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1
المؤلفون: Jason A. Kenney, Ihor Korolov, Peng Tian, Shahid Rauf, Julian Schulze, Jun-Chieh Wang
المصدر: Plasma Sources Science and Technology. 30:075031
مصطلحات موضوعية: Distribution function, Materials science, Dual frequency, Capacitively coupled plasma, Particle-in-cell, Atomic physics, Condensed Matter Physics, Ion energy
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2
المؤلفون: S. Sadighi, N. Lundy, S. Guo, Shahid Rauf, Jun-Chieh Wang, Phillip J. Stout, Wei Tian, G. S. Sandhu, Jason A. Kenney, Sumeet C. Pandey, T. Zhou, V. S. Vidyarthi, J. Guo, K. Delfin
المصدر: Plasma Sources Science and Technology. 27:094003
مصطلحات موضوعية: 010302 applied physics, Materials science, Silicon, business.industry, chemistry.chemical_element, 02 engineering and technology, Plasma, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, Power (physics), Ion, chemistry, Etching (microfabrication), Duty cycle, 0103 physical sciences, Optoelectronics, Wafer, Inductively coupled plasma, 0210 nano-technology, business
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3
المؤلفون: Leonid Dorf, Ankur Agarwal, Shahid Rauf, Jason A. Kenney, J. C. Wang, Kartik Ramaswamy, Ying Zhang, Kenneth S. Collins
المصدر: SPIE Proceedings.
مصطلحات موضوعية: 010302 applied physics, Materials science, Plasma etching, business.industry, technology, industry, and agriculture, 02 engineering and technology, Plasma, 021001 nanoscience & nanotechnology, 01 natural sciences, Ion, Semiconductor, Etch pit density, Etching (microfabrication), 0103 physical sciences, Electron temperature, Atomic physics, 0210 nano-technology, business, Plasma processing
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6160f7bebeff42ab133854a6e179341f
https://doi.org/10.1117/12.2222309 -
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المؤلفون: Jason A. Kenney, Ankur Agarwal, Kallol Bera, Alexandre Likhanskii, Shahid Rauf
المصدر: Journal of Physics D: Applied Physics. 50:424001
مصطلحات موضوعية: 010302 applied physics, Materials science, Acoustics and Ultrasonics, business.industry, Nanotechnology, 02 engineering and technology, Plasma, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Plasma modeling, 01 natural sciences, Ion source, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Ion implantation, Physics::Plasma Physics, Physics::Space Physics, 0103 physical sciences, Optoelectronics, Capacitively coupled plasma, Thin film, Inductively coupled plasma, 0210 nano-technology, business, Plasma processing
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5
المؤلفون: Jason A. Kenney, Gyeong S. Hwang
المصدر: Nanotechnology. 16:S309-S313
مصطلحات موضوعية: Level set method, Materials science, Mechanical Engineering, Analytical chemistry, Pulse duration, Bioengineering, General Chemistry, Mechanics, Electrochemical machining, Mechanics of Materials, Position (vector), Etching, General Materials Science, Transient (oscillation), Electrical and Electronic Engineering, Dissolution, Voltage
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6
المؤلفون: Ankur Agarwal, Gonzalo Antonio Monroy, Kenneth S. Collins, Ying Zhang, Kartik Ramaswamy, Leonid Dorf, J. C. Wang, Jason A. Kenney, Shahid Rauf
المصدر: Journal of Physics D: Applied Physics. 50:274003
مصطلحات موضوعية: 010302 applied physics, Materials science, Plasma etching, Acoustics and Ultrasonics, business.industry, technology, industry, and agriculture, 02 engineering and technology, Electron, Plasma, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Ion, Etching (microfabrication), 0103 physical sciences, Optoelectronics, Electron temperature, Reactive-ion etching, 0210 nano-technology, business, Plasma processing
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7
المؤلفون: Gyeong S. Hwang, Jason A. Kenney, Woonsup Shin
المصدر: Applied Physics Letters. 84:3774-3776
مصطلحات موضوعية: Materials science, Physics and Astronomy (miscellaneous), business.industry, Analytical chemistry, Pulse duration, Substrate (electronics), Electrolyte, Surface micromachining, Electric field, Etching, Electrode, Optoelectronics, business, Voltage
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8
المؤلفون: Zhigang Chen, Ajit Balakrishna, Jason A. Kenney, Ankur Agarwal, Kenneth S. Collins, Kallol Bera, Shahid Rauf
المصدر: AIP Conference Proceedings.
مصطلحات موضوعية: Materials science, Plasma etching, business.industry, Nuclear engineering, Fluid dynamics, Microelectronics, Fluid mechanics, Nanotechnology, Plasma, Current (fluid), business, Plasma modeling, Plasma processing
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9
المؤلفون: Shahid Rauf, Kenneth S. Collins, Jason A. Kenney
المصدر: IEEE Transactions on Plasma Science. 39:2524-2525
مصطلحات موضوعية: Physics, Nuclear and High Energy Physics, Electron density, Plane (geometry), media_common.quotation_subject, Plasma, Condensed Matter Physics, Asymmetry, Symmetry (physics), Ion, Physics::Plasma Physics, Capacitively coupled plasma, Atomic physics, Inductively coupled plasma, Nuclear Experiment, media_common
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المؤلفون: Shahid Rauf, Zhigang Chen, Jason A. Kenney, J. Kudela, N. Hammond, Kenneth S. Collins, T. Tanaka
المصدر: IEEE Transactions on Plasma Science. 39:2526-2527
مصطلحات موضوعية: Nuclear and High Energy Physics, Electron density, Materials science, business.industry, Electrical engineering, Plasma, Condensed Matter Physics, Electromagnetic radiation, Plasma-enhanced chemical vapor deposition, Electric field, Electrode, Optoelectronics, Capacitively coupled plasma, business, Plasma processing