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1دورية أكاديمية
المؤلفون: Burak William Çetinkaya, Fabian Junge, Gregor Müller, Florian Haakmann, Klaus Schierbaum, Miroslaw Giza
المصدر: Journal of Materials Research and Technology, Vol 9, Iss 6, Pp 16445-16458 (2020)
مصطلحات موضوعية: Hot-dip galvanizing, Zn–Al–Mg coating, Surface characterization, Alkaline cleaning, Acid treatment, Mining engineering. Metallurgy, TN1-997
وصف الملف: electronic resource
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2دورية أكاديمية
المؤلفون: Engin Ciftyurek, Zheshen Li, Klaus Schierbaum
المصدر: Sensors, Vol 23, Iss 1, p 29 (2022)
مصطلحات موضوعية: gas sensor, adsorbed oxygen, tungsten oxide, XPS, UPS, XPEEM, Chemical technology, TP1-1185
وصف الملف: electronic resource
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3دورية أكاديمية
المؤلفون: Bernd Engelkamp, Klaus Schierbaum
المصدر: Sensors, Vol 21, Iss 7, p 2558 (2021)
مصطلحات موضوعية: plasma electrolytic oxidation, titanium dioxide, Pt/TiO2, ionosorption, oxygen gas sensor, Chemical technology, TP1-1185
وصف الملف: electronic resource
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4دورية أكاديمية
المؤلفون: Engin Ciftyürek, Břetislav Šmíd, Zheshen Li, Vladimír Matolín, Klaus Schierbaum
المصدر: Sensors, Vol 19, Iss 21, p 4737 (2019)
مصطلحات موضوعية: metal oxides, gas sensors, spectroscopy, characterization techniques, synchrotron, xps, nap-xps, Chemical technology, TP1-1185
وصف الملف: electronic resource
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5دورية أكاديمية
المصدر: Metals, Vol 8, Iss 6, p 386 (2018)
مصطلحات موضوعية: titanium dioxide, plasma electrolytic oxidation (PEO), Mining engineering. Metallurgy, TN1-997
وصف الملف: electronic resource
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6
المؤلفون: Klaus Schierbaum, Anjana Devi, Jan-Lucas Wree, Aleksander Kostka, Andreas Ostendorf, Nils Boysen, David Zanders, Engin Ciftyurek, Maren Kasischke, Detlef Rogalla
المصدر: Dalton Transactions. 49:13462-13474
مصطلحات موضوعية: Materials science, chemistry.chemical_element, Chemical vapor deposition, Inorganic Chemistry, chemistry.chemical_compound, Atomic layer deposition, chemistry, Chemical engineering, Molybdenum, Deposition (phase transition), Metalorganic vapour phase epitaxy, Thin film, High-resolution transmission electron microscopy, Molybdenum disulfide
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0aaca2bbc79a52486965e4b79ed71383
https://doi.org/10.1039/d0dt02471f -
7
المؤلفون: Zhongshan Li, Yujiao Li, Klaus Schierbaum, Michael Wark, Alfred Ludwig, Dennis Zywitzki, Daniel M. Baier, Dereje H. Taffa, Jan-Lucas Wree, Raoul Schaper, Detlef Rogalla, Anjana Devi, Engin Ciftyurek, Michael Meischein
المصدر: Zywitzki, D, Schaper, R, Ciftyürek, E, Wree, J L, Taffa, D H, Baier, D M, Rogalla, D, Li, Y, Meischein, M, Ludwig, A, Li, Z, Schierbaum, K, Wark, M & Devi, A 2021, ' Chemical Vapor Deposition of Cobalt and Nickel Ferrite Thin Films : Investigation of Structure and Pseudocapacitive Properties ', Advanced Materials Interfaces, vol. 8, no. 20, 2100949 . https://doi.org/10.1002/admi.202100949
مصطلحات موضوعية: Supercapacitor, Materials science, supercapacitors, Mechanical Engineering, chemistry.chemical_element, Chemical vapor deposition, chemical vapor deposition, Chemical engineering, chemistry, cobalt ferrite, pseudocapacitors, Mechanics of Materials, Cobalt ferrite, Pseudocapacitor, Thin film, nickel ferrite, Cobalt, Nickel ferrite
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f2172adf953d76dad705dc5a9e8affa5
https://pure.au.dk/ws/files/285212173/Adv_Materials_Inter_2021_Zywitzki_Chemical_Vapor_Deposition_of_Cobalt_and_Nickel_Ferrite_Thin_Films_Investigation_of.pdf -
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المؤلفون: Martin Wilken, Engin Ciftyürek, Stefan Cwik, Lukas Mai, Bert Mallick, Detlef Rogalla, Klaus Schierbaum, Anjana Devi
المصدر: Small. 19:2204636
مصطلحات موضوعية: Biomaterials, General Materials Science, General Chemistry, Biotechnology
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9
المؤلفون: Detlef Rogalla, Anjana Devi, Aleksander Kostka, Ersoy Subaşı, David Zanders, Niklas Huster, Claudia Bock, Engin Ciftyurek, Klaus Schierbaum
المصدر: ACS Applied Materials & Interfaces. 11:28407-28422
مصطلحات موضوعية: In situ, Materials science, 02 engineering and technology, 010402 general chemistry, 021001 nanoscience & nanotechnology, 01 natural sciences, 0104 chemical sciences, Characterization (materials science), Atomic layer deposition, Chemical engineering, X-ray photoelectron spectroscopy, General Materials Science, Thin film, 0210 nano-technology, Ambient pressure
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10
المؤلفون: Claudia Bock, Guido Grundmeier, Teresa de los Arcos, Christian Hoppe, Klaus Schierbaum, Ersoy Subaşı, Anjana Devi, Lukas Mai, Detlef Rogalla, Engin Ciftyurek, David Zanders, Wolfram Gilbert
المصدر: ACS Applied Materials & Interfaces. 11:3169-3180
مصطلحات موضوعية: chemistry.chemical_classification, Fabrication, Materials science, Transistor, Oxide, chemistry.chemical_element, 02 engineering and technology, 010402 general chemistry, 021001 nanoscience & nanotechnology, 01 natural sciences, 0104 chemical sciences, law.invention, Atomic layer deposition, chemistry.chemical_compound, Chemical engineering, chemistry, Thin-film transistor, law, General Materials Science, Thin film, 0210 nano-technology, Tin, Alkyl