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المؤلفون: John Lewellen, Yiming Gu, Simon Chang, Duncan Rogers, Gary Zhang, Leif C. Olsen, Karen H. R. Kirmse
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, business.industry, Transistor, law.invention, Optical proximity correction, law, Shallow trench isolation, Chemical-mechanical planarization, Electronic engineering, Phase-shift mask, Optoelectronics, Node (circuits), business, Critical dimension, Electronic circuit
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1518f44caa1af3f07298b516924e35a1
https://doi.org/10.1117/12.655914 -
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المؤلفون: C.T. Lin, N.S. Nagaraj, Gary Zhang, Sue E. Crank, J. Rosal, Song Zhao, Theodore W. Houston, Amitava Chatterjee, R. Aggarwal, Darius L. Crenshaw, H. Mogul, J. Wu, Alwin J. Tsao, J. Kim, Leif C. Olsen, L. Adam, M. Jain, D. Mosher, David B. Scott, D. Aldrich, Karen H. R. Kirmse, Manoj Mehrotra, Stan Ashburn, Byron Lovell Williams, Jong Shik Yoon, J. Y. Yang, C. Meek, Ki-Don Lee, Tony Tae-Hyoung Kim, B. Chatterjee, Manuel Quevedo-Lopez, Jarvis B. Jacobs, Steven Alan Lytle, Qi-Zhong Hong, Shaoping Tang, Kayvan Sadra, Hugh Mair
المصدر: IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004..
مصطلحات موضوعية: Digital signal processor, Engineering, business.industry, Electrical engineering, Integrated circuit, Key features, law.invention, CMOS, Nanoelectronics, law, Mobile telephony, Static random-access memory, business, Digital signal processing
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a87cd2554c5e89e333bc08ada83d8ded
https://doi.org/10.1109/iedm.2004.1419255 -
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المؤلفون: Karen H. R. Kirmse, Amy E. Wendt, Eric S. Cielaszyk, R.A. Stewart
المصدر: Applied Physics Letters. 67:3099-3101
مصطلحات موضوعية: Materials science, Physics and Astronomy (miscellaneous), Silicon, Passivation, Hydrogen, Analytical chemistry, chemistry.chemical_element, engineering.material, Electron cyclotron resonance, symbols.namesake, Polycrystalline silicon, chemistry, Thin-film transistor, symbols, engineering, Langmuir probe, Plasma diagnostics
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المؤلفون: Christopher C. Baum, Marco Guevremont, Suresh Lakkapragada, Umar K. Whitney, Kamal N. Bhatia, Vladimir A. Ukraintsev, Mak Kulkarni, Pedro Herrera, Karen H. R. Kirmse
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Accuracy and precision, Materials science, Silicon, Scanning electron microscope, business.industry, Copper interconnect, chemistry.chemical_element, Fluorosilicate glass, Metrology, Laser linewidth, Optics, chemistry, Trench, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::88f437af04d69cb5a34f0fb75132b81e
https://doi.org/10.1117/12.473457 -
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المؤلفون: C. T. Nelson, Karen H. R. Kirmse, Iqbal Saraf, Brian E. Goodlin, Lawrence J. Overzet, Matthew Goeckner
المصدر: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 31:011208
مصطلحات موضوعية: Sticking coefficient, Materials science, Silicon, business.industry, Process Chemistry and Technology, chemistry.chemical_element, Nanotechnology, Aspect ratio (image), Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry, Etching (microfabrication), Materials Chemistry, Optoelectronics, Deposition (phase transition), Wafer, Undercut, Electrical and Electronic Engineering, Thin film, business, Instrumentation
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المصدر: Applied Physics Letters. 98:161502
مصطلحات موضوعية: Semiconductor thin films, Materials science, Physics and Astronomy (miscellaneous), Silicon, chemistry, Deposition (phase transition), chemistry.chemical_element, Nanotechnology, Undercut, Critical dimension, Engineering physics
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المؤلفون: Rardchawadee Silapunt, Amy E. Wendt, Karen H. R. Kirmse
المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 25:1882
مصطلحات موضوعية: Materials science, Plasma etching, business.industry, technology, industry, and agriculture, Analytical chemistry, Biasing, Plasma, Dielectric, Substrate (electronics), Condensed Matter Physics, chemistry.chemical_compound, chemistry, Silicon carbide, Optoelectronics, Electrical and Electronic Engineering, business, Layer (electronics), Deposition (law)
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المؤلفون: Amy E. Wendt, Karen H. R. Kirmse, Rardchawadee Silapunt, L. P. Losey
المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 22:826
مصطلحات موضوعية: Range (particle radiation), Plasma etching, Materials science, Physics::Instrumentation and Detectors, General Engineering, Analytical chemistry, Biasing, Plasma, chemistry.chemical_compound, Silicon nitride, chemistry, Physics::Plasma Physics, Etching (microfabrication), Sputtering, Silicon carbide
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::affc71160db041648547d6153acb4256
https://doi.org/10.1116/1.1676641