المؤلفون: Radosavljevic, Marko, Huang, C.-Y., Galatage, R., Qayyum, M. F., Wiedemer, J. A., Clinton, E., Bennett, D., Ryu, H., Thomas, N. K., Morrow, P., Michaelos, T., Nahm, R., Briggs, N., Roy, A., Kuo, C. C., Atanasov, S., Ghose, S., Zussblatt, N., Kumar, N., Unluer, D., Beasley, M., Tan, J. M., Tan, L. H., Elkins, M., Cekli, S., Hermann, R., Shoer, L., El Qader, M. Abd, Desai, U., Edwards, T., Prasad, P., Armstrong, J., Ghosh, M., Liao, Y.-A., Kapinus, V., Dixit, D., Harper, M. K., Tran, P., Cheong, K. L., Fatehi, A., Oni, A. A., Franco, N., Krist, B. J., Metz, M. V., Dewey, G., Schenker, R., Kobrinsky, M. J.

المصدر: 2023 International Electron Devices Meeting (IEDM) Electron Devices Meeting (IEDM), 2023 International. :1-4 Dec, 2023

Relation: 2023 International Electron Devices Meeting (IEDM)

المؤلفون: Sell, B., An, S., Armstrong, J., Bahr, D., Bains, B., Bambery, R., Bang, K., Basu, D., Bendapudi, S., Bergstrom, D., Bhandavat, R., Bhowmick, S., Buehler, M., Caselli, D., Cekli, S., Chaganti, Vrsk., Chang, Y. J., Chikkadi, K., Chu, T., Crimmins, T., Darby, G., Ege, C., Elfick, P., Elko-Hansen, T., Fang, S., Gaddam, C., Ghoneim, M., Gomez, H., Govindaraju, S., Guo, Z., Hafez, W., Haran, M., Hattendorf, M., Hu, S., Jain, A., Jaloviar, S., Jang, M., Kameswaran, J., Kapinus, V., Kennedy, A., Klopcic, S., Krishnan, D., Leib, J., Lin, Y.-T., Lindert, N., Liu, G., Loh, O., Luo, Y., Mani, S., Mleczko, M., Mocherla, S., Packan, P., Paik, M., Paliwal, A., Pandey, R., Patankar, K., Pipes, L., Plekhanov, P., Prasad, C., Prince, M., Ramalingam, G., Ramaswamy, R., Riley, J., Perez, J. R. Sanchez, Sandford, J., Sathe, A., Shah, F., Shim, H., Subramanian, S., Tandon, S., Tanniru, M., Thakurta, D., Troeger, T., Wang, X., Ward, C., Welsh, A., Wickramaratne, S., Wnuk, J., Xu, S. Q., Yashar, P., Yaung, J., Yoon, K., Young, N.

المصدر: 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) VLSI Technology and Circuits (VLSI Technology and Circuits), 2022 IEEE Symposium on. :282-283 Jun, 2022

Relation: 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)

المؤلفون: Radosavljevic, M., Huang, C.-Y., Rachmady, W., Seung, S.H., Thomas, N. K., Dewey, G., Agrawal, A., Owens, K., Kuo, C. C., Jezewski, C. J., Nahm, R., Briggs, N., Tronic, T. A., Michaelos, T., Kabir, N. A., Holybee, B., Jun, K., Morrow, P., Phan, A., Shivaraman, S., Then, H. W., Kapinus, V., Harper, M. K., Nguyen, P. D., Cheong, K. L., Ghose, S., Ganguly, K., Bomberger, C., Tan, J. M., El Qader, M. Abd, Oni, A. A., Fischer, P., Bristol, R., Metz, M., Clendenning, S. B., Turkot, B., Schenker, R., Kobrinsky, M. J., Kavalieros, J.

المصدر: 2021 IEEE International Electron Devices Meeting (IEDM) Electron Devices Meeting (IEDM), 2021 IEEE International. :34.1.1-34.1.4 Dec, 2021

Relation: 2021 IEEE International Electron Devices Meeting (IEDM)

المؤلفون: Baum, M. M., Becker, R. M., Lappas, A. M., Moss, J. A., Apelian, D., Saha, D., Kapinus, V. A.

المصدر: Metallurgical and Materials Transactions B. April 2004 35(2):381-392

المؤلفون: Ragulin, Y., Kaplan, M., Medvedev, V., Kapinus, V., Peters, V.

المصدر: In Photodiagnosis and Photodynamic Therapy 2011 8(2):177-177

المؤلفون: Polkin, V., Kaplan, M., Medvedev, V., Siomin, D., Kapinus, V., Spichenkova, I., Isaev, P., Shubina, A.

المصدر: In Photodiagnosis and Photodynamic Therapy 2011 8(2):168-168

المؤلفون: Wu, S., Kapinus, V. A., Blake, G. A.

المصدر: Optics Communications; 1999, Vol. 159 Issue: 1 p74-79, 6p

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تسجيل الدخول للوصول الكامل.

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المؤلفون: Baum MM; Department of Chemistry, Oak Crest Institute of Science, Pasadena, California 91107, USA. m.baum@oak-crest.org, Kiyomiya ES, Kumar S, Lappas AM, Kapinus VA, Lord HC 3rd

المصدر: Environmental science & technology [Environ Sci Technol] 2001 Sep 15; Vol. 35 (18), pp. 3735-41.

نوع المنشور: Journal Article; Research Support, Non-U.S. Gov't

بيانات الدورية: Publisher: American Chemical Society Country of Publication: United States NLM ID: 0213155 Publication Model: Print Cited Medium: Print ISSN: 0013-936X (Print) Linking ISSN: 0013936X NLM ISO Abbreviation: Environ Sci Technol Subsets: MEDLINE

مواضيع طبية MeSH: Ammonia/*analysis , Environmental Monitoring/*methods , Vehicle Emissions/*analysis, Air Pollutants/analysis ; Particle Size ; Spectrophotometry, Atomic