المؤلفون: Kim, Junhyeok, Yoo, Jae-Hyun, Jung, Jaehyun, Kim, Kwangtea, Bae, Jaehyun, Kim, Yoon-suk, Kwon, OhKyum, Kwon, UiHui, Kim, DaeSin

المصدر: 2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) Simulation of Semiconductor Processes and Devices (SISPAD), 2020 International Conference o. :343-346 Sep, 2020

Relation: 2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)

المؤلفون: Kim, Seungju, Lee, Kwangseok, Noh, Hyeon-Kyun, Shin, Youngkyu, Chang, Kyu-Baik, Jeong, Jaehoon, Baek, Sangwon, Kang, Myunggil, Cho, Keunhwi, Kim, Dong-Won, Kim, Daesin

المصدر: 2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) Simulation of Semiconductor Processes and Devices (SISPAD), 2020 International Conference o. :47-50 Sep, 2020

Relation: 2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)

المؤلفون: Kang, Gijae, Jeon, Joohyun, Kim, Junsoo, Ahn, Hyoshin, Jang, Inkook, Kim, Daesin

المصدر: 2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) Simulation of Semiconductor Processes and Devices (SISPAD), 2020 International Conference o. :19-21 Sep, 2020

Relation: 2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)

المؤلفون: Pham, Anh-Tuan, Jin, Seonghoon, Lu, Yang, Park, Hong-Hyun, Choi, Woosung, Pourghaderi, Mohammad Ali, Kim, Jongchol, Kwon, Uihui, Kim, Daesin

المصدر: 2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) Simulation of Semiconductor Processes and Devices (SISPAD), 2018 International Conference on. :145-148 Sep, 2018

Relation: 2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)

المؤلفون: Hong, Junpyo, Kwon, Jisung, Iqbal, Aamir, Kim, Daesin, Kwon, Taehoon, Sambyal, Pradeep, Hong, Soon Man, Yoon, Ho Gyu, Kim, Myung-Ki, Koo, Chong Min

المصدر: In Chemical Engineering Journal 15 June 2022 438

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المؤلفون: Iqbal, Aamir, Kim, Hyerim, Oh, Jung‐Min, Chae, Jikwang, Kim, Jiwoong, Kim, Myungjae, Hassan, Tufail, Gao, Zhenguo, Lee, Juyun, Kim, Seon Joon, Kim, Daesin, Gogotsi, Yury, Kwon, Hanjung, Koo, Chong Min

المصدر: Small Methods; Aug2023, Vol. 7 Issue 8, p1-12, 12p

مصطلحات موضوعية: ELECTROMAGNETIC shielding, ELECTRIC conductivity, CRYSTAL defects, OXYGEN

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