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1
المؤلفون: Shinjirou Yokota, Keisuke Namba, Noriaki K. Sato, Keiichiro Imura, Hitoshi Yamaoka, Takuma Kawai, Kazuhiko Deguchi, Nozomu Hiraoka, Shinnosuke Hirokawa, Jun'ichiro Mizuki, Yoshiya Yamamoto, Kazushi Sakamoto, Tsutomu Ishimasa, Hirofumi Ishii
المصدر: Scientific Reports, Vol 10, Iss 1, Pp 1-10 (2020)
Scientific Reportsمصطلحات موضوعية: Physics, Phase transition, Electronic properties and materials, Multidisciplinary, Valence (chemistry), Condensed matter physics, Magnetism, Icosahedral symmetry, lcsh:R, Quasicrystal, lcsh:Medicine, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Article, Lattice constant, 0103 physical sciences, Condensed Matter::Strongly Correlated Electrons, lcsh:Q, Condensed-matter physics, 010306 general physics, 0210 nano-technology, Translational symmetry, lcsh:Science, Absolute zero
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2
المؤلفون: Kazunao Ogata, Tetsuo Fukada, Makiko Hasegawa, Mori Takeshi, Yoshihiko Toyoda, Keisuke Namba
المصدر: Applied Surface Science. 91:227-233
مصطلحات موضوعية: Interconnection, Materials science, General Physics and Astronomy, chemistry.chemical_element, Surfaces and Interfaces, General Chemistry, Activation energy, Condensed Matter Physics, Electromigration, Surfaces, Coatings and Films, Anode, chemistry, Wafer, Composite material, Tin, Current density, Hillock
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3
المؤلفون: Tatsuo Oomori, Kouichi Ono, Mutumi Tuda, Keisuke Namba
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 10:1071-1079
مصطلحات موضوعية: Plasma etching, Chemistry, Analytical chemistry, Surfaces and Interfaces, Condensed Matter Physics, Electron cyclotron resonance, Surfaces, Coatings and Films, Ion, Cavity magnetron, Electrical measurements, Plasma diagnostics, Atomic physics, Laser-induced fluorescence, Microwave
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4
المؤلفون: Keisuke Namba, Yasuhiro Ando, Hiroyuki Hatta, Hitoshi Sori, Hiroyuki Inoue
المصدر: The Proceedings of JSME annual Conference on Robotics and Mechatronics (Robomec). 2015:2P1-B10_1
مصطلحات موضوعية: Computer science, business.industry, Capacitive sensing, Electrical engineering, Robot, Control engineering, Line (text file), business, Rice plant
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::65588bcb7c90f7745826cf61ee7f3820
https://doi.org/10.1299/jsmermd.2015._2p1-b10_1 -
5
المؤلفون: Keisuke Namba, Kazuyasu Nishikawa, Tatsuo Oomori, Mutumi Tuda, Kouichi Ono
المصدر: Japanese Journal of Applied Physics. 34:3731
مصطلحات موضوعية: Plasma etching, Physics and Astronomy (miscellaneous), Absorption spectroscopy, Silicon, Chemistry, Inorganic chemistry, General Engineering, Analytical chemistry, General Physics and Astronomy, Infrared spectroscopy, chemistry.chemical_element, Fourier transform spectroscopy, Etching (microfabrication), Reactive-ion etching, Fourier transform infrared spectroscopy
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6
المؤلفون: Hiroki Ootera, Keisuke Namba, Mutumi Tuda, Tatsuo Oomori
المصدر: Japanese Journal of Applied Physics. 33:4276
مصطلحات موضوعية: Drift velocity, Chemistry, General Engineering, General Physics and Astronomy, Plasma, Electric charge, Electron cyclotron resonance, Ion, symbols.namesake, Physics::Plasma Physics, Etching (microfabrication), symbols, Wafer, Atomic physics, Debye length
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7
المؤلفون: Tatsuo Oomori, Kazuyasu Nishikawa, Keisuke Namba, Kouichi Ono, Mutumi Tuda
المصدر: Japanese Journal of Applied Physics. 33:4424
مصطلحات موضوعية: Plasma etching, Absorption spectroscopy, Etching (microfabrication), Chemistry, General Engineering, Analytical chemistry, General Physics and Astronomy, Resonance, Wafer, Plasma, Fourier transform infrared spectroscopy, Electron cyclotron resonance
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8
المؤلفون: Kouichi Ono, Mutumi Tuda, Masakazu Taki, Keisuke Namba
المصدر: Japanese Journal of Applied Physics. 33:1530
مصطلحات موضوعية: Chemistry, General Engineering, General Physics and Astronomy, Plasma, Sputter deposition, equipment and supplies, Electron cyclotron resonance, Magnetic field, Physics::Plasma Physics, Sputtering, Cavity magnetron, Electron temperature, Atomic physics, Microwave
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9Platinum Etching and Plasma Characteristics in RF Magnetron and Electron Cyclotron Resonance Plasmas
المصدر: Japanese Journal of Applied Physics. 32:6102
مصطلحات موضوعية: Plasma etching, chemistry, Etching (microfabrication), Plasma parameters, Cavity magnetron, General Engineering, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, Plasma, Platinum, Electron cyclotron resonance, Ion
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10
المؤلفون: Shigeki Nakayama, Toshiro Fujii, Isao Akamatsu, Keisuke Namba, Hiroshi Kamishima
المصدر: JAPAN TAPPI JOURNAL. 40:568-574
مصطلحات موضوعية: Aqueous solution, Ozone, genetic structures, Mechanical Engineering, Pulp (paper), Inorganic chemistry, chemistry.chemical_element, Liquid phase, General Chemistry, engineering.material, Pulp and paper industry, Oxygen, chemistry.chemical_compound, chemistry, Kraft process, Media Technology, engineering, Pulp bleaching, General Materials Science, sense organs
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3a59b0762e16b102c9ab2a85b8da9fc4
https://doi.org/10.2524/jtappij.40.568