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1
المؤلفون: Moshe E. Preil, Jed H. Rankin
المصدر: Photomask Technology 2019.
مصطلحات موضوعية: Materials science, business.industry, Optoelectronics, Photomask, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::688dd5a567f864f6bc38a796e63a6d5e
https://doi.org/10.1117/12.2555538 -
2
المؤلفون: Malavika Sharma, Ingo Bork, Peter Buck, Charles A. Whiting, Bhardwaj Durvasula, Jed H. Rankin, Rachit Sharma, Ken Jantzen, Joerg Mellmann, Nageswara S. V. Rao, Jianliang Li, Michaela Wentz, Gazi M. Huda, Adam C. Smith, Matthew Leuthold, Robin Chia, Kushlendra Mishra, Daniel M. Hill
المصدر: Photomask Technology 2019.
مصطلحات موضوعية: Reliability (semiconductor), Optical proximity correction, Process (engineering), Computer science, As is, media_common.quotation_subject, Cross-platform, Hardware_INTEGRATEDCIRCUITS, Fidelity, Photomask, Lithography, Reliability engineering, media_common
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::267ada551f903afe7ade6f83144333e4
https://doi.org/10.1117/12.2538347 -
3
المؤلفون: Todd Bailey, Wei-Long Wang, Weijie Lu, Jed H. Rankin, Yee Mei Foong, Gek Soon Chua, Paul Ackmann
المصدر: Photomask Technology 2019.
مصطلحات موضوعية: Reduction (complexity), High fidelity, Computer engineering, Optical proximity correction, law, Computer science, Process (computing), Photolithography, Photomask, Full cycle, Critical dimension, law.invention
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::db04df6da07a379c0a4d8368683ebd5a
https://doi.org/10.1117/12.2536745 -
4
المؤلفون: Yutaka Kodera, Karen D. Badger, Takeshi Isogawa, Jed H. Rankin, Shinji Akima, Masayuki Kagawa, Anka Birnstein, Jan Heumann, Yusuke Toda, Yoshida Itaru, Masashi Yonetani
المصدر: Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology.
مصطلحات موضوعية: Optics, Materials science, business.industry, Extreme ultraviolet, Extreme ultraviolet lithography, Mask inspection, Defect size, Photomask, business, Sensitivity (electronics)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::777b10635a9e310f564cd9e50649a55e
https://doi.org/10.1117/12.2537430 -
5
المؤلفون: Emily Gallagher, Jed H. Rankin
المصدر: Photomask Technology 2018.
مصطلحات موضوعية: Materials science, business.industry, Optoelectronics, Photomask, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::64c9e5a5d0470561f08e2acd1b1b57c8
https://doi.org/10.1117/12.2518039 -
6
المؤلفون: Rao Nageswara, Peter Buck, Jed H. Rankin, Christoph Spengler, Peter Hudek, Murali Reddy, Stefan Eder-Kapl, Michal Jurkovic, Christian Bürgel, Bhardwaj Durvasula, Elmar Platzgummer, Jan Klikovits, Ingo Bork
المصدر: Photomask Technology 2018.
مصطلحات موضوعية: business.industry, Computer science, 02 engineering and technology, Mask data preparation, 021001 nanoscience & nanotechnology, 01 natural sciences, 010309 optics, 0103 physical sciences, Hardware_INTEGRATEDCIRCUITS, Process window, Node (circuits), Photomask, 0210 nano-technology, business, Error detection and correction, Raster scan, Massively parallel, Lithography, Computer hardware
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::cd56e75b5562536cf96a91fe4b085ef0
https://doi.org/10.1117/12.2503284 -
7
المؤلفون: Jed H. Rankin, Larry Zhuang, Ingo Bork, Fan Jiang, Alexander Wei, Alexander Tritchkov, Todd Bailey, Yuyang Sun, Xima Zhang, Vivian Wei Guo, James Word, Srividya Jayaram
المصدر: Photomask Technology 2018.
مصطلحات موضوعية: Depth of focus, Curvilinear coordinates, Optical proximity correction, Image quality, Computer science, Extreme ultraviolet lithography, Process (computing), Electronic engineering, Lithography, Design for manufacturability
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b5a9d31b0f757b020087afbc78437795
https://doi.org/10.1117/12.2501973 -
8
المؤلفون: Toshiro Itani, Patrick P. Naulleau, Kurt G. Ronse, Christina Turley, Jed H. Rankin, Thomas J. Dunn, Xuemei Chen, Christopher Lee, Katherine Ballman, Paolo A. Gargini
المصدر: International Conference on Extreme Ultraviolet Lithography 2017.
مصطلحات موضوعية: Depth of focus, Scanner, Engineering, business.industry, Extreme ultraviolet lithography, Flatness (systems theory), Compensation (engineering), Distortion, Electronic engineering, Reticle, Node (circuits), Computer vision, Artificial intelligence, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4e03b5afabc931201e18e588c3c9be7c
https://doi.org/10.1117/12.2280464 -
9
المؤلفون: Obert Wood, Jongwook Kye, Francis Goodwin, Eric M. Gullikson, Lei Sun, Jed H. Rankin, Julia Meyer-Ilse, Zhengqing John Qi, Yulu Chen
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Depth of focus, Materials science, business.industry, Extreme ultraviolet lithography, Monte Carlo method, 02 engineering and technology, 021001 nanoscience & nanotechnology, Distributed Bragg reflector, 01 natural sciences, 010309 optics, Optics, Extreme ultraviolet, 0103 physical sciences, Surface roughness, Optoelectronics, Process window, 0210 nano-technology, business, Exposure latitude
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ab4dab581c3d8f2af74083ebbdc34ff3
https://doi.org/10.1117/12.2258121 -
10
المؤلفون: Zhengqing John Qi, Harry J. Levinson, Jed H. Rankin, Lei Sun
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Physics, business.industry, Extreme ultraviolet lithography, 02 engineering and technology, Edge (geometry), 021001 nanoscience & nanotechnology, 01 natural sciences, Noise (electronics), 010309 optics, Optics, Extreme ultraviolet, 0103 physical sciences, Line (geometry), Wafer, 0210 nano-technology, business, Critical dimension, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c600f2ba6bf2832b183fcf878f3e3b7b
https://doi.org/10.1117/12.2258136