-
1
المؤلفون: Jin Hee Park, Jonathan R. Bakke, Mark Lee, Shashank Sharma, Nam-Sung Kim, Ellie Yeh, Tae Hong Ha, Jianxin Lei, Wenting Hou, Raymond Hung, Amir Wachs, Karthik Raman Sharma
المصدر: 2018 IEEE International Interconnect Technology Conference (IITC).
مصطلحات موضوعية: 010302 applied physics, Materials science, Silicon, Annealing (metallurgy), business.industry, Contact resistance, chemistry.chemical_element, 02 engineering and technology, Dielectric, Chemical vapor deposition, Tungsten, 021001 nanoscience & nanotechnology, 01 natural sciences, chemistry, 0103 physical sciences, Optoelectronics, 0210 nano-technology, business, Cobalt, Scaling
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::eb0150ad1624fc756a3529a32218e17e
https://doi.org/10.1109/iitc.2018.8430434 -
2
المؤلفون: Shashank Sharma, Ben Ng, Houda Graoui, Jaujiun Chen, Karthik Raman Sharma, Shankar Muthukrishnan, Robert C. McIntosh, Abhilash J. Mayur
المصدر: ECS Meeting Abstracts. :689-689
مصطلحات موضوعية: Millisecond, Materials science, business.industry, Annealing (metallurgy), Optoelectronics, business, Scaling, High-κ dielectric