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المؤلفون: Eiji Tsujimoto, Kei Mesuda, Katsuya Hayano, Hideyoshi Takamizawa, Shintaro Kudo, Toshio Ohhashi, Naruo Sakasai, Tomoyuki Matsuyama, Hiroshi Watanabe
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Scanner, Materials science, Optics, business.industry, Wafer, Performance improvement, business, Lithography, Exposure latitude, 3d topography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::97b9ff0f1b416b26e618d7fe54d6a3c3
https://doi.org/10.1117/12.899910 -
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المؤلفون: Shintaro Kudo, Kei Mesuda, Tomoyuki Matsuyama, Hiroshi Watanabe, Katsuya Hayano, Toshio Ohhashi, Eiji Tsujimoto, Naruo Sakasai, Hideyoshi Takamizawa
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Leading edge, Scanner, Engineering, Resolution enhancement technologies, Optics, business.industry, Head to head, business, Refractive index, Lithography, Exposure latitude, Blank
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::92fb18e55cdff9e43651b6c83b77f178
https://doi.org/10.1117/12.899909 -
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المؤلفون: Eiji Tsujimoto, Takeshi Kosuge, Hidemichi Imai, Hideyoshi Takamizawa, Kei Mesuda
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, Signal-to-noise ratio (imaging), Optical proximity correction, Pixel, business.industry, Electronic engineering, Node (circuits), Sensitivity (control systems), business, Inspection time, Throughput (business), Algorithm, Design for manufacturability
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0d929c2f7b6a5a033ed76724d71216c6
https://doi.org/10.1117/12.867983 -
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المؤلفون: Kei Mesuda, Peter De Bisschop, Vicky Philipsen
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Diffraction, Materials science, business.industry, Transmission loss, Astrophysics::Instrumentation and Methods for Astrophysics, Resonance, Grating, Polarization (waves), Optics, Computer Science::Sound, Transmission line, Phase-shift mask, business, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::bfe382c7f78b493fd55d9679dbeb468a
https://doi.org/10.1117/12.793046 -
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المؤلفون: Takanori Sutou, Hiroyuki Hashimoto, Takaharu Nagai, Yasutaka Morikawa, Naoya Hayashi, Kei Mesuda, Hiroshi Mohri, Yuichi Inazuki, Toshifumi Yokoyama, Nobuhito Toyama
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Diffraction, Materials science, business.industry, law.invention, Numerical aperture, Optics, law, Cathode ray, Photolithography, business, Lithography, Exposure latitude, Intensity (heat transfer), Aerial image
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::73dce829377f4ae30c9ba1c309309401
https://doi.org/10.1117/12.798781 -
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المؤلفون: Naoya Hayashi, Takanori Sutou, Kei Mesuda, Yuichi Inazuki, Ulrich Stroessner, Hiroshi Mohri, Takaharu Nagai, Rigo Richter, Thomas Scheruebl, Robert Birkner, Takashi Adachi, Nobuhito Toyama, Yasutaka Morikawa
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Diffraction, Materials science, business.industry, Aperture, Transmission loss, Diffraction efficiency, Numerical aperture, law.invention, Lens (optics), Optics, law, Photomask, Photolithography, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fce5c566f48fcedd82146aff29823f71
https://doi.org/10.1117/12.711664 -
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المؤلفون: Yasutaka Morikawa, Nobuhito Toyama, Takashi Adachi, Naoya Hayashi, Hiroshi Mohri, Kei Mesuda
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, business.industry, Phase (waves), law.invention, Optical proximity correction, law, Trench, Electronic engineering, Optoelectronics, Undercut, Wafer, Photolithography, business, Lithography, Immersion lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9b1e1398c5ce18a24652ef6991bba3a0
https://doi.org/10.1117/12.633307 -
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المؤلفون: Morihisa Hoga, Syogo Narukawa, Hiroshi Mohri, Nobuhito Toyama, Naoya Hayashi, Yasutaka Morikawa, Kei Mesuda
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, business.industry, law.invention, Optics, Etching (microfabrication), law, Trench, Node (circuits), Undercut, X-ray lithography, Photolithography, business, Lithography, Next-generation lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f330c379ca80b9687f5a185f50866b16
https://doi.org/10.1117/12.476981 -
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المؤلفون: Vicky Philipsen, Kei Mesuda, Peter De Bisschop
المصدر: Journal of Micro/Nanolithography, MEMS, and MOEMS. 7:020501
مصطلحات موضوعية: Electromagnetic field, Diffraction, Materials science, business.industry, Mechanical Engineering, Transmission loss, Astrophysics::Instrumentation and Methods for Astrophysics, Physics::Optics, Resonance, Grating, Condensed Matter Physics, Polarization (waves), Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, Laser linewidth, Optics, Computer Science::Sound, Optoelectronics, Electrical and Electronic Engineering, Photomask, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a1a316c861abdbce0d38fe318b8f5fc5
https://doi.org/10.1117/1.2938993