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1
المؤلفون: Wolfgang Hoppe, Kosta Selinidis, Hongyuan Cai, Kyle Braam, Guangming Xiao
المصدر: Design-Process-Technology Co-optimization for Manufacturability XIII.
مصطلحات موضوعية: Resist, Computational lithography, Page layout, Computer science, Extreme ultraviolet lithography, Product integration, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Process (computing), Process window, computer.software_genre, Lithography, computer
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0d17ad719f54555a51291505effad4ec
https://doi.org/10.1117/12.2515156 -
2
المؤلفون: Guangming Xiao, Amyn Poonawala, Wolfgang Hoppe, Bernd Kuechler, Kosta Selinidis, Howard Cai, Kyle Braam, Vitaly Domnenko
المصدر: Optical Microlithography XXXI.
مصطلحات موضوعية: Optical proximity correction, Resist, Computer science, Extreme ultraviolet lithography, Process integration, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Multiple patterning, Design process, Node (circuits), Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a98d5dc003b85d4554ffecd5583133df
https://doi.org/10.1117/12.2299375 -
3
المؤلفون: Philip D. Schumaker, Mario J. Meissl, Babak Mokaberi, Sidlgata V. Sreenivasan, Niyaz Khusnatdinov, Anshuman Cherala, Kosta Selinidis, Dwayne L. LaBrake, Byung Jin Choi
المصدر: IEEE/ASME Transactions on Mechatronics. 20:122-132
مصطلحات موضوعية: Materials science, business.industry, Semiconductor device fabrication, Magnification, Overlay, Computer Science Applications, law.invention, Metrology, Flash (photography), Optics, Control and Systems Engineering, law, Electrical and Electronic Engineering, Photolithography, business, Layer (electronics), Lithography
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4
المؤلفون: Thomas Schmoeller, Thuc Dam, Kevin Hooker, Kosta Selinidis, Guangming Xiao, Wolfgang Hoppe
المصدر: SPIE Proceedings.
مصطلحات موضوعية: 010309 optics, Resist, Computational lithography, Computer science, 0103 physical sciences, Nanotechnology, Wafer, Process window, 02 engineering and technology, 021001 nanoscience & nanotechnology, 0210 nano-technology, 01 natural sciences, Simulation
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5ad60dce70c454d0f12903137945d8ea
https://doi.org/10.1117/12.2257962 -
5
المؤلفون: Sidlgata V. Sreenivasan, John Maltabes, Kosta Selinidis, Douglas J. Resnick, Ecron Thompson
المصدر: Microelectronic Engineering. 86:709-713
مصطلحات موضوعية: Fabrication, business.industry, Computer science, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Optics, Template, Resist, Digital pattern generator, Process control, Process window, Electrical and Electronic Engineering, business, Critical dimension, Lithography
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6
المؤلفون: Yuko Sakai, Joseph Perez, Akjko Fujii, Ecron Thompson, Kosta Selinidis, John G. Maltabes, Douglas J. Resnick, Sidlgata V. Sreenivasan, Gerard M. Schmid, Shiho Sasaki, Naoya Hayashi, Nick Stacey
المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 26:2410-2415
مصطلحات موضوعية: Computer science, business.industry, Condensed Matter Physics, Soft lithography, Optics, Nanolithography, Optoelectronics, X-ray lithography, Stencil lithography, Electrical and Electronic Engineering, business, Lithography, Next-generation lithography, Electron-beam lithography, Maskless lithography
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7
المؤلفون: Kosta Selinidis, Yifan Jiang, D. Lim, John G. Ekerdt, P. T. Wilson, Michael C. Downer, L. Mantese
المصدر: Applied Surface Science. :229-237
مصطلحات موضوعية: Materials science, Analytical chemistry, General Physics and Astronomy, Second-harmonic generation, Surfaces and Interfaces, General Chemistry, Chemical vapor deposition, Condensed Matter Physics, Laser, Surfaces, Coatings and Films, law.invention, Depletion region, law, Femtosecond, Sapphire, Surface second harmonic generation, Spectroscopy
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8
المؤلفون: Joseph Michael Imhof, Laura Brown, Douglas J. Resnick, Kosta Selinidis, Dwayne L. LaBrake, Sidlgata V. Sreenivasan, Gary Doyle, Christopher Michael Jones
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, business.industry, Replica, Flash memory, Optics, Resist, Computer data storage, Patterned media, Hardware_INTEGRATEDCIRCUITS, Optoelectronics, X-ray lithography, business, Lithography, Critical dimension
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8d11285df2a7d94b94ceb2d3276bdc56
https://doi.org/10.1117/12.898865 -
9
المؤلفون: Gary Doyle, Douglas J. Resnick, Kosta Selinidis, Sidlgata V. Sreenivasan, Christopher Michael Jones, Laura Brown, Joseph Michael Imhof, Cynthia B. Brooks, Dwayne L. LaBrake
المصدر: Alternative Lithographic Technologies III.
مصطلحات موضوعية: Optics, Fabrication, Resist, business.industry, Computer science, Patterned media, Wafer, Dry etching, Photomask, business, Lithography, Computer hardware, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ee997cffd7bff6c5930fa6a80d2db643
https://doi.org/10.1117/12.881647 -
10
المؤلفون: Douglas J. Resnick, Laura Brown, Kosta Selinidis, Sidlgata V. Sreenivasan, Cynthia B. Brooks, Gary Doyle, Dwayne L. LaBrake
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Optics, Template, Materials science, Resist, business.industry, Patterned media, Computer data storage, Photoresist, business, Lithography, Electron-beam lithography, Flash memory
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::188590b7433abd0fcae6de4882fc5152
https://doi.org/10.1117/12.864332