المؤلفون: Jiang J.-J., Xiao C., Yu Y., Li J.-L.

المصدر: Journal of Mining and Metallurgy. Section B: Metallurgy, Vol 59, Iss 3, Pp 431-441 (2023)

مصطلحات موضوعية: kr slag, temperature, sulfur, oxidation behavior, Mining engineering. Metallurgy, TN1-997

وصف الملف: electronic resource

Relation: https://doaj.org/toc/1450-5339; https://doaj.org/toc/2217-7175

URL الوصول: https://doaj.org/article/d32aca7e455248a8aed5f1a2615da41e

المؤلفون: Liu, Y., Jiang, J., Liu, K., Wang, S., Niu, P., Wang, T., Xu, T., Zhang, X., Liu, T.

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المصدر: IEEE Transactions on Parallel and Distributed Systems IEEE Trans. Parallel Distrib. Syst. Parallel and Distributed Systems, IEEE Transactions on. 35(8):1444-1455 Aug, 2024

المؤلفون: Li, S., Sheng, J., Wang, X., Liu, L., Yang, K., Jiang, J.

المصدر: IEEE Transactions on Applied Superconductivity IEEE Trans. Appl. Supercond. Applied Superconductivity, IEEE Transactions on. 34(5):1-5 Aug, 2024

المؤلفون: Lee, C., Lin, K., Jiang, J.

المصدر: IEEE Transactions on Aerospace and Electronic Systems IEEE Trans. Aerosp. Electron. Syst. Aerospace and Electronic Systems, IEEE Transactions on. 60(4):5340-5349 Aug, 2024

المؤلفون: Zuo, Q., Hao, X., Wang, J., Ma, Y., Liu, J., Kuai, Q., Guo, Z., Jiang, J., Chen, Z.

المصدر: IEEE Transactions on Circuits and Systems II: Express Briefs IEEE Trans. Circuits Syst. II Circuits and Systems II: Express Briefs, IEEE Transactions on. 71(8):4000-4004 Aug, 2024

المؤلفون: Lei, H., Jiang, J., Ansari, I.S., Pan, G., Alouini, M.

المصدر: IEEE Transactions on Aerospace and Electronic Systems IEEE Trans. Aerosp. Electron. Syst. Aerospace and Electronic Systems, IEEE Transactions on. 60(4):4574-4589 Aug, 2024

المؤلفون: Shi, Z., Xiao, J., Jiang, J., Zhang, Y., Zhou, Y.

المصدر: IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems IEEE Trans. Comput.-Aided Des. Integr. Circuits Syst. Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on. 43(8):2479-2492 Aug, 2024

المؤلفون: Wu, L., Li, Z., Zhao, H., Huang, Z., Han, Y., Jiang, J., Chen, E.

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