يعرض 1 - 10 نتائج من 10 نتيجة بحث عن '"Klare, Mark"', وقت الاستعلام: 0.81s تنقيح النتائج
  1. 1
    مؤتمر
    Development of SiGe Indentation Process Control to Enable Stacked Nanosheet FET Technology

    المؤلفون: Kong, Dexin, Schmidt, Daniel, Breton, Mary, de la pena, Abraham Arceo, Frougier, Julien, Greene, Andrew, Zhang, Jingyun, Basker, Veeraraghavan, Loubet, Nicolas, Ahsan, Ishtiaq, Cepler, Aron, Klare, Mark, Cheng, Marjorie, Koret, Roy, Turovets, Igor

    المصدر: 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) SEMI Advanced Semiconductor Manufacturing Conference (ASMC), 2020 31st Annual. :1-5 Aug, 2020

    Relation: 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)

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  2. 2
    تقرير
    Development of SiGe Indentation Process Control for Gate-All-Around FET Technology Enablement

    المؤلفون: Schmidt, Daniel, Cepler, Aron, Durfee, Curtis, Pancharatnam, Shanti, Frougier, Julien, Breton, Mary, Greene, Andrew, Klare, Mark, Koret, Roy, Turovets, Igor

    مصطلحات موضوعية: Physics - Applied Physics

    URL الوصول: http://arxiv.org/abs/2201.04725

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  3. 3
    مؤتمر
    Silicon-Germanium (SiGe) composition and thickness determination via simultaneous smallspot XPS and XRF measurements

    المؤلفون: L'herron, Benoit, Loubet, Nicolas, Liu, Qing, Farhat, Saiqa, Fullam, Jennifer, Gaudiello, John, Rangarajan, Srinivasan, Bing Sun, Wei Ti Lee, Klare, Mark, Pois, Heath, Kwan, Mike, Ying Wang, Larson, Tom, Wacquez, Romain, Maitrejean, Sylvian

    المصدر: 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014) Advanced Semiconductor Manufacturing Conference (ASMC), 2014 25th Annual SEMI. :26-30 May, 2014

    Relation: 2014 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)

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  4. 4
    مؤتمر
    Investigation of an on product high-k/metal metrology methodology using an in-line, high throughput XPS measurement technique

    المؤلفون: Dai, Min, Klare, Mark, Rangarajan, Srinivasan, Chudzik, Michael P, Shepard, Joseph, Tai, Leo, Ronsheim, Paul, Kwan, Mike, Larson, Tom

    المصدر: 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) Advanced Semiconductor Manufacturing Conference (ASMC), 2010 IEEE/SEMI. :61-64 Jul, 2010

    Relation: 2010 21st Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC)

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  5. 5
    دورية أكاديمية

    لا يتم عرض هذه النتيجة على الضيوف.

    View this record from ISI Web of Science
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  6. 6
    مؤتمر
    Full structure transistor process monitoring of boron and germanium in PFET EPI using in-line XPS.

    المؤلفون: Jusang Lee, Subramanian, Ganesh, Medikonda, Manasa, Lazkani, Hossam, Holt, Judson, Gaire, Churamani, Isbester, Paul, Klare, Mark

    المصدر: Proceedings of SPIE; 1/22/2019, Vol. 10959, p1-6, 6p

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  7. 7
    دورية
    Full structure transistor process monitoring of boron and germanium in PFET EPI using in-line XPS

    المؤلفون: Ukraintsev, Vladimir A., Adan, Ofer, Lee, Jusang, Subramanian, Ganesh, Medikonda, Manasa, Lazkani, Hossam, Holt, Judson, Gaire, Churamani, Isbester, Paul, Klare, Mark

    المصدر: Proceedings of SPIE; May 2019, Vol. 10959 Issue: 1 p109590N-109590N-6, 986317p

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  8. 8
    دورية
    XPS-XRF hybrid metrology enabling FDSOI process

    المؤلفون: Sanchez, Martha I., Ukraintsev, Vladimir A., Hossain, Mainul, Subramanian, Ganesh, Triyoso, Dina, Wahl, Jeremy, Mcardle, Timothy, Vaid, Alok, Bello, A. F., Lee, Wei Ti, Klare, Mark, Kwan, Michael, Pois, Heath, Wang, Ying, Larson, Tom

    المصدر: Proceedings of SPIE; March 2016, Vol. 9778 Issue: 1 p97780N-97780N-8, 880029p

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  9. 9
    دورية
    Hybrid enabled thin film metrology using XPS and optical

    المؤلفون: Sanchez, Martha I., Ukraintsev, Vladimir A., Vaid, Alok, Iddawela, Givantha, Mahendrakar, Sridhar, Lenahan, Michael, Hossain, Mainul, Timoney, Padraig, Bello, Abner F., Bozdog, Cornel, Pois, Heath, Lee, Wei Ti, Klare, Mark, Kwan, Michael, Kang, Byung Cheol, Isbester, Paul, Sendelbach, Matthew, Yellai, Naren, Dasari, Prasad, Larson, Tom

    المصدر: Proceedings of SPIE; March 2016, Vol. 9778 Issue: 1 p97780M-97780M-11, 9680232p

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  10. 10
    دورية
    Advanced in-line optical metrology of sub-10nm structures for gate all around devices (GAA)

    المؤلفون: Sanchez, Martha I., Ukraintsev, Vladimir A., Muthinti, Raja, Loubet, Nicolas, Chao, Robin, Ott, John, Guillorn, Michael, Felix, Nelson, Gaudiello, John, Lund, Parker, Cepler, Aron, Sendelbach, Matthew, Cohen, Oded, Wolfling, Shay, Bozdog, Cornel, Klare, Mark

    المصدر: Proceedings of SPIE; March 2016, Vol. 9778 Issue: 1 p977810-977810-8

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