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المؤلفون: Eric Kwon, Bill Kalsbeck, Paul Chung, Wonil Cho, Suein Son, Gregg Inderhees, Il-Yong Jang, Chan-Uk Jeon, Jiuk Hur, JeongHun Seo, Min Choo, Alexander Tan, In-Yong Kang
المصدر: Photomask Technology 2018.
مصطلحات موضوعية: Flexibility (engineering), business.industry, Computer science, Extreme ultraviolet lithography, Reticle, Process (computing), Wafer, Node (circuits), business, Throughput (business), Blank, Computer hardware
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0fca639f9b742a35121801bb0aeeaf95
https://doi.org/10.1117/12.2511160 -
2مؤتمر
المؤلفون: Inderhees, Gregg, Kalsbeck, Bill, Tan, Alexander, Paul Chung, JiUk Hur, Kwon, Eric, Min Choo, Wonil Cho, Chan-Uk Jeon, IlYong Jang, In-Yong Kang, JeongHun Seo, Suein Son
المصدر: Proceedings of SPIE; 8/26/2018, Vol. 10810, p1081017-1-1081017-10, 10p
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المؤلفون: Donghoon Paul Chung, Jiuk Hur, Gregg Inderhees, Gi-sung Yoon, In Yong Kang, Byung-Gook Kim, Jonghee Lee, Trent Hutchinson, Chan-Uk Jeon, Wonil Cho
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, Scanner, business.industry, Extreme ultraviolet lithography, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Node (circuits), Mask inspection, Photomask, business, Lithography, Immersion lithography, Aerial image
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::636c44f1cec4c3c0a88b7e87f5e63772
https://doi.org/10.1117/12.2030976 -
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المؤلفون: Byung-Gook Kim, Jung-Uk Seo, Dong-Hoon Chung, Chan-Uk Jeon, Wonil Cho, Tetsuya Yamamoto, Jiuk Hur, Young-Keun Yoon, Min-ho Kim
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Wafer fabrication, Engineering, Dimension (vector space), business.industry, Computer data storage, Electronic engineering, Node (circuits), Photomask, business, Throughput (business), Critical dimension, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a63c93c12d6c4959c3956f4d51bcf54a
https://doi.org/10.1117/12.2025694 -
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المؤلفون: Dong-Hoon Chung, Han-Ku Cho, William Huang, KiHun Park, Won-Sun Kim, Jay Han, Chan-Uk Jeon, Gregg Inderhees, John Miller, Becky Pinto, Jiuk Hur
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Automated optical inspection, Engineering drawing, Engineering, Scanner, business.industry, ComputingMethodologies_IMAGEPROCESSINGANDCOMPUTERVISION, Mask inspection, USable, Automated X-ray inspection, Optical proximity correction, Reticle, Computer vision, Artificial intelligence, business, Aerial image
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::96f83de36092204477b47b6adc10213c
https://doi.org/10.1117/12.824289