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المؤلفون: Douglas B. Hunt, Timothy W. Kemerer, William J. Murphy, Stephane Lariviere, Cathryn Christiansen, Edward C. Cooney, Tony Stamper, Michael Coster, Jeffrey P. Gambino, Gregory U'Ren, Jonathan D. Chapple-Sokol, Richard J. Rassel, Stephane Brandon, Tom C. Lee
المصدر: 2014 IEEE International Reliability Physics Symposium.
مصطلحات موضوعية: Materials science, chemistry, Aluminium, Stress migration, Metallurgy, Copper plating, chemistry.chemical_element, Tungsten, Composite material, Copper, Highly sensitive
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::cc37b05c83ed510eac38669505ebe4c5
https://doi.org/10.1109/irps.2014.6860580 -
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المؤلفون: David E. Kotecki, Jonathan D. Chapple‐Sokol
المصدر: Journal of Applied Physics. 77:1284-1293
مصطلحات موضوعية: Materials science, Hydrogen, Silicon, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, Substrate (electronics), Chemical vapor deposition, Silane, chemistry.chemical_compound, chemistry, Silicon nitride, Thin film, Stoichiometry
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3
المؤلفون: J. Batey, R. A. Conti, E. Tierney, W. A. Pliskin, Jonathan D. Chapple-Sokol
المصدر: ChemInform. 23
مصطلحات موضوعية: inorganic chemicals, Silicon dioxide, General Medicine, Chemical vapor deposition, Silane, law.invention, chemistry.chemical_compound, Chemical engineering, chemistry, Plasma-enhanced chemical vapor deposition, Impurity, law, Deposition (phase transition), Power density, Susceptor
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المؤلفون: William John Patrick, Roy A. Carruthers, Kurt Olsen, Geraldine Cogin Schwartz, Jonathan D. Chapple‐Sokol
المصدر: Journal of The Electrochemical Society. 139:2604-2613
مصطلحات موضوعية: Permittivity, Silicon, Renewable Energy, Sustainability and the Environment, Silicon dioxide, Mineralogy, chemistry.chemical_element, Dielectric, Condensed Matter Physics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, Carbon film, chemistry, Chemical engineering, Plasma-enhanced chemical vapor deposition, Materials Chemistry, Electrochemistry, Deposition (phase transition), Wafer
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المؤلفون: J. Batey, E. Tierney, R. A. Conti, W. A. Pliskin, Jonathan D. Chapple-Sokol
المصدر: Journal of The Electrochemical Society. 138:3723-3726
مصطلحات موضوعية: inorganic chemicals, Renewable Energy, Sustainability and the Environment, Chemistry, Silicon dioxide, Mineralogy, Chemical vapor deposition, Condensed Matter Physics, Silane, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, law.invention, chemistry.chemical_compound, Chemical engineering, law, Impurity, Plasma-enhanced chemical vapor deposition, Materials Chemistry, Electrochemistry, Deposition (phase transition), Susceptor, Power density
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المؤلفون: B. Porth, Philippe M. Vereecken, Thomas J. Mcdevitt, C. Johnson, Jennifer C. Robbins, T. Rutkowski, M. Wenner, J. Gambino, Erick G. Walton, Stephen E. Luce, Kenneth Lawrence Devries, D. Rath, Jonathan D. Chapple-Sokol
المصدر: 2008 15th International Symposium on the Physical and Failure Analysis of Integrated Circuits.
مصطلحات موضوعية: Materials science, fungi, Metallurgy, technology, industry, and agriculture, Copper interconnect, chemistry.chemical_element, macromolecular substances, Copper, Cathode, Corrosion, law.invention, Anode, stomatognathic system, chemistry, law, Etching (microfabrication), Dry etching, Reactive-ion etching
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1e412f1a769f28f4127f9d445a5c9407
https://doi.org/10.1109/ipfa.2008.4588209 -
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المؤلفون: William J. Murphy, Daniel S. Vanslette, Stephen E. Luce, Stephen A. Mongeon, Tom C. Lee, Daniel A. Delibac, David C. Thomas, Timothy D. Sullivan, Z.X. He, Jonathan D. Chapple-Sokol
المصدر: MRS Proceedings. 1079
مصطلحات موضوعية: Barrier layer, Materials science, Stack (abstract data type), chemistry, Annealing (metallurgy), Contact resistance, chemistry.chemical_element, Composite material, RC time constant, Tin, Electromigration, Sheet resistance
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d2a09642561d03146cbcb65d60ea3a8d
https://doi.org/10.1557/proc-1079-n09-01 -
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المؤلفون: Carmen J. Giunta, Roy G. Gordon, Jonathan D. Chapple‐Sokol
المصدر: Journal of The Electrochemical Society. 137:3237-3253
مصطلحات موضوعية: chemistry.chemical_classification, Reaction mechanism, Renewable Energy, Sustainability and the Environment, Silicon dioxide, Inorganic chemistry, Nitrous oxide, Chemical vapor deposition, Condensed Matter Physics, Silane, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, chemistry, Plasma-enhanced chemical vapor deposition, Materials Chemistry, Electrochemistry, Disilane, Inorganic compound
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المصدر: Journal of Applied Physics. 67:1062-1075
مصطلحات موضوعية: Amorphous silicon, Silanes, Silicon, Atmospheric pressure, Chemistry, Inorganic chemistry, General Physics and Astronomy, chemistry.chemical_element, Chemical vapor deposition, Silane, chemistry.chemical_compound, Chemical engineering, Disilane, Deposition (law)
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المؤلفون: Jonathan D. Chapple‐Sokol, Roy G. Gordon, Carmen J. Giunta
المصدر: ChemInform. 21
مصطلحات موضوعية: chemistry.chemical_compound, chemistry, Atmospheric pressure, Silylene, Oxide, Physical chemistry, General Medicine, Nitrous oxide, Disilane, Decomposition, Deposition (chemistry), Silane
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::16c4f9a1b7c4f79c3defa148ccb66387
https://doi.org/10.1002/chin.199003018