يعرض 1 - 4 نتائج من 4 نتيجة بحث عن '"Jordan Belissard"', وقت الاستعلام: 0.95s تنقيح النتائج
  1. 1
    SEM image quality assessment for mask quality control

    المؤلفون: Nassim Halli, Frederic Robert, Jordan Belissard, Thiago Figueiro, Nivea Schuch, Mohamed Abaidi, Charles Valade, Alexandre Moly

    المصدر: Photomask Technology 2021.

    مصطلحات موضوعية: Optical proximity correction, business.industry, Image quality, Computer science, Calibration, Process (computing), Process control, Computer vision, Artificial intelligence, Focus (optics), business, Critical dimension, Metrology

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::69aa3fdcbcdc9edf6883bcdf33976418
    https://doi.org/10.1117/12.2601081

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  2. 2
    Roughness measurement of 2D curvilinear patterns: challenges and advanced methodology

    المؤلفون: Patrick Schiavone, Jonathan Pradelles, Thiago Figueiro, Jessy Bustos, Mohamed Abaidi, Jordan Belissard, Nivea Schuch, Matthieu Milléquant, Estelle Guyez, L. Perraud, Sébastien Bérard-Bergery, Aurélie Le Pennec, Aurélien Fay, Jean-Baptiste Henry, E. Sezestre

    المساهمون: Minatec

    المصدر: Proc. SPIE
    SPIE Advanced Lithography
    SPIE Advanced Lithography, Feb 2021, Online Only, France. pp.30, ⟨10.1117/12.2583843⟩

    مصطلحات موضوعية: Curvilinear coordinates, Computer science, Figure of merit, Context (language use), Sensitivity (control systems), Noise (video), Surface finish, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Algorithm, Lithography, Edge detection, ComputingMilieux_MISCELLANEOUS

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f428faf8e482054b9e9294453cc00305
    https://hal.archives-ouvertes.fr/hal-03156564

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  3. 3
    Pattern placement and shape distortion control using contour-based metrology

    المؤلفون: Thiago Figueiro, Patrick Schiavone, Charles Valade, B. Le-Gratiet, Nivea Schuch, Stéphanie Audran, J. Ducote, C. Gardin, Matthieu Milléquant, R. Bouyssou, Alain Ostrovsky, Jordan Belissard

    المساهمون: Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA)

    المصدر: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
    Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, Feb 2021, Online Only, France. pp.29, ⟨10.1117/12.2584364⟩

    مصطلحات موضوعية: Basis (linear algebra), business.industry, Computer science, Image processing, Overlay, Image (mathematics), Metrology, Metric (mathematics), Line (geometry), Computer vision, Artificial intelligence, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, business, Critical dimension, ComputingMilieux_MISCELLANEOUS

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3d618cd1dedb2c85efa6fd9c45b43c5d
    https://hal.archives-ouvertes.fr/hal-03156590

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  4. 4
    Limits of model-based CD-SEM metrology

    المؤلفون: Stéphane Labbé, Jordan Belissard, Faouzi Triki, Jérôme Hazart

    المساهمون: Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Equations aux Dérivées Partielles (EDP ), Laboratoire Jean Kuntzmann (LJK ), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Institut National de Recherche en Informatique et en Automatique (Inria)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019])-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Institut National de Recherche en Informatique et en Automatique (Inria)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019])

    المصدر: 34th European Mask and Lithography Conference
    34th European Mask and Lithography Conference, Jun 2018, Grenoble, France. pp.1077518:1-11, ⟨10.1117/12.2323696⟩

    مصطلحات موضوعية: Physics, Accuracy and precision, Microscope, inverse problems, business.industry, scanning electron microscope, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Noise (electronics), law.invention, Metrology, 010309 optics, Optics, [MATH.MATH-MP]Mathematics [math]/Mathematical Physics [math-ph], law, 0103 physical sciences, [MATH.MATH-AP]Mathematics [math]/Analysis of PDEs [math.AP], Sensitivity (control systems), 0210 nano-technology, business, Critical dimension, Order of magnitude, Beam (structure)

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6c10e50502a86f0d00238588d7003c53
    https://doi.org/10.1117/12.2323696

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