المؤلفون: M.-L. Pourteau, A. Gharbi, P. Brianceau, J.-A. Dallery, F. Laulagnet, G. Rademaker, R. Tiron, H.-J. Engelmann, J. von Borany, K.-H. Heinig, M. Rommel, L. Baier

المصدر: Micro and Nano Engineering, Vol 9, Iss , Pp 100074- (2020)

مصطلحات موضوعية: Single-electron-transistor, Multilayer nanopillars, Si nanodots, E-beam lithography, ICP-RIE, EFTEM, Electronics, TK7800-8360, Technology (General), T1-995

وصف الملف: electronic resource

Relation: http://www.sciencedirect.com/science/article/pii/S2590007220300290; https://doaj.org/toc/2590-0072

URL الوصول: https://doaj.org/article/293532bf485e4b0bb8f502c2bf8aa57a

المؤلفون: P. Brianceau, M. Rommel, Hans-Jürgen Engelmann, M.-L. Pourteau, J. von Borany, F. Laulagnet, Guido Rademaker, J.-A. Dallery, Ahmed Gharbi, L. Baier, Karl-Heinz Heinig, Raluca Tiron

المساهمون: Département Plate-Forme Technologique (DPFT), Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Vistec Electron Beam GmbH, Helmholtz-Zentrum Dresden-Rossendorf (HZDR), Fraunhofer Institute for Integrated Systems and Device Technology (Fraunhofer IISB), Fraunhofer (Fraunhofer-Gesellschaft), European Project: 688072,H2020,H2020-ICT-2015,IONS4SET(2016), Publica

المصدر: Micro and Nano Engineering
Micro and Nano Engineering, Elsevier, 2020, 9, https://doi.org/10.1016/j.mne.2020.100074. ⟨10.1016/j.mne.2020.100074⟩
Micro and Nano Engineering, 2020, 9, https://doi.org/10.1016/j.mne.2020.100074. ⟨10.1016/j.mne.2020.100074⟩
Micro and Nano Engineering 9(2020), 100074
Micro and Nano Engineering, Vol 9, Iss, Pp 100074-(2020)

مصطلحات موضوعية: Reactive ion etching, Materials science, Fabrication, lcsh:TK7800-8360, EFTEM, 02 engineering and technology, 01 natural sciences, 010309 optics, Single-electron transistor, Characterization methods, E-beam lithography, Robustness (computer science), lcsh:Technology (General), Energy-filtered transmission electron microscopy, 0103 physical sciences, Electrical and Electronic Engineering, Reactive-ion etching, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Lithography, Nanopillar, business.industry, ICP-RIE, lcsh:Electronics, Single-electron-transistor, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Multilayer nanopillars, CMOS, lcsh:T1-995, Optoelectronics, Si nanodots, 0210 nano-technology, business, Silicon nanodots, Critical dimension

وصف الملف: application/pdf

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1ffaa0176ed92185b48dbaa77d24531d
https://hal-cea.archives-ouvertes.fr/cea-03409432

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المؤلفون: Raluca Tiron, Hans-Jürgen Engelmann, L. Baier, Ahmed Gharbi, Guido Rademaker, Karl-Heinz Heinig, J.-A. Dallery, P. Brianceau, J. von Borany, M.-L. Pourteau, F. Laulagnet, M. Rommel

المصدر: Microelectronic Engineering. :111336

مصطلحات موضوعية: Set (abstract data type), CMOS, business.industry, Computer science, Optoelectronics, Electrical and Electronic Engineering, Condensed Matter Physics, business, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Nanopillar

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3b43b81cdf3e25cdf2c0c3b10d835a3f
https://doi.org/10.1016/j.mee.2020.111336

المؤلفون: B. Hemard, Sébastien Barnola, L. Gaben, S. Pauliac, Virginie Loup, C. Euvrard, J.-A. Dallery, Y. Exbrayat, M.-P. Samson, Thomas Skotnicki, Christian Arvet, M. Vinet, X. Bossy, C. Vizioz, L. Koscianski, Frederic Boeuf, C. Perrot, R. Dechanoz, J. Bustos, B. Previtali, B. Perrin, V. Balan, Francis Balestra, James C. Sturm, S. Barraud, Stephane Monfray, Pascal Besson

المساهمون: STMicroelectronics [Crolles] (ST-CROLLES), Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC ), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), Vistec Electron Beam GmbH

المصدر: 2017 EUROSOI-ULIS Proceedings
2017 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS)
2017 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), Apr 2017, Athens, Greece. pp.120-123, ⟨10.1109/ULIS.2017.7962617⟩

مصطلحات موضوعية: Extreme ultraviolet lithography, 3D lithography, Nanowire, Nanotechnology, Hardware_PERFORMANCEANDRELIABILITY, 01 natural sciences, stacked nanowire FETs, law.invention, SNWFET, chemistry.chemical_compound, Etching (microfabrication), law, 0103 physical sciences, Hardware_INTEGRATEDCIRCUITS, HSQ, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Lithography, Hydrogen silsesquioxane, 010302 applied physics, business.industry, Transistor, CMOS, chemistry, Logic gate, FinFET, Optoelectronics, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ca7595340398bf8248e822cfce7e8ba8
https://hal.archives-ouvertes.fr/hal-02014232

المؤلفون: Thomas Skotnicki, L. Koscianski, M.-P. Samson, S. Pauliac, M. Vinet, J. Bustos, Stephane Monfray, J.-A. Dallery, Frederic Boeuf, Francis Balestra, X. Bossy, L. Gaben, R. Dechanoz, S. Barraud, B. Hemard

المساهمون: STMicroelectronics [Crolles] (ST-CROLLES), Laboratoire d'Electronique et des Technologies de l'Information (CEA-LETI), Université Grenoble Alpes (UGA)-Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC), Université Joseph Fourier - Grenoble 1 (UJF)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP)-Institut National Polytechnique de Grenoble (INPG)-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA), Ducroquet, Frédérique, Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC ), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019])

المصدر: Book of Abstracts of the 2016 SSDM
2016 International Conference on Solid State Devices and Materials
2016 International Conference on Solid State Devices and Materials, Sep 2016, Tsukuba, Japan. pp.O-3-03 FinFET and Nanowire FET

مصطلحات موضوعية: Fabrication, Materials science, business.industry, [SPI.NANO] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Nanowire, Optoelectronics, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, business, Lithography, ComputingMilieux_MISCELLANEOUS

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4667bf7f5eabe603978df3f1fb87c46a
https://hal.archives-ouvertes.fr/hal-02015707

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لا يتم عرض هذه النتيجة على الضيوف.
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المؤلفون: J.-A. Dallery, Laetitia Adelmini, K. Louv, Quentin Wilmart, Segolene Olivier, H. El Dirani, Corrado Sciancalepore, C. Socquet-Clerc

المصدر: Integrated Optics: Devices, Materials, and Technologies XXII

مصطلحات موضوعية: Materials science, business.industry, Optical link, Transmitter, Silicon on insulator, 02 engineering and technology, 01 natural sciences, Multiplexing, 010309 optics, Wavelength, 020210 optoelectronics & photonics, 13. Climate action, Wavelength-division multiplexing, 0103 physical sciences, 0202 electrical engineering, electronic engineering, information engineering, Optoelectronics, Crystalline silicon, business, Echelle grating

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c326ec691933870c80ea522184abd560