S. Lucarini, Z. Sun, Sadanand V. Deshpande, R. Bhelkar, Mahender Kumar, Kong Boon Yeap, D. Conklin, Q. Fang, R. Gauthier, Purushothaman Srinivasan, S. Crown, M. Ozbek, Linjun Cao, G. Han, Z. Song, L. Huang, C. Serrau, R. Sweeney, M. Tan, Keith Donegan, Souvick Mitra, A. Zainuddin, P. Agnello, Balasubramanian S. Haran, Haifeng Sheng, B. Greene, A. Hassan, Tabakman Keith, Xin Wang, Sanjay Parihar, L. Cheng, M. Lagus, Jessica Dechene, D. Xu, G. Gifford, M. Zhao, Jeyaraj Antony Johnson, Y. Yan, Rick Carter, Manoj Joshi, W. Kim, Gabriela Dilliway, Jack M. Higman, S. Kalaga, Kai Zhao, Jinping Liu, A. Ogino, M. Lipinski, Amanda L. Tessier, Garo Jacques Derderian, S. Madisetti, N. Shah, Christopher Ordonio, M. Aminpur, Rakesh Ranjan, S. Saudari, Christa Montgomery, Tony Tae-Hyoung Kim, Jeric Sarad, Jae Gon Lee, Bharat Krishnan, Joseph F. Shepard, L. Hu, J. Sporre, Akil K. Sutton, Eswar Ramanathan, Cathryn Christiansen, J.H. Han, J. Lemon, Patrick Justison, Natalia Borjemscaia, Scott C. Johnson, B. Cohen, Kan Zhang, Srikanth Samavedam, G. Xu, T. Xuan, Unoh Kwon, C. Meng, Katsunori Onishi, Y. Shi, C. Huang, R. Coleman, Manfred Eller, Shreesh Narasimha, B. Kannan, J. Yang, Vivek Joshi, W. Ma, Christopher D. Sheraw, A. K. M. Mahalingam, Craig Child, E. Woodard, Tao Chu, Y. Jin, D. K. Sohn, Hasan M. Nayfeh, Mary Claire Silvestre, M. Lingalugari, G. Biery, Tian Shen, Carl J. Radens, E. Kaste, C-H. Lin, K. Han, K. Anil, Ankur Arya, Mehta Jaladhi, Jia Zeng, S.L. Liew, Michael V. Aquilino, M. Yu, M. Chen, Rohit Pal, E. Maciejewski, Stephan Grunow, Robert Fox, Rinus T. P. Lee

المصدر: 2017 IEEE International Electron Devices Meeting (IEDM).

مصطلحات موضوعية: 010302 applied physics, Computer science, Extreme ultraviolet lithography, Process (computing), 02 engineering and technology, 021001 nanoscience & nanotechnology, Low voltage sram, 01 natural sciences, Capacitance, CMOS, Computer architecture, Logic gate, 0103 physical sciences, Leverage (statistics), 0210 nano-technology, Immersion lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5545f519d7dcbb19a8a64d95e77053fd
https://doi.org/10.1109/iedm.2017.8268476

المؤلفون: A. Kodess, F. Lazebnik, S. Smith, J. Sporre

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::465d6ff3505e1abb2a860aabc3c2a4e6
https://doi.org/10.1142/9789814719261_0010

المؤلفون: David N. Ruzic, H. Shin, J. Sporre, R. Raju

المصدر: Microelectronic Engineering. 86:99-105

مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, chemistry.chemical_element, Surface finish, Contamination, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Optics, Carbon film, chemistry, Sputtering, Extreme ultraviolet, Surface roughness, Electrical and Electronic Engineering, business, Carbon

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::203f6556bcc9d72a87b143eb1efdd2e6
https://doi.org/10.1016/j.mee.2008.10.009

المؤلفون: Dennis J. Sporre

نوع المادة: eBook.

تصنيفات: ART / General

المؤلفون: Dennis J. Sporre

نوع المادة: eBook.

تصنيفات: ART / General

المؤلفون: David N. Ruzic, H. Shin, M. J. Neumann, J. Sporre, W. M. Lytle, R. Raju

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Contamination control, Materials science, business.industry, Extreme ultraviolet lithography, law.invention, Optics, Resist, law, Extreme ultraviolet, Reactive-ion etching, Stepper, Photolithography, business, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4afa52321e5e3d446c37bfd8786ae528
https://doi.org/10.1117/12.804689

المؤلفون: R. Raju, David N. Ruzic, Carlos H. Castano, J. Sporre

المصدر: Journal of Applied Physics. 106:043304

مصطلحات موضوعية: Optics, Chemistry, business.industry, Extreme ultraviolet, Extreme ultraviolet lithography, Detector, General Physics and Astronomy, Flux, Plasma diagnostics, Plasma, business, Debris, Ion

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9274e46e744deaa0f2d0e964de2a13eb
https://doi.org/10.1063/1.3176494

المؤلفون: Robert C. Burroughs, Steve Boone, Francis Reid, Dennis J. Sporre

المصدر: Theatre Journal. 43:416

مصطلحات موضوعية: Literature and Literary Theory, Visual Arts and Performing Arts

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8fedf367f188fd5d78b2c6228893ae9f
https://doi.org/10.2307/3207612

لا يتم عرض هذه النتيجة على الضيوف.
تسجيل الدخول للوصول الكامل.

لا يتم عرض هذه النتيجة على الضيوف.
تسجيل الدخول للوصول الكامل.