يعرض 1 - 10 نتائج من 26 نتيجة بحث عن '"Kamberian, Henry"', وقت الاستعلام: 0.95s تنقيح النتائج
  1. 1
    دورية أكاديمية
    Measurement of through-focus EUV pattern shifts using the SHARP actinic microscope

    المؤلفون: Wood, Obert, Chen, Yulu, Mangat, Pawitter, Goldberg, Kenneth, Benk, Markus, Kasprowicz, Bryan, Kamberian, Henry, McCord, Jeremy, Wallow, Thomas

    مصطلحات موضوعية: Philosophy and Religious Studies, Physical Sciences, History and Philosophy Of Specific Fields, Bioengineering, EUV, 3D mask effects, pattern shift, rigorous 3D mask lithography simulation, Communications engineering, Electronics, sensors and digital hardware, Atomic, molecular and optical physics

    وصف الملف: application/pdf

    URL الوصول: https://escholarship.org/uc/item/2tz1b42z

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  2. 2
    دورية
    EUV mask patterning process to enable opaque SRAFs for bright field EUV mask imaging

    المؤلفون: Liang, Ted, Kim, Seong-Sue, Green, Michael, Halle, Scott, Ramadan, Mohamed, Lallement, Romain, Kamberian, Henry, Burkhardt, Martin, Beineke, Jinju, Rankin, Jed, Progler, Chris, McDermott, Steven

    المصدر: Proceedings of SPIE; November 2023, Vol. 12751 Issue: 1 p127510M-127510M-9, 1147600p

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  3. 3
    دورية
    Use of advanced data modeling to introduce and extend mask tools serving mainstream application

    المؤلفون: Liang, Ted, Kim, Seong-Sue, Ramadan, Mohamed, Progler, Christopher, Green, Michael, Kamberian, Henry, Beineke, Jinju

    المصدر: Proceedings of SPIE; November 2023, Vol. 12751 Issue: 1 p127510I-127510I-6, 1147597p

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  4. 4
    كتاب
    Extreme ultraviolet lithography

    المساهمون: Wu, Banqiu., Kumar, Ajay, 1962-, Eynon, Benjamin G., Naulleau, Patrick., Richardson, Martin., La Fontaine, Bruno., Yulin, Sergiy., Silver, Richard M., Vladar, Andras E., Kamberian, Henry.

    وصف الملف: text

    Other Title: Exposure system.
    EUV sources.
    EUV optics.
    Multilayer interference coatings for EUVL.
    EUV metrology.
    EUV photoresist.
    EUVL masks.

    Relation: Electronic reproduction. New York, N.Y. : McGraw Hill, 2009. Mode of access: World Wide Web. System requirements: Web browser. Access may be restricted to users at subscribing institutions.

    الإتاحة: https://www.accessengineeringlibrary.com/content/book/9780071549189

    View record at McGraw-Hill Full Text Finder
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  5. 5
    دورية أكاديمية
    Methods to reduce lithography costs with reticle engineering

    المؤلفون: Mackay, R. Scott, Kamberian, Henry, Zhang, Yuan

    المصدر: In Microelectronic Engineering 2006 83(4):914-918

    View record from ScienceDirect Full Text Finder
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  6. 6
    مؤتمر
    EUV mask patterning process to enable opaque SRAFs for bright field EUV mask imaging.

    المؤلفون: Green, Michael, Halle, Scott, Ramadan, Mohamed, Lallement, Romain, Kamberian, Henry, Burkhardt, Martin, Beineke, Jinju, Rankin, Jed, Progler, Chris, McDermott, Steven

    المصدر: Proceedings of SPIE; 12/20/2023, Vol. 12751, p127510M-127510M-9, 1p

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  7. 7
    مؤتمر
    Use of advanced data modeling to introduce and extend mask tools serving mainstream application.

    المؤلفون: Ramadan, Mohamed, Progler, Christopher, Green, Michael, Kamberian, Henry, Beineke, Jinju

    المصدر: Proceedings of SPIE; 12/20/2023, Vol. 12751, p127510I-127510I-6, 1p

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  8. 8
    مؤتمر
    EUV Mask challenges and requirements for ultimate single exposure interconnects.

    المؤلفون: Progler, Chris, Green, Michael, Bonam, Ravi, Kamberian, Henry, Ramadan, Mohamed, Dunn, Derren, Ham, Young, Choi, Yohan, Meli, Luciana, Felix, Nelson, Corliss, Daniel, Kasprowicz, Bryan

    المصدر: Proceedings of SPIE; 1/20/2019, Vol. 10957, p109570L-1-109570L-14, 14p

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  9. 9
    دورية
    EUVL mask process development and verification using advanced modeling and characterization techniques

    المؤلفون: Felix, Nelson M., Lio, Anna, Green, Michael, Lallement, Romain, Ramadan, Mohamed, Dunn, Derren, Kamberian, Henry, Sieg, Stuart, Ham, Young, Progler, Chris

    المصدر: Proceedings of SPIE; March 2020, Vol. 11323 Issue: 1 p113230Q-113230Q-8, 1019079p

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  10. 10
    مؤتمر
    EUV Mask Manufacturing Readiness in the Merchant Mask Industry.

    المؤلفون: Green, Michael, Yohan Choi, Young Ham, Kamberian, Henry, Progler, Chris, Shih-En Tseng, Tsann-Bim Chiou, Miyazaki, Junji, Lammers, Ad, Alek Chen

    المصدر: Proceedings of SPIE; 8/14/2017, Vol. 10450, p1-10, 10p

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