-
1
المؤلفون: Seungbun Hong, Hyesun Lee, SungSook Jung, KeeYoung Jun
المصدر: Korean Association For Learner-Centered Curriculum And Instruction. 17:595-611
مصطلحات موضوعية: Self-confidence, biology, Athletes, media_common.quotation_subject, Applied psychology, biology.organism_classification, Psychology, media_common
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ba6cf22aeb1b284980b3e10b655db828
https://doi.org/10.22251/jlcci.2017.17.17.595 -
2دورية أكاديمية
المؤلفون: Jae Sung Yang, June Kee Min, Choongmo Yang, Keeyoung Jung
المصدر: Case Studies in Thermal Engineering, Vol 45, Iss , Pp 102971- (2023)
مصطلحات موضوعية: Natural convection, Polygonal enclosure, Planar shape battery, Sodium β”-alumina battery, Engineering (General). Civil engineering (General), TA1-2040
وصف الملف: electronic resource
-
3
المؤلفون: Yukihiro Shimogaki, Yasuyuki Egashira, Keeyoung Jun
المصدر: Japanese Journal of Applied Physics. 43:7287-7291
مصطلحات موضوعية: Physics and Astronomy (miscellaneous), Diffusion barrier, Chemistry, Monte Carlo method, Inorganic chemistry, Kinetics, General Engineering, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, Partial pressure, Chemical vapor deposition, Rate equation, Sticking probability, Tin
-
4Deposition of Copper Thin Films on Titanium Nitride Layer Prepared by Flow Modulation CVD Technology
المؤلفون: Keeyoung Jun, Min Chul Kim, Nam Ihn Cho, Kyung Hwa Rim, Ho Jung Chang, Yukihiro Shimogaki
المصدر: Materials Science Forum. :457-460
مصطلحات موضوعية: Materials science, Diffusion barrier, Mechanical Engineering, Metallurgy, chemistry.chemical_element, Chemical vapor deposition, Sputter deposition, Condensed Matter Physics, Atomic layer deposition, chemistry, Chemical engineering, Mechanics of Materials, Physical vapor deposition, General Materials Science, Thin film, Tin, Layer (electronics)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::02ddef2484d066a398f6b1ae5f78c4f9
https://doi.org/10.4028/www.scientific.net/msf.449-452.457 -
5
المؤلفون: Keeyoung Jun, Yukihiro Shimogaki
المصدر: Science and Technology of Advanced Materials. 5:549-554
مصطلحات موضوعية: Materials science, Diffusion, chemistry.chemical_element, Nanotechnology, 02 engineering and technology, Chemical vapor deposition, Partial pressure, Atmospheric temperature range, 010402 general chemistry, 021001 nanoscience & nanotechnology, 01 natural sciences, 0104 chemical sciences, chemistry, Chemical engineering, Electrical resistivity and conductivity, Phase (matter), General Materials Science, 0210 nano-technology, Tin, Deposition (law)
-
6
المؤلفون: Nae In Lee, Jung-Shik Heo, Kyoung-Woo Lee, Seung-Jin Lee, Jae-Hak Kim, Jae-ouk Choo, S. W. Nam, Hong Jae Shin, Seung Man Choi, Keeyoung Jun, Woon Hyuk Choi, Young Jin Wee, Andrew-tae Kim, Jae Yeol Maeng, Lee Jungeun
المصدر: 2007 IEEE International Interconnect Technology Conferencee.
مصطلحات موضوعية: Acceleration, Interconnection, Materials science, Proximity effect (audio), Electronic engineering, Node (circuits), Dielectric, Activation energy, Composite material, Electromigration, Current density
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a5907245d224b4ff5faca7441710ecd0
https://doi.org/10.1109/iitc.2007.382343 -
7دورية أكاديمية
المؤلفون: Xiaochuan Lu, Hee Jung Chang, Jeffery F. Bonnett, Nathan L. Canfield, Keeyoung Jung, Vincent L. Sprenkle, Guosheng Li
المصدر: ACS Omega, Vol 3, Iss 11, Pp 15702-15708 (2018)
وصف الملف: electronic resource
Relation: https://doaj.org/toc/2470-1343
-
8
المؤلفون: Keeyoung Jun, Ik-Tae Im, Yukihiro Shimogaki
المصدر: Japanese Journal of Applied Physics. 43:1619
مصطلحات موضوعية: inorganic chemicals, Chemistry, General Engineering, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, Partial pressure, Chemical vapor deposition, Purge, Reduction (complexity), Electrical resistivity and conductivity, Torr, parasitic diseases, Tin, Deposition (chemistry)
-
9
المؤلفون: Yukihiro Shimogaki, Keeyoung Jun
المصدر: Japanese Journal of Applied Physics. 43:L519
مصطلحات موضوعية: Materials science, Flow modulation, Inorganic chemistry, General Engineering, General Physics and Astronomy, chemistry.chemical_element, Partial pressure, Chemical vapor deposition, Titanium nitride, chemistry.chemical_compound, chemistry, Residual chlorine, Electrical resistivity and conductivity, Torr, Tin
-
10مؤتمر
المؤلفون: Young Jin Wee, Kim, A.T., Jung Eun Lee, Jae Yeol Maeng, Woon Hyuk Choi, Seowoo Nam, Seungjin Lee, Kyoung Woo Lee, Jaehak Kim, Keeyoung Jun, Seung Man Choi, Jaeouk Choo, Jungshik Heo, Hong Jae Shin, Nae In Lee
المصدر: 2007 IEEE International Interconnect Technology Conference; 2007, p31-33, 3p