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1
المؤلفون: Katsuhiko Hieda, Tomokazu Miyazaki, Erik Sohn, Nishimura Isao, Ruben Van Roosbroeck, Bivragh Majeed, Sara Peeters, Koen de Wijs, Chengxun Liu, John O'Callaghan, Karolien Jans, Josine Loo, Liesbet Lagae, Kenji Hoshiko
المصدر: Biomedical microdevices. 20(1)
مصطلحات موضوعية: Materials science, Fabrication, Polymers, Microfluidics, Biomedical Engineering, Nanotechnology, Context (language use), 02 engineering and technology, Direct bonding, Signal-To-Noise Ratio, 01 natural sciences, Mice, Adhesives, Lab-On-A-Chip Devices, Materials Testing, Microelectronics, Animals, Humans, Wafer, Molecular Biology, business.industry, 010401 analytical chemistry, Fibroblasts, 021001 nanoscience & nanotechnology, Flow Cytometry, 0104 chemical sciences, Adhesive, 0210 nano-technology, business, Microfabrication
وصف الملف: Electronic; application/pdf
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2
المؤلفون: Masafumi Hori, Hisashi Nakagawa, Takehiko Naruoka, Takakazu Kimoto, Tomoki Nagai, Tomohisa Fujisawa, Toru Kimura, Ramakrishnan Ayothi, Motohiro Shiratani, Kenji Hoshiko, Yoshi Hishiro
المصدر: Journal of Photopolymer Science and Technology. 28:519-523
مصطلحات موضوعية: Materials science, Polymers and Plastics, business.industry, Extreme ultraviolet lithography, Organic Chemistry, Semiconductor device, Optics, Resist, Extreme ultraviolet, Materials Chemistry, Optoelectronics, X-ray lithography, business, Lithography, Electron-beam lithography, Immersion lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d8ba0c24a673d40d672c9059f8583ed0
https://doi.org/10.2494/photopolymer.28.519 -
3
المؤلفون: Kaori Sakai, Ken Maruyama, Kazunori Sakai, Andreia Santos, Takehiko Naruoka, Ramakrishnan Ayothi, Koji Inukai, Motohiro Shiratani, Tomohisa Fujisawa, Tomoki Nagai, Kenji Hoshiko
المصدر: Journal of Photopolymer Science and Technology. 27:639-644
مصطلحات موضوعية: Materials science, Polymers and Plastics, Resist, Extreme ultraviolet lithography, Organic Chemistry, Materials Chemistry, Organic chemistry, Nanotechnology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::91244601ed5225cacfde8a85cf05db10
https://doi.org/10.2494/photopolymer.27.639 -
4
المؤلفون: Tsutomu Shimokawa, Michihiro Mita, Yoshikazu Yamaguchi, Kenji Hoshiko, Hiromitsu Tanaka, Yukio Nishimura, Goji Wakamatsu, Yusuke Anno, Hitoshi Osaki, Tomohisa Fujisawa, Makoto Sugiura, Koji Ito
المصدر: Journal of Photopolymer Science and Technology. 23:199-204
مصطلحات موضوعية: Materials science, Polymers and Plastics, business.industry, Organic Chemistry, Process (computing), Nanotechnology, Photoresist, Lithography process, Resist, Materials Chemistry, Multiple patterning, Process engineering, business, Critical dimension, Throughput (business), Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3bc04fd43b4f59e91d6036339a3a9683
https://doi.org/10.2494/photopolymer.23.199 -
5
المؤلفون: Yoshikazu Yamaguchi, Kenji Hoshiko, Shiro Kusumoto, Yusuke Anno, Masafumi Hori, Tsutomu Shimokawa, Goji Wakamatsu, Koichi Fujiwara, Michihiro Mita, Tomohiko Kakizawa, Takeo Shio
المصدر: Journal of Photopolymer Science and Technology. 22:641-646
مصطلحات موضوعية: Materials science, Polymers and Plastics, Resist, Etching (microfabrication), Organic Chemistry, Materials Chemistry, Process (computing), Multiple patterning, Process window, Nanotechnology, Throughput (business), Critical dimension, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::954cb83eb6a7abe03543071670a3da25
https://doi.org/10.2494/photopolymer.22.641 -
6
المؤلفون: Yoshikazu Yamaguchi, Yuki Kushida, Kenji Hoshiko, Yutaka Makita, Takanori Kawakami, Yukio Nishimura, Hiroki Nakagawa
المصدر: Journal of Photopolymer Science and Technology. 21:641-646
مصطلحات موضوعية: chemistry.chemical_classification, Materials science, Polymers and Plastics, Organic Chemistry, Monomer composition, Analytical chemistry, Defect free, Polymer, Dynamic light scattering, Chemical engineering, chemistry, Resist, Materials Chemistry, Cluster (physics), Solubility, Dispersion (chemistry)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9db2944bb3329a4be7e51f20a3f554b5
https://doi.org/10.2494/photopolymer.21.641 -
7
المؤلفون: Yoshi Hishiro, Xavier Buch, Motohiro Shiratani, Ken Maruyama, Kenji Hoshiko, Tooru Kimura, Andreia Santos, Takehiko Naruoka, Ramakrishnan Ayothi
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Contact angle, Outgassing, Optics, Materials science, Semiconductor, Resist, business.industry, Extreme ultraviolet lithography, Extreme ultraviolet, business, Lithography, Electron-beam lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a48eb7d465c4f697f6aa623a8b3c6cbd
https://doi.org/10.1117/12.2046133 -
8
المؤلفون: Kenji Hoshiko, Yusuke Anno, Vassilios Constantoudis, Roel Gronheid, John J. Biafore, Alessandro Vaglio Pret, Todd R. Younkin, Gustaf Winroth
المصدر: Extreme Ultraviolet (EUV) Lithography IV.
مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, law.invention, Optics, Resist, law, Multiple patterning, Optoelectronics, X-ray lithography, Photolithography, business, Electron-beam lithography, Immersion lithography, Next-generation lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::50dbc927071d10d6fc3af3ab67fef4aa
https://doi.org/10.1117/12.2011584 -
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المؤلفون: Xavier Buch, Jennifer Braggin, Kenji Hoshiko, Wim Schoallert
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Pore size, Coating, Resist, business.industry, engineering, Membrane filter, Nanotechnology, engineering.material, Process engineering, business, Lithography, Immersion lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::799cab9102ee3c684b6c135b77b96aa9
https://doi.org/10.1117/12.846346 -
10
المؤلفون: Yusuke Anno, Yutaka Kozuma, Yoshifumi Ogawa, Kentaro Goto, Hiromitsu Tanaka, Kenji Hoshiko, Hiroaki Takikawa, Koichi Fujiwara, Makoto Sugiura, Masafumi Hori, Koji Ito, Goji Wakamatsu, Tsutomu Shimokawa, Tomohisa Fujisawa, Takeo Shioya, Yoshikazu Yamaguchi, Michihiro Mita
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Resist, Computer science, business.industry, Process (computing), Multiple patterning, Nanotechnology, Lithography process, Process engineering, business, Lithography, Critical dimension, Throughput (business), Simple (philosophy)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e5ebe214fe0ebc7d13b50341fce070c4
https://doi.org/10.1117/12.846493