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1مؤتمر
المؤلفون: Yonggen He, Bing Wu, Guobin Yu, Jin Lin, Zhang, Seanf, Jiong-Ping Lu, Jingang Wu, JiYue Tang, Ganming Zhao
المصدر: 2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) Advanced Thermal Processing of Semiconductors (RTP), 2010 18th International Conference on. :76-78 Sep, 2010
Relation: 2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP)
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2دورية أكاديمية
المؤلفون: Jun Liu, Huang-Chun Wen, Jiong-Ping Lu, Dim-Lee Kwong
المصدر: IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 52(12):2703-2709 Dec, 2005
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3مؤتمر
المؤلفون: Jiong Ping Lu, Salim, S., Jensen, K.F., Bohling, D.A.
المصدر: Sixth International Conference Metalorganic Vapor Phase Epitaxy Metalorganic Vapor Phase Epitaxy, 1992. Sixth International Conference. :28-29 1992
Relation: Sixth International Conference Metalorganic Vapor Phase Epitaxy
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4
المؤلفون: Jiong-Ping Lu, Huang-Chun Wen, Dim-Lee Kwong, Jun Liu
المصدر: IEEE Transactions on Electron Devices. 52:2703-2709
مصطلحات موضوعية: Materials science, Dopant, business.industry, Doping, chemistry.chemical_element, Electronic, Optical and Magnetic Materials, PMOS logic, chemistry, Electronic engineering, Optoelectronics, Work function, Electrical and Electronic Engineering, business, Tin, Metal gate, Layer (electronics), NMOS logic
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5
المؤلفون: Q. Z. Hong, P.J Chen, Lissa K. Magel, Jiong-Ping Lu, H. L. Tsai, Girish A. Dixit, Joseph D. Luttmer, Robert H. Havemann, Wei-Yung Hsu
المصدر: Thin Solid Films. 320:20-25
مصطلحات موضوعية: Chemistry, Metals and Alloys, chemistry.chemical_element, Surfaces and Interfaces, Chemical vapor deposition, Silane, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, Chemical engineering, Physical vapor deposition, Materials Chemistry, Thermal stability, Metalorganic vapour phase epitaxy, Tin, Sheet resistance, Diode
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6
المؤلفون: Yu-Pei Chen, Joseph D. Luttmer, Wei-Yung Hsu, Jiong-Ping Lu, Anthony J. Konecni, Girish A. Dixit, Robert H. Havemann
المصدر: Thin Solid Films. 320:73-76
مصطلحات موضوعية: Materials science, business.industry, Contact resistance, Metals and Alloys, chemistry.chemical_element, Surfaces and Interfaces, Chemical vapor deposition, Titanium nitride, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, chemistry, Plasma-enhanced chemical vapor deposition, Physical vapor deposition, Materials Chemistry, Optoelectronics, Metallizing, Metalorganic vapour phase epitaxy, business, Titanium
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7
المؤلفون: Ganming Zhao, Jiong-Ping Lu, Jingang Wu, Bing Wu, Yonggen He, Seanf Zhang, Guobin Yu, Jiyue Tang, Jin Lin
المصدر: 2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP).
مصطلحات موضوعية: Materials science, Dopant, business.industry, Annealing (metallurgy), Transistor, Metallurgy, chemistry.chemical_element, Activation energy, law.invention, chemistry.chemical_compound, Nickel, chemistry, law, Silicide, Optoelectronics, Thin film, business, Leakage (electronics)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8928323591359a2fc408432760e6e222
https://doi.org/10.1109/rtp.2010.5623785 -
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المؤلفون: Q. Z. Hong, J. D. Luttmer, L. K. Magel, Wei-Yung Hsu, Robert H. Havemann, Jiong-Ping Lu, Girish A. Dixit
المصدر: ChemInform. 28
مصطلحات موضوعية: chemistry.chemical_compound, chemistry, Chemical engineering, Electrical resistivity and conductivity, Scientific method, Thermal decomposition, chemistry.chemical_element, Conformal map, General Medicine, Thin film, Tin, Silane, Annealing (glass)
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9
المؤلفون: Yue Chen, Albert Hong, Lu Yu, Jiong-Ping Lu, Yonggen He, Xianghua Liu, Guobin Yu, Yong Chen
المصدر: 2010 International Workshop on Junction Technology Extended Abstracts.
مصطلحات موضوعية: Millisecond, Materials science, business.industry, Annealing (metallurgy), STRIPS, Laser, Silicon-germanium, law.invention, Semiconductor laser theory, chemistry.chemical_compound, chemistry, law, Electronic engineering, Optoelectronics, Macro, business, Sheet resistance
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0240b0ec5ed1e393b5fd7f972823ecac
https://doi.org/10.1109/iwjt.2010.5474916 -
10
المؤلفون: Yong Chen, Yonggen He, Jiong-Ping Lu
المصدر: 2010 International Workshop on Junction Technology Extended Abstracts.
مصطلحات موضوعية: Millisecond, Fabrication, Materials science, Annealing (metallurgy), Hardware_PERFORMANCEANDRELIABILITY, Dopant Activation, Engineering physics, Silicon-germanium, chemistry.chemical_compound, chemistry, CMOS, Silicide, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Leakage (electronics)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::432bf7f833af143f43d252d6102cabf7
https://doi.org/10.1109/iwjt.2010.5474997